⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19245738 | 1.00 | — | — | |
| SCHEMBL18634185 | 1.00 | — | — | |
| SCHEMBL5014123 | 0.96 | — | — | |
| SCHEMBL8507944 | 0.81 | CHRNB2 (0.31) | — | |
| SCHEMBL4705446 | 0.81 | ADORA1 (0.30) | — | |
| Indene SCHEMBL2799325 | 0.78 | CYP2D6 (0.34) | — | |
| SCHEMBL4169291 | 0.76 | KDM4E (0.36) | — | |
| SCHEMBL21711254 | 0.76 | KDM4E (0.36) | — | |
| SCHEMBL11533080 | 0.72 | CA12 (0.36) | — | |
| SCHEMBL9094289 | 0.72 | POLB (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 246 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-60123449-A | — | — | None | — | — | JP | disclosed |
| JP-60123448-A | — | — | None | — | — | JP | disclosed |
| JP-60126238-A | — | — | None | — | — | JP | disclosed |
| CN-115304591-B | Bridged ring steroid synthetase inhibitor and preparation method and application thereof | 广州中医药大学(广州中医药研究院) | 2024-10-01 | — | — | CN | disclosed |
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20090081595-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090081595-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20080241740-A1 | Support with photosensitive layer; reduce contact angle of water drops | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080038662-A1 | Bottom resist layer composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| US-6013413-A | Alicyclic nortricyclene polymers and co-polymers | CORNELL RESEARCH FOUNDATION, INC. (US) | 2000-01-11 | — | — | US | disclosed |
| EP-0123493-B1 | PHOTOCHEMICAL CONVERSION AND STORAGE OF LIGHT ENERGY BY PHOTOISOMERIZATION OF COMPOUNDS SUCH AS NORBORNADIENE AND ITS DERIVATIVES | THE STANDARD OIL COMPANY (US) | 1987-07-22 | — | — | EP | disclosed |
| JP-S60126238-A | PRODUCTION OF NORBORNADIENE-2-METHANOL | DAINIPPON INK & CHEM INC | 1985-07-05 | — | — | JP | disclosed |
| JP-S60123448-A | BENZOPHENONE DERIVATIVE, LIGHT ENERGY CONVERTING AGENT AND PRODUCTION THEREOF | DAINIPPON INK & CHEM INC | 1985-07-02 | — | — | JP | disclosed |
| JP-S60123449-A | NAPHTHALENE DERIVATIVE, LIGHT ENERGY CONVERTING AGENT AND PRODUCTION THEREOF | DAINIPPON INK & CHEM INC | 1985-07-02 | — | — | JP | disclosed |
| EP-0123493-A1 | Photochemical conversion and storage of light energy by photoisomerization of compounds such as norbornadiene and its derivatives | THE STANDARD OIL COMPANY (US) | 1984-10-31 | — | — | EP | disclosed |