Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.36 |
| ▸ | GAA | P10253 | 7/20 | 0.36 |
| ▸ | HPGD | P15428 | 6/20 | 0.36 |
| ▸ | CASP1 | P29466 | 6/20 | 0.36 |
| ▸ | CASP7 | P55210 | 6/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 6/20 | 0.36 |
| ▸ | TSHR | P16473 | 3/20 | 0.36 |
| ▸ | ATM | Q13315 | 2/20 | 0.36 |
| ▸ | GLA | P06280 | 5/20 | 0.35 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.35 |
| ▸ | TLR4 | O00206 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 2/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | RCE1 | Q9Y256 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 3/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21711254 | 1.00 | KDM4E (0.36) | KDM4EALDH1A1GAAHPGDCASP1 | |
| SCHEMBL18758051 | 0.84 | KDM4E (0.32) | KDM4EALDH1A1GAAHPGDCASP1 | |
| 4-Vinylphenol SCHEMBL16736992 | 0.82 | CA1 (0.36) | ALDH1A1POLBMEN1KMT2ACA12 | |
| SCHEMBL18714029 | 0.81 | KDM4E (0.30) | KDM4EALDH1A1GAAHPGDCASP1 | |
| SCHEMBL11533080 | 0.81 | CA12 (0.36) | KDM4EALDH1A1GAAHSD17B10TSHR | |
| SCHEMBL1831584 | 0.81 | TSHR (0.38) | KDM4EALDH1A1GAAHPGDCASP1 | |
| SCHEMBL8507944 | 0.79 | CHRNB2 (0.31) | ALDH1A1 | |
| SCHEMBL11525930 | 0.78 | ALDH1A1 (0.41) | KDM4EALDH1A1HPGDHSD17B10TSHR | |
| SCHEMBL8911453 | 0.77 | TLR4 (0.35) | KDM4EALDH1A1GAAHPGDCASP1 | |
| SCHEMBL75668 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 336 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20230400766-A1 | ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-11835860-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835860-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| EP-1884519-A1 | METAL HYDRIDE COMPLEX, METHOD OF HYDROGENATING RING-OPENING POLYMERIZATION POLYMER OF CYCLOOLEFIN, AND PROCESS FOR PRODUCING PRODUCT OF HYDROGENATION OF RING-OPENING POLYMERIZATION POLYMER OF CYCLOOLEFIN | JSR Corporation (JP) | 2008-02-06 | — | — | EP | disclosed |
| US-6808603-B1 | RADIATING WITH POLARIZED LIGHT TO EXCITE STARTING MATERIAL; CONCENTRATING ENANTIOMORPHS OR DIASTEREOMERS; PHOTOCHEMICALLY REVERSIBLE | JAPAN SCIENCE AND TECHNOLOGY CORPORATION (JP) | 2004-10-26 | — | — | US | disclosed |
| US-4132750-A | RING OPENING POLYMERIZATION OF NORBORNENE DERIVATIVES | SHOWA DENKO K.K. (JP) | 1979-01-02 | — | — | US | disclosed |
| US-4105608-A | HIGH IMPACT COMPOSITION OF RING-OPENING POLYMERIZATION PRODUCT | SHOWA DENKO K.K. (JP) | 1978-08-08 | — | — | US | disclosed |
| US-4080491-A | CATALYST CONTAINS ORGANOMETALLIC COMPOUND AND THE REACTION PRODUCT OF TUNGSTEN OR MOLYBDENUM OXIDE AND A PHOSPHOROUS HALIDE OR OXYHALIDE | SHOWA DENKO K.K. (JA) | 1978-03-21 | — | — | US | disclosed |
| US-4059561-A | AND A HALOGEN COMPOUND | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1977-11-22 | — | — | US | disclosed |
| US-4028482-A | LOW VISCOSITY POLYALKENAMER | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1977-06-07 | — | — | US | disclosed |
| US-4022954-A | ADHESIVES, FLOCCULATING AGENTS, ION EXCHANGE RESINS, MOLDING AGENTS | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1977-05-10 | — | — | US | disclosed |
| US-3991139-A | NORBORNENE DERIVATIVES, PHENOLS, ESTER THIOETHERS | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1976-11-09 | — | — | US | disclosed |
| US-3959234-A | CATALYSTS OF ORGANOALUMINUM COMPOUNDS AND A TUNGSTEN OR MOLYBDENUM COMPOUND, RING-OPENING | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1976-05-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240027903-A1 | Resist Material And Patterning Process | LBR, HNRNPU, EWSR1 | KDM4E 778/4885ALDH1A1 4741/4885GAA 3050/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.