Naphthalene

Naphthalene

SCHEMBL7560846

C=C(C(=O)O)C(C)(C)C.C=C(C)C(=O)O.c1ccc2ccccc2c1

nearest known ligand 0.38

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.38
KDM4E B2RXH2 3/20 0.38
HPGD P15428 1/20 0.35
KMT2A Q03164 4/20 0.34
MAPT P10636 3/20 0.34
AKR1C3 P42330 1/20 0.34
MEN1 O00255 3/20 0.34
CYP2C19 P33261 3/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2C9 P11712 1/20 0.34
GAA P10253 1/20 0.34
PKM P14618 1/20 0.34
TSHR P16473 1/20 0.34
HIF1A Q16665 2/20 0.34
HSD17B10 Q99714 1/20 0.34
CYP1A2 P05177 1/20 0.34
ELANE P08246 1/20 0.34
HSD11B1 P28845 1/20 0.33
CES2 O00748 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Naphthalene SCHEMBL2138200 0.85 KDM4E (0.47) ALDH1A1KDM4EHPGDKMT2AMAPT
Naphthalene SCHEMBL3422961 0.85 KDM4E (0.47) ALDH1A1KDM4EHPGDKMT2AMAPT
Naphthalene SCHEMBL3422143 0.85 KDM4E (0.47) ALDH1A1KDM4EHPGDKMT2AMAPT
Naphthalene SCHEMBL28211669 0.83 KDM4E (0.45) ALDH1A1KDM4EHPGDKMT2AMAPT
Methacrylic Acid SCHEMBL7560025 0.83 TDP1 (0.36) ALDH1A1TSHRTDP1
Benzil SCHEMBL7619057 0.78 CES2 (0.56) ALDH1A1HPGDMAPTSMN1; SMN2CES2
Anthracene SCHEMBL1711588 0.77 KDM4E (0.45) ALDH1A1KDM4EHPGDKMT2AMAPT
Anthracene SCHEMBL29778690 0.77 KDM4E (0.45) ALDH1A1KDM4EHPGDKMT2AMAPT
SCHEMBL23950 0.76
SCHEMBL2137763 0.76 TET2 (0.39) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2002068527-A2 NOVEL β-OXO COMPOUNDS AND THEIR USE IN PHOTORESIST ARCH SPECIALTY CHEMICALS, INC. (US) 2002-09-06 WO disclosed