Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA known ✓ | P10253 | 1/20 | 0.31 |
| ▸ | GABRA1 known ✓ | P14867 | 2/20 | 0.31 |
| ▸ | GABRB2 known ✓ | P47870 | 2/20 | 0.31 |
| ▸ | POLB | P06746 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | NOS3 | P29474 | 1/20 | 0.33 |
| ▸ | NOS2 | P35228 | 1/20 | 0.33 |
| ▸ | CTRC | Q99895 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL5510042 | 1.00 | POLB (0.40) | POLBALDH1A1MAPTHTTNOS3 | |
| SCHEMBL396164 | 0.98 | POLB (0.41) | POLBALDH1A1MAPTHTTNOS3 | |
| Iodide SCHEMBL5092606 | 0.95 | POLB (0.40) | POLBALDH1A1MAPTHTTNOS3 | |
| SCHEMBL29043862 | 0.95 | POLB (0.40) | POLBALDH1A1MAPTHTTNOS3 | |
| Bromide SCHEMBL16928609 | 0.95 | POLB (0.40) | POLBALDH1A1MAPTHTTNOS3 | |
| Water SCHEMBL188047 | 0.95 | POLB (0.44) | POLBALDH1A1MAPTHTTNOS3 | |
| Bromide SCHEMBL5088452 | 0.95 | POLB (0.40) | POLBALDH1A1MAPTHTTNOS3 | |
| Ethylene SCHEMBL28200619 | 0.93 | POLB (0.39) | POLBALDH1A1MAPTHTTNOS3 | |
| Bicarbonate SCHEMBL21957733 | 0.89 | ALDH1A1 (0.37) | POLBALDH1A1MAPTHTTGAA | |
| Oxalic Acid SCHEMBL21957810 | 0.87 | ALDH1A1 (0.36) | POLBALDH1A1MAPTHTTGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 293 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116515084-A | Bio-basic-characteristic flame-retardant self-curing epoxy monomer, preparation method thereof and epoxy resin prepared from same | 洛阳尖端技术研究院 | 2023-08-01 | — | — | CN | claimed |
| CN-114958156-A | Preparation method and application of coating curing agent | 深圳市华霖技术咨询服务有限公司 | 2022-08-30 | — | — | CN | claimed |
| CN-109503693-B | Process for synthesizing Aramchol by using cholic acid as raw material | 合肥工业大学 | 2021-04-06 | — | — | CN | claimed |
| CN-109134229-B | Method for preparing cypress oleyl alcohol | 中国农业科学院农业环境与可持续发展研究所 | 2020-09-04 | — | — | CN | claimed |
| CN-108166158-B | Preparation method of waterproof antibacterial double-layer electret electrospun nanofiber composite window screen material | 浙江西大门新材料股份有限公司 | 2020-06-09 | — | — | CN | claimed |
| CN-109134229-A | A method of preparing cypress oleyl alcohol | 中国农业科学院农业环境与可持续发展研究所 | 2019-01-04 | — | — | CN | claimed |
| CN-108166158-A | The preparation method of water-proof antibiotic bilayer electret electro spinning nano fiber complex-aperture yarn material | 符思敏 | 2018-06-15 | — | — | CN | claimed |
| CN-103755658-B | Benzolactam compounds and synthetic method thereof and application | MAX (RUDONG) CHEMICALS CO., LTD. (CN) | 2016-06-01 | — | — | CN | claimed |
| CN-103333503-B | Blend rubber and preparation method thereof | CHINA SHENHUA ENERGY CO LTD | 2015-07-15 | — | — | CN | claimed |
| CN-102633708-B | Synthesizing and purifying method of midbody 9-(2-ethoxy) carbazole | WUHAN UNIVERSITY OF TECHNOLOGY (CN) | 2014-10-01 | — | — | CN | claimed |
| CN-103755658-A | Benzene and lactam compound and synthetic method and application thereof | MAX RUDONG CHEMICALS CO LTD | 2014-04-30 | — | — | CN | claimed |
| CN-103611197-A | Method for preparing nano-fiber-based guided bone regeneration membrane | WUXI ZHONGKE GUANGYUAN BIOMATERIALS CO LTD | 2014-03-05 | — | — | CN | claimed |
| CN-101952237-B | Bromide-free TEMPO-mediated oxidation of the primary alcohol in carbohydrate under two-phase conditions | CHONGQING HUAPONT PHARM CO LTD | 2014-01-08 | — | — | CN | claimed |
| CN-103333503-A | Blend rubber and preparation method thereof | CHINA SHENHUA ENERGY CO LTD | 2013-10-02 | — | — | CN | claimed |
| CN-102633708-A | Synthesizing and purifying method of midbody 9-(2-ethoxy) carbazole | UNIV WUHAN TECH | 2012-08-15 | — | — | CN | claimed |
| CN-101952237-A | Bromide-free TEMPO-mediated oxidation of the primary alcohol in carbohydrate under two-phase conditions | CHONGQING SHENGKAI SCIENCE & T | 2011-01-19 | — | — | CN | claimed |
| CN-100360543-C | Method for preparing ammonium salts of cyclohexanpentol phosphate ester | UNIV SICHUAN NORMAL (CN) | 2008-01-09 | — | — | CN | claimed |
| CN-1830986-A | Method for preparing ammonium salts of cyclohexanpentol phosphate ester | UNIV SICHUAN NORMAL (CN) | 2006-09-13 | — | — | CN | claimed |
| US-5093497-A | PROCESS FOR THE PREPARATION OF A SUBSTITUTED OR UNSUBSTITUTED QUINACRIDONE | BAYER AKTIENGESELLSCHAFT (DE) | 1992-03-03 | — | — | US | claimed |
| JP-55151037-A | — | — | None | — | — | JP | disclosed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-17 | — | — | US | disclosed |
| US-12332565-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-17 | — | — | US | disclosed |
| US-12174541-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-12-24 | — | — | US | disclosed |
| CN-112286000-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-12-03 | — | — | CN | disclosed |
| CN-111856882-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| US-20240319598-A1 | Composition For Forming Silicon-Containing Resist Underlayer Film And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-26 | — | — | US | disclosed |
| EP-4435515-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-25 | — | — | EP | disclosed |
| US-12085857-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-10 | — | — | US | disclosed |
| CN-118620392-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-09-10 | — | — | CN | disclosed |
| EP-3770209-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-09-04 | — | — | EP | disclosed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| US-20240132431-A1 | METHOD FOR ALKYLATING ACIDIC FUNCTIONAL GROUP | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2024-04-25 | — | — | US | disclosed |
| EP-3680275-B1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-03-06 | — | — | EP | disclosed |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| EP-4279476-A1 | METHOD FOR ALKYLATING ACIDIC FUNCTIONAL GROUP | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2023-11-22 | — | — | EP | disclosed |
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-19 | — | — | US | disclosed |
| CN-116829524-A | Method for alkylating acidic functional groups | 中外制药株式会社 | 2023-09-29 | — | — | CN | disclosed |
| US-20230305405-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| EP-4250008-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-27 | — | — | EP | disclosed |
| CN-116804825-A | Composition for forming silicon-containing metal hard mask and pattern forming method | 信越化学工业株式会社 | 2023-09-26 | — | — | CN | disclosed |
