Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1533116 | 0.84 | GRIK1 (0.40) | GRIK1GRIK2 | |
| SCHEMBL1263148 | 0.84 | GRIK1 (0.40) | GRIK1GRIK2 | |
| SCHEMBL15410424 | 0.83 | GRIK1 (0.39) | GRIK1GRIK2 | |
| SCHEMBL651537 | 0.77 | — | — | |
| SCHEMBL6413151 | 0.71 | GRIK1 (0.38) | GRIK1GRIK2 | |
| SCHEMBL704502 | 0.70 | HTT (0.33) | — | |
| SCHEMBL7988774 | 0.70 | KEAP1 (0.32) | — | |
| SCHEMBL15228 | 0.68 | GRIK1 (0.41) | GRIK1GRIK2 | |
| SCHEMBL10592905 | 0.68 | GRIK1 (0.41) | GRIK1GRIK2 | |
| SCHEMBL694029 | 0.68 | GRIK1 (0.41) | GRIK1GRIK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6406831-B1 | AN PHOTOACID GENERATOR WHICH RELEASES AN ACID BY EXPOSURE TO LIGHT, A VINYL POLYMER WHICH IS ACID SENSITIVE AND HAS AN ALKALI SOLUBLE GROUP PROTECTED WITH A DISSOLUTION CONTROLLING GROUP AND CONVERTED INTO ALKALI SOLUBLE RESIN BY ACID CLEAVAGE | NEC CORPORATION (JP) | 2002-06-18 | — | — | US | disclosed |
| US-20020058203-A1 | Chemically amplified resist compositions | NEC ELECTRONICS CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| US-20020042018-A1 | Positive chemically amplified resist and method for forming its pattern | NEC CORPORATION | 2002-04-11 | — | — | US | disclosed |
| US-6342334-B1 | ULTRAFINE PROCESSING WITH IMPROVED FOCAL DEPTH, DICARBOXYIMIDE PHOTOACID GENERATOR WHICH RELEASES AN ACID HAVING BOTH A SULFONIC ACID GROUP AND A CARBOXYL GROUP; ACID SENSITIVE RESIN WHICH FORMS A CARBOXYL-CONTAINING ALKALI SOLUBLE RESIN; | NEC CORPORATION (JP) | 2002-01-29 | — | — | US | disclosed |
| US-6106998-A | PHOTORESISTS SUITABLE FOR USE IN PHOTOLITHOGRAPHY THAT EMPLOYS AN ARF EXCIMER LASER; HIGH TRANSPARENCY TO EXPOSURE LIGHT HAVING A WAVELENGTH OF 220 NM OR LESS AND DRY-ETCH RESISTANCE | NEC CORPORATION (JP) | 2000-08-22 | — | — | US | disclosed |
| US-5985522-A | PATTERN PHOTORESISTS, EXPOSURE TO LIGHT, DEVELOPMENT OF METHACRYLATE POLYMERS | NEC CORPORATION (JP) | 1999-11-16 | — | — | US | disclosed |
| US-5770346-A | BRIDGED CYCLIC HYDROCARBON GROUP-CONTAINING ACRYLATE POLYMER | NEC CORPORATION (JP) | 1998-06-23 | — | — | US | disclosed |