Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACLY | P53396 | 15/20 | 0.46 |
| ▸ | ACACB | O00763 | 1/20 | 0.41 |
| ▸ | ACACA | Q13085 | 1/20 | 0.41 |
| ▸ | ALPL | P05186 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | USP2 | O75604 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL8523518 | 0.94 | ACLY (0.47) | ACLYACACBACACA | |
| Sulfuric Acid SCHEMBL8523516 | 0.91 | ACLY (0.49) | ACLYACACBACACA | |
| Hydrochloric Acid SCHEMBL11080769 | 0.89 | NPC1 (0.44) | ACLYALPLKDM4EUSP2GAA | |
| SCHEMBL1856962 | 0.82 | ALDH1A1 (0.48) | KDM4EHPGDHSD17B10 | |
| SCHEMBL5572801 | 0.81 | ALDH1A1 (0.47) | KDM4EHPGDHSD17B10 | |
| Hydrochloric Acid SCHEMBL5384716 | 0.81 | ALDH1A1 (0.47) | KDM4EHPGDHSD17B10 | |
| Hydrochloric Acid SCHEMBL9816483 | 0.81 | ALDH1A1 (0.47) | KDM4EHPGDHSD17B10 | |
| Sulfuric Acid SCHEMBL27905058 | 0.79 | CA1 (0.43) | KDM4EUSP2GAA | |
| Sulfuric Acid SCHEMBL1123017 | 0.79 | PPARG (0.44) | GAA | |
| Hydrochloric Acid SCHEMBL5444051 | 0.79 | ALDH1A1 (0.45) | KDM4EHPGDHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0838478-B1 | Amido substituted acetal polymers and their use in photosensitive compositions and lithographic printing plates | KODAK POLYCHROME GRAPHICS LLC (US) | 2002-02-27 | — | — | EP | disclosed |
| US-5925491-A | POLYVINYLACETAL RESINS CONTAIN AMIDATED POLYVINYLAMINE UNITS; IMPROVED INK ACCEPTANCE, DEVELOPABILITY, WETTING, HIGH PHOTOSENSITIVITY, GOOD IMAGE RESOLUTION AND LARGER PRINTING RUNS | KODAK POLYCHROME GRAPHICS LLC (US) | 1999-07-20 | — | — | US | disclosed |
| EP-0838478-A1 | Amido substituted acetal polymers and their use in photosensitive compositions and lithographic printing plates | SUN CHEMICAL CORPORATION (US) | 1998-04-29 | — | — | EP | disclosed |