| CN-111208710-B | Iodine-containing thermosetting silicon-containing material, resist underlayer film forming composition for extreme ultraviolet lithography containing the same, and pattern forming method | 信越化学工业株式会社 | 2023-08-22 | — | — | CN | disclosed |
| CN-111458980-B | Composition for forming underlayer film of silicon-containing resist and method for forming pattern | 信越化学工业株式会社 | 2023-08-11 | — | — | CN | disclosed |
| US-20230244149-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| CN-116515084-A | Bio-basic-characteristic flame-retardant self-curing epoxy monomer, preparation method thereof and epoxy resin prepared from same | 洛阳尖端技术研究院 | 2023-08-01 | — | — | CN | disclosed |
| CN-116515084-A | Bio-basic-characteristic flame-retardant self-curing epoxy monomer, preparation method thereof and epoxy resin prepared from same | 洛阳尖端技术研究院 | 2023-08-01 | — | — | CN | disclosed |
| EP-3686256-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2023-06-28 | — | — | EP | disclosed |
| EP-4020081-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | SHINETSU CHEMICAL CO (JP) | 2023-05-17 | — | — | EP | disclosed |
| CN-115304745-B | Resveratrol and isovanillin based bio-based composite epoxy resin and preparation method thereof | 南京工业大学 | 2023-03-31 | — | — | CN | disclosed |
| US-11592287-B2 | Method for measuring distance of diffusion of curing catalyst | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-28 | — | — | US | disclosed |
| US-11555697-B2 | — | — | 2023-01-17 | — | — | US | disclosed |
| CN-115304745-A | Compound epoxy resin based on resveratrol and isovanillin biology and preparation method thereof | 南京工业大学 | 2022-11-08 | — | — | CN | disclosed |
| US-11485824-B2 | Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-11-01 | — | — | US | disclosed |
| US-11480879-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-10-25 | — | — | US | disclosed |
| CN-114958156-A | Preparation method and application of coating curing agent | 深圳市华霖技术咨询服务有限公司 | 2022-08-30 | — | — | CN | disclosed |
| US-20220221793-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-14 | — | — | US | disclosed |
| WO-2022149618-A1 | METHOD FOR ALKYLATING ACIDIC FUNCTIONAL GROUP | 中外製薬株式会社 | 2022-07-14 | — | — | WO | disclosed |
| US-11385544-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-12 | — | — | US | disclosed |
| EP-4020081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-06-29 | — | — | EP | disclosed |
| CN-114660896-A | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2022-06-24 | — | — | CN | disclosed |
| EP-2905361-B1 | METHOD OF FORMING A METAL COATING | TOYOTA MOTOR CO LTD (JP) | 2022-01-05 | — | — | EP | disclosed |
| CN-107683272-B | Method for producing organic compound | M技术株式会社 | 2021-10-29 | — | — | CN | disclosed |
| EP-3736632-B1 | METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST | SHINETSU CHEMICAL CO (JP) | 2021-09-22 | — | — | EP | disclosed |
| EP-3657254-B1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2021-06-16 | — | — | EP | disclosed |
| CN-109503693-B | Process for synthesizing Aramchol by using cholic acid as raw material | 合肥工业大学 | 2021-04-06 | — | — | CN | disclosed |
| CN-112286000-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2021-01-29 | — | — | CN | disclosed |
| US-20210026246-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-01-28 | — | — | US | disclosed |
| EP-3770209-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2021-01-27 | — | — | EP | disclosed |
| EP-3736632-A1 | METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-11-11 | — | — | EP | disclosed |
| CN-111856882-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2020-10-30 | — | — | CN | disclosed |
| CN-111855581-A | Method for determining diffusion distance of hardening catalyst | 信越化学工业株式会社 | 2020-10-30 | — | — | CN | disclosed |
| US-20200341377-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-29 | — | — | US | disclosed |
| US-20200340806-A1 | METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-29 | — | — | US | disclosed |
| EP-3731017-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-10-28 | — | — | EP | disclosed |
| US-20200283351-A1 | HALOGENATED HETEROALKENYL- AND HETEROALKYL-FUNCTIONALIZED ORGANIC COMPOUNDS AND METHODS FOR PREPARING SUCH COMPOUNDS | ARKEMA INC. | 2020-09-10 | — | — | US | disclosed |
| CN-109134229-B | Method for preparing cypress oleyl alcohol | 中国农业科学院农业环境与可持续发展研究所 | 2020-09-04 | — | — | CN | disclosed |
| EP-3691990-A1 | HALOGENATED HETEROALKENYL- AND HETEROALKYL-FUNCTIONALIZED ORGANIC COMPOUNDS AND METHODS FOR PREPARING SUCH COMPOUNDS | Arkema Inc. (US) | 2020-08-12 | — | — | EP | disclosed |
| EP-3686256-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-07-29 | — | — | EP | disclosed |
| CN-111458980-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2020-07-28 | — | — | CN | disclosed |
| US-20200233303-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-23 | — | — | US | disclosed |
| CN-111423587-A | Thermosetting silicon-containing compound, composition for forming silicon-containing film, and method for forming pattern | 信越化学工业株式会社 | 2020-07-17 | — | — | CN | disclosed |
| EP-3680275-A1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-07-15 | — | — | EP | disclosed |
| US-20200216670-A1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-09 | — | — | US | disclosed |
| CN-108166158-B | Preparation method of waterproof antibacterial double-layer electret electrospun nanofiber composite window screen material | 浙江西大门新材料股份有限公司 | 2020-06-09 | — | — | CN | disclosed |
| CN-108166158-B | Preparation method of waterproof antibacterial double-layer electret electrospun nanofiber composite window screen material | 浙江西大门新材料股份有限公司 | 2020-06-09 | — | — | CN | disclosed |
| CN-111208710-A | Iodine-containing thermosetting silicon-containing material, resist underlayer film-forming composition for extreme ultraviolet lithography containing the same, and pattern formation method | 信越化学工业株式会社 | 2020-05-29 | — | — | CN | disclosed |
| EP-3657254-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-05-27 | — | — | EP | disclosed |
| US-20200159120-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-05-21 | — | — | US | disclosed |
| CN-110325952-A | The manufacturing method of substrate with cloth line electrode and substrate with cloth line electrode | 东丽株式会社 | 2019-10-11 | — | — | CN | disclosed |
