SCHEMBL756088

SCHEMBL756088

CCc1ccc(N)c(N=O)c1CC

nearest known ligand 0.36

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 2/20 0.36
▸ POLB P06746 1/20 0.36
▸ MAPT P10636 1/20 0.36
▸ LMNA P02545 1/20 0.33
▸ GABRA1 P14867 1/20 0.31
▸ GABRB2 P47870 1/20 0.31
▸ SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL396164 0.76 POLB (0.41) ALDH1A1POLBMAPTGABRA1GABRB2
Water SCHEMBL188047 0.74 POLB (0.44) ALDH1A1POLBMAPTGABRA1GABRB2
Hydrochloric Acid SCHEMBL233673 0.74 POLB (0.40) ALDH1A1POLBMAPTGABRA1GABRB2
Iodide SCHEMBL5092606 0.74 POLB (0.40) ALDH1A1POLBMAPTGABRA1GABRB2
Bromide SCHEMBL16928609 0.74 POLB (0.40) ALDH1A1POLBMAPTGABRA1GABRB2
Bromide SCHEMBL5088452 0.74 POLB (0.40) ALDH1A1POLBMAPTGABRA1GABRB2
SCHEMBL29043862 0.74 POLB (0.40) ALDH1A1POLBMAPTGABRA1GABRB2
SCHEMBL571458 0.74 POLB (0.40) ALDH1A1POLBMAPTGABRA1GABRB2
Hydrochloric Acid SCHEMBL5510042 0.74 POLB (0.40) ALDH1A1POLBMAPTGABRA1GABRB2
SCHEMBL2772114 0.72 ALDH1A1 (0.43) ALDH1A1POLBMAPTGABRA1GABRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105819609-A Tower-type device for decomposing ethylene chloride and manufacturing method of key components thereof 江苏建筑职业技术学院 2016-08-03 — — CN claimed
US-7539006-B2 Electrolytic solution for driving electrolytic capacitor and electrolytic capacitor RUBYCON CORPORATION (JP) 2009-05-26 — — US claimed
CN-100456398-C Electrolyte for driving electrolytic capacitor and electrolytic capacitor RUBYCON CORP (JP) 2009-01-28 — — CN claimed
US-20070029529-A1 Electrolytic solution for driving electrolytic capacitor and electrolytic capacitor KOMATSU AKIHIKO 2007-02-08 — — US claimed
US-20040245105-A1 Electrolyte solution for driving electrolytic capacitor and electrolytic capacitor RUBYCON CORPORATION (JP) 2004-12-09 — — US claimed
CN-1529892-A Electrolyte for driving electrolytic capacitor and electrolytic capacitor 如碧空株式会社 2004-09-15 — — CN claimed
EP-1437749-A1 ELECTROLYTE SOLUTION FOR DRIVING ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR Rubycon Corporation (JP) 2004-07-14 — — EP claimed
CN-115255358-B Surface modification method of metal powder material, modified metal powder material and application of modified metal powder material 西安隆基乐叶光伏科技有限公司 2024-01-16 — — CN disclosed
CN-115255358-A Surface modification method of metal powder material, modified metal powder material and application thereof 西安隆基乐叶光伏科技有限公司 2022-11-01 — — CN disclosed
EP-2669342-B1 ACTIVE-ENERGY-RAY-CURABLE INKJET INK COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INKJET INK, AND INKJET RECORDING METHOD KONICA MINOLTA INC (JP) 2020-03-18 — — EP disclosed
US-10364362-B2 Inks SERICOL LIMITED (GB) 2019-07-30 — — US disclosed
CN-105819609-B A kind of production method for the towers units and its critical component decomposing ethlyene dichloride 江苏建筑职业技术学院 2018-07-17 — — CN disclosed
EP-3143091-B1 INKS SERICOL LTD (GB) 2018-06-20 — — EP disclosed
CN-1295553-A Method for producing acrylic acid and acrylic acid esters BASF AG (DE) 2001-05-16 — — CN disclosed
CN-1295554-A Method for producing (meth) acrylic acid and (meth) acrylic acid esters BASF AG (DE) 2001-05-16 — — CN disclosed
EP-1066240-A1 METHOD FOR PRODUCING ACRYLIC ACID AND ACRYLIC ACID ESTERS BASF AKTIENGESELLSCHAFT (DE) 2001-01-10 — — EP disclosed
WO-1999050220-A1 METHOD FOR PRODUCING ACRYLIC ACID AND ACRYLIC ACID ESTERS BASF AKTIENGESELLSCHAFT (DE) 1999-10-07 — — WO disclosed
CN-1139159-A High current density zinc chloride electrogalvanizing process and composition ATOTECH USA INC (US) 1997-01-01 — — CN disclosed
US-4224248-A Process for the depyrophorization of pyrophoric metal catalysts and uses thereof BAYER AKTIENGESELLSCHAFT (DE) 1980-09-23 — — US disclosed
US-4176092-A TREATMENT WITH AN ORGANIC NITRO OR A NITROSO COMPOUND BAYER AKTIENGESELLSCHAFT (DE) 1979-11-27 — — US disclosed
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