| WO-2019067394-A1 | HALOGENATED HETEROALKENYL- AND HETEROALKYL-FUNCTIONALIZED ORGANIC COMPOUNDS AND METHODS FOR PREPARING SUCH COMPOUNDS | ARKEMA INC. (US) | 2019-04-04 | — | — | WO | disclosed |
| CN-109134229-A | A method of preparing cypress oleyl alcohol | 中国农业科学院农业环境与可持续发展研究所 | 2019-01-04 | — | — | CN | disclosed |
| CN-108166158-A | The preparation method of water-proof antibiotic bilayer electret electro spinning nano fiber complex-aperture yarn material | 符思敏 | 2018-06-15 | — | — | CN | disclosed |
| CN-108166158-A | The preparation method of water-proof antibiotic bilayer electret electro spinning nano fiber complex-aperture yarn material | 符思敏 | 2018-06-15 | — | — | CN | disclosed |
| CN-107683272-A | Method For Producing Organic Compound | M技术株式会社 | 2018-02-09 | — | — | CN | disclosed |
| EP-2949650-B1 | Synthetic method for the preparation of 1,2-Benzisothiazolin-3-one | SHOUGUANG SYNTECH FINE CHEMICAL CO LTD (CN) | 2017-10-11 | — | — | EP | disclosed |
| CN-104818513-B | Electroplating pool and metal coating and forming method thereof | 丰田自动车株式会社 | 2017-08-18 | — | — | CN | disclosed |
| US-9708723-B2 | Electroplating cell, and metal coating and method of forming the same | TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) | 2017-07-18 | — | — | US | disclosed |
| US-20170121835-A1 | ALUMINUM PLATING SOLUTION, METHOD FOR MANUFACTURING ALUMINUM FILM, AND POROUS ALUMINUM OBJECT | SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) | 2017-05-04 | — | — | US | disclosed |
| CN-103755658-B | Benzolactam compounds and synthetic method thereof and application | MAX (RUDONG) CHEMICALS CO., LTD. (CN) | 2016-06-01 | — | — | CN | disclosed |
| US-9334248-B2 | Synthetic method for the preparation of 1, 2-benzisothiazolin-3-one | SHOUGUANG SYNTECH FINE CHEMICAL CO., LTD. (CN) | 2016-05-10 | — | — | US | disclosed |
| EP-2949650-A1 | Synthetic method for the preparation of 1,2-Benzisothiazolin-3-one | Shouguang Syntech Fine Chemical Co., Ltd. (CN) | 2015-12-02 | — | — | EP | disclosed |
| US-20150336910-A1 | SYNTHETIC METHOD FOR THE PREPARATION OF 1, 2-BENZISOTHIAZOLIN-3-ONE | SYNTECH EURO LIMITED (GB) | 2015-11-26 | — | — | US | disclosed |
| EP-2925809-A1 | POROUS PARTICLES AND METHODS OF MAKING THEM | Eastman Kodak Company (US) | 2015-10-07 | — | — | EP | disclosed |
| US-9109221-B2 | Particles containing organic catalytic materials and uses | EASTMAN KODAK COMPANY (US) | 2015-08-18 | — | — | US | disclosed |
| EP-2905361-A1 | ELECTROPLATING CELL, METAL COATING AND METHOD OF FORMING THE SAME | Toyota Jidosha Kabushiki Kaisha (JP) | 2015-08-12 | — | — | EP | disclosed |
| US-20150218723-A1 | ELECTROPLATING CELL, AND METAL COATING AND METHOD OF FORMING THE SAME | TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) | 2015-08-06 | — | — | US | disclosed |
| CN-104818513-A | ELECTROPLATING CELL, METAL COATING AND METHOD OF FORMING THE SAME | TOYOTA MOTOR CO LTD | 2015-08-05 | — | — | CN | disclosed |
| CN-103333503-B | Blend rubber and preparation method thereof | CHINA SHENHUA ENERGY CO LTD | 2015-07-15 | — | — | CN | disclosed |
| US-9029431-B2 | Porous particles and methods of making them | EASTMAN KODAK COMPANY (US) | 2015-05-12 | — | — | US | disclosed |
| EP-1238704-B1 | Catalyst comprising a cyclic imide compound and process for producing organic compounds using the catalyst | DAICEL CHEM (JP) | 2015-01-21 | — | — | EP | disclosed |
| CN-102633708-B | Synthesizing and purifying method of midbody 9-(2-ethoxy) carbazole | WUHAN UNIVERSITY OF TECHNOLOGY (CN) | 2014-10-01 | — | — | CN | disclosed |
| CN-103965218-A | Heterocyclic compound and application thereof | UNIV EAST CHINA SCIENCE & TECH | 2014-08-06 | — | — | CN | disclosed |
| WO-2014085151-A1 | POROUS PARTICLES AND METHODS OF MAKING THEM | EASTMAN KODAK COMPANY (US) | 2014-06-05 | — | — | WO | disclosed |
| US-20140147885-A1 | PARTICLES CONTAINING ORGANIC CATALYTIC MATERIALS AND USES | BANK OF AMERICA, N.A., AS AGENT | 2014-05-29 | — | — | US | disclosed |
| US-20140148330-A1 | SEMI-PERMEABLE PARTICLES HAVING METALLIC CATALYSTS AND USES | KODAK (NEAR EAST) INC. | 2014-05-29 | — | — | US | disclosed |
| US-20140148523-A1 | POROUS PARTICLES AND METHODS OF MAKING THEM | BANK OF AMERICA, N.A., AS AGENT | 2014-05-29 | — | — | US | disclosed |
| CN-103755658-A | Benzene and lactam compound and synthetic method and application thereof | MAX RUDONG CHEMICALS CO LTD | 2014-04-30 | — | — | CN | disclosed |
| CN-103611197-A | Method for preparing nano-fiber-based guided bone regeneration membrane | WUXI ZHONGKE GUANGYUAN BIOMATERIALS CO LTD | 2014-03-05 | — | — | CN | disclosed |
| CN-101952237-B | Bromide-free TEMPO-mediated oxidation of the primary alcohol in carbohydrate under two-phase conditions | CHONGQING HUAPONT PHARM CO LTD | 2014-01-08 | — | — | CN | disclosed |
| CN-103333503-A | Blend rubber and preparation method thereof | CHINA SHENHUA ENERGY CO LTD | 2013-10-02 | — | — | CN | disclosed |
| EP-1754693-B9 | Process for the production of esters or lactones | DAICEL CHEM (JP) | 2013-08-14 | — | — | EP | disclosed |
| CN-102143948-B | Preparation method of (S) - (-) -felodipine | AHN GOOK PHARMACEUTICAL CO LTD | 2013-07-31 | — | — | CN | disclosed |
| CN-102382022-B | Method for directly preparing thiodiglycol dimethyl acrylate | UNIV JIANGNAN | 2013-07-03 | — | — | CN | disclosed |
| EP-1754693-B1 | Process for the production of esters or lactones | DAICEL CHEM (JP) | 2013-02-06 | — | — | EP | disclosed |
| CN-102030701-B | Fluoradene derivative and preparation method thereof | UNIV EAST CHINA NORMAL | 2012-10-03 | — | — | CN | disclosed |
| CN-102633708-A | Synthesizing and purifying method of midbody 9-(2-ethoxy) carbazole | UNIV WUHAN TECH | 2012-08-15 | — | — | CN | disclosed |
| EP-1471047-B1 | PROCESS FOR PRODUCING DICARBOXYLIC ACID | DAICEL CORP (JP) | 2012-08-08 | — | — | EP | disclosed |
| CN-102382022-A | One-pot method for directly preparing thiodiglycol dimethyl acrylate | UNIV JIANGNAN | 2012-03-21 | — | — | CN | disclosed |
| US-20120003581-A1 | METHOD OF MANUFACTURING WAX-CONTAINING POLYMER PARTICLES | PAKON, INC. | 2012-01-05 | — | — | US | disclosed |
| US-8085363-B2 | Coatable conductive layer | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2011-12-27 | — | — | US | disclosed |
| US-8058335-B2 | Wax dispersions for toners | EASTMAN KODAK COMPANY (US) | 2011-11-15 | — | — | US | disclosed |
| US-8053022-B2 | Coatable conductive layer | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2011-11-08 | — | — | US | disclosed |
| US-8025938-B2 | Sensitized photochemical switching for cholesteric liquid crystal displays | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2011-09-27 | — | — | US | disclosed |
| US-8026034-B2 | Enhanced fusing for electrophotographic toners | EASTMAN KODAK COMPANY (US) | 2011-09-27 | — | — | US | disclosed |
| CN-102143948-A | Preparation method of (S) - (-) -felodipine | AHN GOOK PHARMACEUTICAL CO LTD | 2011-08-03 | — | — | CN | disclosed |
| CN-101165236-B | High hydrolytic resistance polylactic acid fibre products | TORAY FIBER RES INST CN CO LTD | 2011-07-27 | — | — | CN | disclosed |
| CN-101074501-B | Polylactic fibre product with excellent anti-hydrolytic performance at high-temperature and high-humidity and its production | TORAY FIBERS AND TEXTILES RES LAB CHINA CO LTD | 2011-05-18 | — | — | CN | disclosed |
| CN-102030701-A | Fluoradene derivative and preparation method thereof | UNIV EAST CHINA NORMAL | 2011-04-27 | — | — | CN | disclosed |
| CN-101952237-A | Bromide-free TEMPO-mediated oxidation of the primary alcohol in carbohydrate under two-phase conditions | CHONGQING SHENGKAI SCIENCE & T | 2011-01-19 | — | — | CN | disclosed |
| US-20100317869-A1 | IMMOBILIZED CYCLIC IMIDE CATALYST AND PROCESS FOR OXIDATION OF ORGANIC COMPOUNDS WITH THE SAME | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-16 | — | — | US | disclosed |
| US-7759515-B2 | Catalyst comprising N-substituted cyclic imide compound and process for producing organic compounds using the catalyst | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-07-20 | — | — | US | disclosed |
| US-20100159384-A1 | ENHANCED FUSING FOR ELECTROPHOTOGRAPHIC TONERS | BANK OF AMERICA, N.A., AS AGENT | 2010-06-24 | — | — | US | disclosed |
| US-7741514-B2 | Catalyst comprising N-substituted cyclic imide compound and process for producing organic compound using the catalyst | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-06-22 | — | — | US | disclosed |
| EP-1459804-B1 | CATALYSTS COMPRISING CYCLIC ACYLUREA COMPOUNDS AND OXIDATION AND NITRATION REACTIONS OF ORGANIC COMPOUNDS IN THE PRESENCE OF THE SAME | DAICEL CHEM (JP) | 2010-06-02 | — | — | EP | disclosed |
| US-7728149-B2 | Process for producing dicarboxylic acid | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-06-01 | — | — | US | disclosed |
| US-7704568-B2 | Sensitized photochemical switching for cholesteric liquid crystal displays | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2010-04-27 | — | — | US | disclosed |
| US-7696270-B2 | Method of manufacturing a wax dispersion | EASTMAN KODAK COMPANY (US) | 2010-04-13 | — | — | US | disclosed |
| US-20100068418-A1 | Sensitized Photochemical Switching for Cholesteric Liquid Crystal Displays | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE | 2010-03-18 | — | — | US | disclosed |
| US-7642035-B2 | a photo-reactive chiral compound, capable of undergoing a photochemical reaction resulting in the loss of the chirality of such photo-reactive chiral compound, and a triplet sensitize; photochemical reaction is triplet sensitization resulting in racemization and/or isomerization | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2010-01-05 | — | — | US | disclosed |
| US-7630029-B2 | Conductive absorption layer for flexible displays | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2009-12-08 | — | — | US | disclosed |
| US-20090286911-A1 | WAX DISPERSIONS FOR TONERS | BANK OF AMERICA, N.A., AS AGENT | 2009-11-19 | — | — | US | disclosed |
| EP-2116303-A1 | IMMOBILIZED CYCLIC IMIDE CATALYST AND PROCESS FOR OXIDATION OF ORGANIC COMPOUNDS WITH THE SAME | Daicel Chemical Industries, Ltd. (JP) | 2009-11-11 | — | — | EP | disclosed |
| CN-100537031-C | Processes for production of organic compounds | DAICEL CHEM (JP) | 2009-09-09 | — | — | CN | disclosed |
| WO-2009089677-A1 | THEOBROMINE PRODUCTION PROCESS | PERRIGO TRADING (SHANGHAI) CO., LTD. (CN) | 2009-07-23 | — | — | WO | disclosed |
| US-7563389-B2 | Sensitized photochemical switching for cholesteric liquid crystal displays | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2009-07-21 | — | — | US | disclosed |
| US-7564528-B2 | Conductive layer to reduce drive voltage in displays | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2009-07-21 | — | — | US | disclosed |
| EP-1188743-B1 | PROCESS FOR PREPARING ORGANIC SULFUR ACIDS OR SALTS THEREOF | DAICEL CHEM (JP) | 2009-06-17 | — | — | EP | disclosed |
| US-7532290-B2 | Barrier layers for coating conductive polymers on liquid crystals | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2009-05-12 | — | — | US | disclosed |
| US-20090092770-A1 | Sensitized photochemical switching for cholesteric liquid crystal displays | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2009-04-09 | — | — | US | disclosed |
| US-20090092907-A1 | Sensitized photochemical switching for cholesteric liquid crystal displays | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2009-04-09 | — | — | US | disclosed |
| US-20090081359-A1 | COATABLE CONDUCTIVE LAYER | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (ITRI) (TW) | 2009-03-26 | — | — | US | disclosed |
| EP-2035491-A2 | DISPERSANTS FOR WAXES | EASTMAN KODAK COMPANY (US) | 2009-03-18 | — | — | EP | disclosed |
| US-7470376-B2 | Photochemically active chiral compounds and compositions containing the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2008-12-30 | — | — | US | disclosed |
| US-7452482-B2 | Photochemically active chiral compounds and compositions containing the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2008-11-18 | — | — | US | disclosed |
| US-20080214386-A1 | Stability; easily separated from solution; surface treatment of catalyst with Group seven compound; reacting epoxide with carbon dioxide | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2008-09-04 | — | — | US | disclosed |
| CN-101250765-A | High hydrolytic resistance polylactic acid fibre | TORAY FIBER RES INST CN CO LTD (CN) | 2008-08-27 | — | — | CN | disclosed |
| EP-1350786-B1 | PROCESS FOR PRODUCTION OF DICARBOXYLIC ACIDS | DAICEL CHEM (JP) | 2008-08-13 | — | — | EP | disclosed |
| US-7372530-B2 | UV curable conductive layers in LC displays | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2008-05-13 | — | — | US | disclosed |
| US-7368615-B2 | Catalyst comprising a cyclic imide compound and process for producing organic compounds using the catalyst | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2008-05-06 | — | — | US | disclosed |
| CN-101165236-A | High hydrolytic resistance polylactic acid fibre products | TORAY FIBER RES INST CN CO LTD (CN) | 2008-04-23 | — | — | CN | disclosed |
| US-7333166-B2 | Matrix display through thermal treatment | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2008-02-19 | — | — | US | disclosed |
| CN-100360543-C | Method for preparing ammonium salts of cyclohexanpentol phosphate ester | UNIV SICHUAN NORMAL (CN) | 2008-01-09 | — | — | CN | disclosed |
| CN-100360544-C | Ammonium salt of cyclohexanpentol and its use | UNIV SICHUAN NORMAL (CN) | 2008-01-09 | — | — | CN | disclosed |
| WO-2007149239-A2 | DISPERSANTS FOR WAXES | EASTMAN KODAK COMPANY (US) | 2007-12-27 | — | — | WO | disclosed |
| US-20070299191-A1 | Dispersants form waxes | EASTMAN KODAK COMPANY | 2007-12-27 | — | — | US | disclosed |
| CN-101074501-A | Polylactic fibre product with excellent anti-hydrolytic performance at high-temperature and high-humidity and its production | DONGLI FIBRE INST CHINA CO LTD (CN) | 2007-11-21 | — | — | CN | disclosed |
| US-7288649-B2 | Catalyst comprising cyclic acylurea compound and process for producing organic compounds using the catalyst | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2007-10-30 | — | — | US | disclosed |
| US-20070243342-A1 | Sensitized photochemical switching for cholesteric liquid crystal displays | EASTMAN KODAK COMPANY | 2007-10-18 | — | — | US | disclosed |
| EP-1794643-A1 | ANTISTATIC LAYER FOR ELECTRICALLY MODULATED DISPLAY | EASTMAN KODAK COMPANY (US) | 2007-06-13 | — | — | EP | disclosed |
| EP-1754693-A1 | Process for the production of esters or lactones, and process for the production of peroxides | Daicel Chemical Industries, Ltd. (JP) | 2007-02-21 | — | — | EP | disclosed |
| CN-1300085-C | Process for producing dicarboxylic acid | DAICEL CHEM (JP) | 2007-02-14 | — | — | CN | disclosed |
| EP-0990631-B1 | PROCESS FOR COOXIDIZING ORGANIC COMPOUNDS | DAICEL CHEM (JP) | 2007-01-24 | — | — | EP | disclosed |
| US-20070013829-A1 | COATABLE CONDUCTIVE LAYER | HKC Corporation Limited (CN) | 2007-01-18 | — | — | US | disclosed |
| CN-1291760-C | Poly alpha-alcohol acid ester/chitosan ultrafine fiber hybridization film material and its preparation | UNIV TIANJIN (CN) | 2006-12-27 | — | — | CN | disclosed |
| US-7153620-B2 | Transparent invisible conductive grid | EASTMAN KODAK COMPANY (US) | 2006-12-26 | — | — | US | disclosed |
| US-20060281629-A1 | Catalyst comprising N-substituted cyclic imide compound and process for producing organic compound using the catalyst | ISHII YASUTAKA | 2006-12-14 | — | — | US | disclosed |
| WO-2006127265-A1 | CONDUCTIVE DRIVE VOLTAGE REDUCTION LAYER IN DISPLAYS | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2006-11-30 | — | — | WO | disclosed |
| US-20060262245-A1 | Conductive layer to reduce drive voltage in displays | EASTMAN KODAK COMPANY | 2006-11-23 | — | — | US | disclosed |
| US-20060262260-A1 | Barrier layers for coating conductive polymers on liquid crystals | EASTMAN KODAK COMPANY | 2006-11-23 | — | — | US | disclosed |
| CN-1847240-A | Prazole derivative and its salt and use | JIANGSU HAOSEN PHARMACEUTICAL (CN) | 2006-10-18 | — | — | CN | disclosed |
| US-20060229196-A1 | Catalyst comprising n-substituted cyclic imide compound and process for producing organic compounds using the catalyst | ISHII YASUTAKA | 2006-10-12 | — | — | US | disclosed |
| US-7119859-B2 | Contrast chiral nematic liquid crystal displays | EASTMAN KODAK CIMPANY (US) | 2006-10-10 | — | — | US | disclosed |
| US-7115541-B2 | Catalyst comprising n-substituted cyclic imides and processes for preparing organic compounds with the catalyst | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-10-03 | — | — | US | disclosed |
| CN-1830986-A | Method for preparing ammonium salts of cyclohexanpentol phosphate ester | UNIV SICHUAN NORMAL (CN) | 2006-09-13 | — | — | CN | disclosed |
| CN-1830987-A | Ammonium salt of cyclohexanpentol and its use | UNIV SICHUAN NORMAL (CN) | 2006-09-13 | — | — | CN | disclosed |
| CN-1272105-C | Catalysts comprising N-substituted cyclic imides and processes for prepairing organic compounds with catalysts | DAICEL CHEM (JP) | 2006-08-30 | — | — | CN | disclosed |
| US-20060181658-A1 | Conductive absorption layer for flexible displays | EASTMAN KODAK COMPANY | 2006-08-17 | — | — | US | disclosed |
| US-7091342-B2 | Catalyst comprising cyclic acylurea compounds and processes for production organic compounds with the same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-08-15 | — | — | US | disclosed |
| US-7087351-B2 | Antistatic layer for electrically modulated display | EASTMAN KODAK COMPANY (US) | 2006-08-08 | — | — | US | disclosed |
| US-7084090-B2 | Catalyst comprised of n-substituted cyclic imides and processes for preparing organic compounds with the catalyst | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-08-01 | — | — | US | disclosed |
| CN-1803793-A | Razole derivatives and application thereof | JIANGSU HAOSEN PHARMACEUTICAL (CN) | 2006-07-19 | — | — | CN | disclosed |
| CN-1264607-C | Catalysts comprised of N-substituted cyclic imides and processes for preparing organic compounds with catalysts | DAICEL CHEM (JP) | 2006-07-19 | — | — | CN | disclosed |
| US-20060124899-A1 | Photochemically active chiral compounds and compositions containing the same | EASTMAN KODAK COMPANY | 2006-06-15 | — | — | US | disclosed |
| US-20060091357-A1 | Photochemically active chiral compounds and compositions containing the same | IRIS OPTRONICS CO., LTD. (TW) | 2006-05-04 | — | — | US | disclosed |
| WO-2006039230-A1 | ANTISTATIC LAYER FOR ELECTRICALLY MODULATED DISPLAY | EASTMAN KODAK COMPANY (US) | 2006-04-13 | — | — | WO | disclosed |
| US-20060068329-A1 | Antistatic layer for electrically modulated display | CITICORP NORTH AMERICA, INC., AS AGENT | 2006-03-30 | — | — | US | disclosed |
| US-7015356-B2 | Process for producing dicarboxylic acids | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-21 | — | — | US | disclosed |
| EP-1629323-A1 | UV CURABLE CONDUCTIVE MATERIALS IN DISPLAYS | EASTMAN KODAK COMPANY (US) | 2006-03-01 | — | — | EP | disclosed |
| US-20060036100-A1 | Catalyst comprising a cyclic imide compound and process for producing organic compounds using the catalyst | ISHII YASUTAKA | 2006-02-16 | — | — | US | disclosed |
| US-6998491-B2 | Catalyst comprising a cyclic imide compound | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-02-14 | — | — | US | disclosed |
| US-20060030716-A1 | Catalyst comprising cyclic acylurea compound and process for producing organic compounds using the catalyst | ISHII YASUTAKA | 2006-02-09 | — | — | US | disclosed |
| US-20050270441-A1 | Contrast chiral nematic liquid crystal displays | EASTMAN KODAK COMPANY | 2005-12-08 | — | — | US | disclosed |
| US-20050259211-A1 | Matrix display through thermal treatment | EASTMAN KODAK COMPANY | 2005-11-24 | — | — | US | disclosed |
| EP-1120438-B1 | METHOD FOR SURFACE MODIFICATION OF MOLDED ARTICLE OF PLASTIC AND METHOD FOR MODIFYING POLYMER | DAICEL CHEM (JP) | 2005-11-23 | — | — | EP | disclosed |
| CN-1692094-A | Process for producing dicarboxylic acid | DAICEL CHEM (JP) | 2005-11-02 | — | — | CN | disclosed |
| US-20050237473-A1 | Coatable conductive layer | EASTMAN KODAK COMPANY | 2005-10-27 | — | — | US | disclosed |
| WO-2005038522-A2 | TRANSPARENT INVISIBLE CONDUCTIVE GRID | EASTMAN KODAK COMPANY (US) | 2005-04-28 | — | — | WO | disclosed |
| CN-1607980-A | Catalyst comprising cyclic acylurea compounds and processes for production organic compounds with the same | DAICEL CHEM (JP) | 2005-04-20 | — | — | CN | disclosed |
| US-20050080289-A1 | Process for producing dicarboxylic acid | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-14 | — | — | US | disclosed |
| US-20050064154-A1 | Transparent invisible conductive grid | EASTMAN KODAK COMPANY | 2005-03-24 | — | — | US | disclosed |
| US-20050020439-A1 | Catalyst comprising cyclic acylurea compounds and processes for production organic compounds with the same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-01-27 | — | — | US | disclosed |
| CN-1569255-A | Poly alpha-alcohol acid ester/chitosan ultrafine fiber hybridization film material and its preparation | UNIV TIANJIN (CN) | 2005-01-26 | — | — | CN | disclosed |
| WO-2004109382-A1 | UV CURABLE CONDUCTIVE MATERIALS IN DISPLAYS | EASTMAN KODAK COMPANY (US) | 2004-12-16 | — | — | WO | disclosed |
| US-20040246413-A1 | UV curable conductive materials in displays | EASTMAN KODAK COMPANY | 2004-12-09 | — | — | US | disclosed |
| EP-1471047-A1 | PROCESS FOR PRODUCING DICARBOXYLIC ACID | Daicel Chemical Industries, Ltd. (JP) | 2004-10-27 | — | — | EP | disclosed |
| EP-1459804-A1 | CATALYSTS COMPRISING CYCLIC ACYLUREA COMPOUNDS AND PROCESSES FOR PRODUCTION OF ORGANIC COMPOUNDS WITH THE SAME | Daicel Chemical Industries, Ltd. (JP) | 2004-09-22 | — | — | EP | disclosed |
| US-6768030-B2 | ALLOWING CYCLOALKANE TO REACT WITH OXYGEN IN PRESENCE OF CATALYTIC IMIDE COMPOUND HAVING N-HYDROXY (OR N-OXO) CYCLIC IMIDE SKELETON TO YIELD CORRESPONDING BIS(1-HYDROXYCYCLOALKYL) PEROXIDE | DAICEL CORPORATION INDUSTRIES, LTD. (JP) | 2004-07-27 | — | — | US | disclosed |
| EP-1433527-A1 | CATALYSTS COMPRISED OF N-SUBSTITUTED CYCLIC IMIDES AND PROCESSES FOR PREPARING ORGANIC COMPOUNDS WITH THE CATALYSTS | Daicel Chemical Industries, Ltd. (JP) | 2004-06-30 | — | — | EP | disclosed |
| US-6723852-B2 | REACTING AN N-OXIDE OF METHYLPYRIDINE COMPOUND WITH ANHYDRIDE OF AN ACTIVATED CARBOXYLIC ACID OR WITH ANHYDRIDE OF SULFONIC ACID IN SOLVENT; REACTING INTERMEDIATE WITH DERIVATIVE OF 2-MERCAPTOBENZOMIDAZOL | ESTEVE QUIMICA, S.A. (ES) | 2004-04-20 | — | — | US | disclosed |
| US-20040053778-A1 | Catalyst comprised of n-substituted cyclic imides and processes for preparing organic compounds with the catalyst | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2004-03-18 | — | — | US | disclosed |
| US-6706915-B2 | USING A METAL COMPOUND AS A CATALYST, A CORRESPONDING ORGANIC SULFONIC ACID OR A SALT CAN BE OBTAINED BY REACTING AN ORGANIC SUBSTRATE WITH A SULFUR OXIDE IN THE ABSENCE OF N-HYDROXY AND N-OXO CYCLIC IMIDE COMPOUNDS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2004-03-16 | — | — | US | disclosed |
| US-20040039215-A1 | A cycloalkane reacts with oxygen in the presence of a catalyst having an N-hydroxyimide skeleton to yield the corresponding bi(1-hydroxy-cycloalkyl)peroxide; efficiency; intermediates for polylactones and polylactams | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2004-02-26 | — | — | US | disclosed |
| CN-1476352-A | Catalysts comprised of N-substituted cyclic imides and processes for preparing organic compounds with catalysts | ����贻�ѧ��ҵ��ʽ���� | 2004-02-18 | — | — | CN | disclosed |
| US-20040024248-A1 | Process for producing dicarboxylic acids | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2004-02-05 | — | — | US | disclosed |
| EP-1081150-B1 | 4-Oxatricyclo(4.3.1.1-3,8)undecan-5-one derivatives and process for producing the same | DAICEL CHEM (JP) | 2003-10-29 | — | — | EP | disclosed |
| EP-1350786-A1 | PROCESS FOR PRODUCTION OF DICARBOXYLIC ACIDS | Daicel Chemical Industries, Ltd. (JP) | 2003-10-08 | — | — | EP | disclosed |
| US-6613503-B1 | Reflection support and overcoat layer comprising hydrophilic binder and lubricant; wear resistance | EASTMAN KODAK COMPANY | 2003-09-02 | — | — | US | disclosed |
| EP-1338336-A1 | CATALYSTS COMPRISING N-SUBSTITUTED CYCLIC IMIDES AND PROCESSES FOR PREPARING ORGANIC COMPOUNDS WITH THE CATALYSTS | Daicel Chemical Industries, Ltd. (JP) | 2003-08-27 | — | — | EP | disclosed |
| EP-1036788-B1 | Process for producing sulfonic acids or salts thereof | DAICEL CHEM (JP) | 2003-06-04 | — | — | EP | disclosed |
| EP-1070678-B1 | PROCESS FOR PRODUCING HYDROGEN PEROXIDE | DAICEL CHEM (JP) | 2003-05-07 | — | — | EP | disclosed |
| US-6558838-B1 | Non-aqueous electrolyte comprising an aluminum compound, cells using the electrolyte and a method for the electrodeposition of aluminum from the electrolyte | SONY CORPORATION (JP) | 2003-05-06 | — | — | US | disclosed |
| US-20030036656-A1 | Method for obtaining derivatives of [ [(pyridil substituted)methyl]thio]benzomidazol | ESTEVE QUIMICA, S.A. (ES) | 2003-02-20 | — | — | US | disclosed |
| CN-1395507-A | Catalysts comprising N-substituted cyclic imides and processes for prepairing organic compounds with catalysts | DAICEL CHEM (JP) | 2003-02-05 | — | — | CN | disclosed |
| US-20030013603-A1 | Catalyst comprising n-substituted cylic imides and processes for preparing organic compounds with the catalyst | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-01-16 | — | — | US | disclosed |
| US-6486265-B1 | Method for surface modification of molded article of plastic and method for modifying polymer | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-11-26 | — | — | US | disclosed |
| US-6486330-B1 | 4-oxatricyclo[4.3.1.1 3,8]undecan-5-one derivative and process for producing the same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-11-26 | — | — | US | disclosed |
| US-20020161255-A1 | Process for preparing organic sulfur acids or salts thereof | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-10-31 | — | — | US | disclosed |
| US-20020128149-A1 | Catalyst comprising a cyclic imide compound and process for producing organic compounds using the catalyst | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-09-12 | — | — | US | disclosed |
| EP-1238704-A2 | Catalyst comprising a cyclic imide compound and process for producing organic compounds using the catalyst | Daicel Chemical Industries, Ltd. (JP) | 2002-09-11 | — | — | EP | disclosed |
| US-6426161-B1 | LIGHTWEIGHT BIPOLAR PLATE COMPRISING GAS FLOW CHANNELS AND CONTACT SURFACES, CHARACTERIZED IN THAT PLATE COMPRISES LIGHT METAL SELECTED FROM ALUMINUM, MAGNESIUM AND MIXTURES THEREOF AND SURFACES OF GAS FLOW CHANNELS ARE HYDROPHOBIC | LYNNTECH, INC. | 2002-07-30 | — | — | US | disclosed |
| US-6403521-B1 | FOR OXIDATION, NITRATION, CARBOXYLATION, SULFONATION; NO EXHAUST GAS TREATMENT; 6-TRIFLUOROMETHYL-L-HYDROXY BENZOTRIAZOLE; 3-HYDROXY-4-OXO-1,2,3-BENZOTRIAZINE TO OXIDIZE FLUORENE TO FLUORENONE; ADAMANTANE TO ADAMANTANOL | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-06-11 | — | — | US | disclosed |
| US-6375922-B1 | OXIDATION OF ALCOHOL WITH OXYGEN IN PRESENCE OF (N-HYDROXY-) SUCCINIMIDE DERIVATIVE | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-04-23 | — | — | US | disclosed |
| EP-1188743-A1 | PROCESS FOR PREPARING ORGANIC SULFUR ACIDS OR SALTS THEREOF | Daicel Chemical Industries, Ltd. (JP) | 2002-03-20 | — | — | EP | disclosed |
| EP-0634407-B1 | Process for production of tris(tribromophenoxy)-s-triazine | DAI ICHI KOGYO SEIYAKU CO LTD (JP) | 2001-10-10 | — | — | EP | disclosed |
| EP-1120438-A1 | METHOD FOR SURFACE MODIFICATION OF MOLDED ARTICLE OF PLASTIC AND METHOD FOR MODIFYING POLYMER | Daicel Chemical Industries, Ltd. (JP) | 2001-08-01 | — | — | EP | disclosed |
| US-6229023-B1 | N-OXY OR HYDROXY CYCLIC IMIDE OXIDATION CATALYST | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2001-05-08 | — | — | US | disclosed |
| EP-1085015-A2 | Catalyst comprising a nitrogen-containing heterocylic compound | Daicel Chemical Industries, Ltd. (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-1081150-A1 | 4-Oxatricyclo(4.3.1.1-3,8)undecan-5-one derivatives and process for producing the same | Daicel Chemical Industries, Ltd. (JP) | 2001-03-07 | — | — | EP | disclosed |
| EP-1070678-A1 | PROCESS FOR PRODUCING HYDROGEN PEROXIDE | Daicel Chemical Industries, Ltd. (JP) | 2001-01-24 | — | — | EP | disclosed |
| US-6143924-A | Process for producing organic sulfur acids or salts thereof | DAICEL CHEMICAL INDUSTRIES, LTD (JP) | 2000-11-07 | — | — | US | disclosed |
| EP-1036788-A1 | Process for producing sulfonic acids or salts thereof | Daicel Chemical Industries, Ltd. (JP) | 2000-09-20 | — | — | EP | disclosed |
| US-6083647-A | ALUMINUM HALIDE AND QUARTERNARY AMMONIUM HALIDE IN O-AND/OR M-DICHLOROBENZENE; CHARGING AND DISCHARGING; HIGH ENERGY DENSITY | SONY CORPORATION (JP) | 2000-07-04 | — | — | US | disclosed |
| US-6075142-A | CATALYTICALLY REACTING CYANURIC CHLORIDE AND AQUEOUS TRIBROMOPHENOLATE SOLUTION CONTAINING A REDUCING AGENT AND A PHASE TRANSFER CATALYST TO FORM TRIS/TRIBROMOPHENOXY/-S-TRAIZINE | DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) | 2000-06-13 | — | — | US | disclosed |
| EP-0990631-A1 | PROCESS FOR COOXIDIZING ORGANIC COMPOUNDS, PROCESS FOR PRODUCING EPOXY COMPOUNDS AND PROCESS FOR PRODUCING ESTERS OR LACTONES | Daicel Chemical Industries, Ltd. (JP) | 2000-04-05 | — | — | EP | disclosed |
| EP-0735084-B1 | Flame retardant thermoplastic styrenic resin composition | DAI ICHI KOGYO SEIYAKU CO LTD (JP) | 2000-01-12 | — | — | EP | disclosed |
| EP-0816915-B1 | Use of large particle size lubricants in the protective overcoat of photographic papers | EASTMAN KODAK CO (US) | 1999-12-29 | — | — | EP | disclosed |
| EP-0633253-B1 | Process for production of tris(tribromophenoxy)-s-triazine | DAI ICHI KOGYO SEIYAKU CO LTD (JP) | 1999-09-01 | — | — | EP | disclosed |
| US-5907040-A | REACTION OF CYANURIC CHLORIDE WITH BROMOPHENOL AND TERT-AMINECATALYSTS | DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) | 1999-05-25 | — | — | US | disclosed |
| US-5777007-A | Brominated p-cumylphenol flame-retardants for resin composition | TOSOH CORPORATION (JP) | 1998-07-07 | — | — | US | disclosed |
| EP-0816915-A2 | Use of large particle size lubricants in the protective overcoat of photographic papers | EASTMAN KODAK COMPANY (US) | 1998-01-07 | — | — | EP | disclosed |
| US-5696302-A | INTERMEDIATES FOR PRODUCING TRIS(TRIBROMOPHENOXY)-S-TRIAZINE | DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) | 1997-12-09 | — | — | US | disclosed |
| EP-0742479-A2 | Lubricant particles, method of preparation, and photographic elements | EASTMAN KODAK COMPANY (US) | 1996-11-13 | — | — | EP | disclosed |
| EP-0735084-A1 | Flame retardant thermoplastic styrenic resin composition | DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) | 1996-10-02 | — | — | EP | disclosed |
| US-5554458-A | ANODE OF ALUMINUM OR IT ALLOYS, IRON SULFIDE CATHODE, NONAQUEOUS SOLVENT AND ELECTROLYTES COMPRISING ALUMINUM AND ORGANIC HALIDES; EXCELLENT RECHARGING | SONY CORPORATION (JP) | 1996-09-10 | — | — | US | disclosed |
| US-5541048-A | Lubricant particles, method of preparation, and photographic elements | EASTMAN KODAK COMPANY (US) | 1996-07-30 | — | — | US | disclosed |
| CN-1031265-C | Tetrahydropyrimidine-containing pest control compositions | TAKEDA CHEMICAL INDUSTRIES LTD (JP) | 1996-03-13 | — | — | CN | disclosed |
| US-5498714-A | FROM CYANURIC CHLORIDE AND TRIBROMOPHENOLATE, PHASE TRANSFER AGENT, REDUCING AGENT TO PREVENT POLYMERIZATION | DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) | 1996-03-12 | — | — | US | disclosed |
| US-5451632-A | Polycarbonate-polyorganosiloxane copolymer and a resin composition | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 1995-09-19 | — | — | US | disclosed |
| CN-1102828-A | Tetrahydropyrimidines, their production and use | TAKEDA CHEMICAL INDUSTRIES LTD (JP) | 1995-05-24 | — | — | CN | disclosed |
| EP-0634407-A1 | Process for production of tris(tribromophenoxy)-s-triazine | DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) | 1995-01-18 | — | — | EP | disclosed |
| EP-0633253-A1 | Process for production of tris(tribromophenoxy)-s-triazine | DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) | 1995-01-11 | — | — | EP | disclosed |
| EP-0595141-A1 | A polycarbonate-polyorganosiloxane copolymer and a resin composition | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 1994-05-04 | — | — | EP | disclosed |
| US-5093497-A | PROCESS FOR THE PREPARATION OF A SUBSTITUTED OR UNSUBSTITUTED QUINACRIDONE | BAYER AKTIENGESELLSCHAFT (DE) | 1992-03-03 | — | — | US | disclosed |
| US-4981997-A | Process for the preparation of 2,5-diarylaminoterephthalic acids | BAYER AKTIENGESELLSCHAFT (DE) | 1991-01-01 | — | — | US | disclosed |
| CN-1042149-A | Tetrahydropyrimidines, their preparation and use | TAKEDA CHEMICAL INDUSTRIES LTD (JP) | 1990-05-16 | — | — | CN | disclosed |
| US-4356285-A | SUITABLE FOR POWDER COATING | HITACHI CHEMICAL CO., LTD. (JP) | 1982-10-26 | — | — | US | disclosed |
| US-4299989-A | Preparation of ketones | UOP INC. (US) | 1981-11-10 | — | — | US | disclosed |
| JP-S55151037-A | THIXOTROPIC RESIN COMPOSITION | HITACHI CHEM CO LTD | 1980-11-25 | — | — | JP | disclosed |
| US-4223166-A | BROMINATION OF A CHLOROPHENOL USING AN INORGANIC TERTIARY AMINE SALT OR QUATERNARY AMMONIUM SALT | SOCIETE ANONYME POUR L'INDUSTRIE CHIMIQUE (FR) | 1980-09-16 | — | — | US | disclosed |
| US-4148204-A | PRETREATMENT BY LIQUID-DROP EROSION TO REMOVE SCALE AND THEN ELECTROPLATING | SIEMENS AKTIENGESELLSCHAFT (DE) | 1979-04-10 | — | — | US | disclosed |
| US-4101386-A | DESCALING, ELECTROPLATING | SIEMENS AKTIENGESELLSCHAFT (DE) | 1978-07-18 | — | — | US | disclosed |
| US-3969195-A | Methods of coating and surface finishing articles made of metals and their alloys | SIEMENS AKTIENGESELLSCHAFT (DT) | 1976-07-13 | — | — | US | disclosed |
| US-3932477-A | COORDINATION CATALYSTS, OXYGEN SCAVENGERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-01-13 | — | — | US | disclosed |
| US-3932477-A | COORDINATION CATALYSTS, OXYGEN SCAVENGERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-01-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (23 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040039215-A1 | A cycloalkane reacts with oxygen in the presence of a catalyst having an N-hydroxyimide skeleton to yield the corresponding bi(1-hydroxy-cycloalkyl)peroxide; efficiency; intermediates for polylactones and polylactams | HAO2, CBR1, CYC1 | GAA 3689/4885GABRA1 648/4885GABRB2 1198/4885 |
| US-20100317869-A1 | IMMOBILIZED CYCLIC IMIDE CATALYST AND PROCESS FOR OXIDATION OF ORGANIC COMPOUNDS WITH THE SAME | AOC2, NOXO1, NOX1 | GAA 3690/4885GABRA1 2852/4885GABRB2 3770/4885 |
| US-20200159120-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | RPS4X, SIK3, MLX | GAA 3855/4885GABRA1 4460/4885GABRB2 4310/4885 |
| US-20050080289-A1 | Process for producing dicarboxylic acid | OGDH, MCCC2, PCCA | GAA 2843/4885GABRA1 742/4885GABRB2 628/4885 |
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SMC1A, CDH1, SMC4 | GAA 1927/4885GABRA1 4512/4885GABRB2 4680/4885 |
| US-20040024248-A1 | Process for producing dicarboxylic acids | OGDH, HAO2, HOGA1 | GAA 3170/4885GABRA1 628/4885GABRB2 832/4885 |
| US-20220221793-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | SMC1A, CDH1, SMC4 | GAA 1927/4885GABRA1 4512/4885GABRB2 4680/4885 |
| US-20030036656-A1 | Method for obtaining derivatives of [ [(pyridil substituted)methyl]thio]benzomidazol | TPMT, CYP2C8, HRH2 | GAA 2162/4885GABRA1 199/4885GABRB2 689/4885 |
| US-20060229196-A1 | Catalyst comprising n-substituted cyclic imide compound and process for producing organic compounds using the catalyst | NOS2, NOS1, NOS3 | GAA 1742/4885GABRA1 313/4885GABRB2 380/4885 |
| US-12332565-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | RPS4X, SIK3, MLX | GAA 3855/4885GABRA1 4460/4885GABRB2 4310/4885 |
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | RPS4X, SIK3, MLX | GAA 3855/4885GABRA1 4460/4885GABRB2 4310/4885 |
| US-20060091357-A1 | Photochemically active chiral compounds and compositions containing the same | GNG2, CRY2, CRY1 | GAA 4168/4885GABRA1 4550/4885GABRB2 4486/4885 |
| US-20200283351-A1 | HALOGENATED HETEROALKENYL- AND HETEROALKYL-FUNCTIONALIZED ORGANIC COMPOUNDS AND METHODS FOR PREPARING SUCH COMPOUNDS | SOAT2, SOAT1, PNMT | GAA 4274/4885GABRA1 946/4885GABRB2 1332/4885 |
| US-20150336910-A1 | SYNTHETIC METHOD FOR THE PREPARATION OF 1, 2-BENZISOTHIAZOLIN-3-ONE | TST, AQP1, BZW1 | GAA 4375/4885GABRA1 666/4885GABRB2 1068/4885 |
| US-20020161255-A1 | Process for preparing organic sulfur acids or salts thereof | BHMT2, TST, ICMT | GAA 4227/4885GABRA1 863/4885GABRB2 1290/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | GAA 4777/4885GABRA1 3689/4885GABRB2 3898/4885 |
| US-20060281629-A1 | Catalyst comprising N-substituted cyclic imide compound and process for producing organic compound using the catalyst | NOS2, NOS1, NOS3 | GAA 1711/4885GABRA1 334/4885GABRB2 401/4885 |
| US-20020128149-A1 | Catalyst comprising a cyclic imide compound and process for producing organic compounds using the catalyst | NOX4, POR, NOX1 | GAA 3661/4885GABRA1 2725/4885GABRB2 3000/4885 |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | RPS4X, SIK3, MLX | GAA 3855/4885GABRA1 4460/4885GABRB2 4310/4885 |
| US-20240132431-A1 | METHOD FOR ALKYLATING ACIDIC FUNCTIONAL GROUP | MGMT, MCL1, FANCF | GAA 695/4885GABRA1 937/4885GABRB2 1381/4885 |
| US-20060030716-A1 | Catalyst comprising cyclic acylurea compound and process for producing organic compounds using the catalyst | MOGAT2, HAT1, ACOX1 | GAA 384/4885GABRA1 3434/4885GABRB2 3280/4885 |
| US-20060036100-A1 | Catalyst comprising a cyclic imide compound and process for producing organic compounds using the catalyst | NOX4, NOX1, POR | GAA 3878/4885GABRA1 3266/4885GABRB2 3682/4885 |
| US-20050020439-A1 | Catalyst comprising cyclic acylurea compounds and processes for production organic compounds with the same | MOGAT2, ACSS2, ACOX1 | GAA 388/4885GABRA1 3376/4885GABRB2 3237/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.