Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.32 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.32 |
| ▸ | CES2 | O00748 | 1/20 | 0.31 |
| ▸ | CES1 | P23141 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | MITF | O75030 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.30 |
| ▸ | GPR55 | Q9Y2T6 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7988774 | 0.83 | KEAP1 (0.32) | KEAP1NFE2L2CES2CES1 | |
| SCHEMBL563713 | 0.82 | KEAP1 (0.31) | KEAP1NFE2L2CES2CES1 | |
| SCHEMBL1263148 | 0.80 | GRIK1 (0.40) | KEAP1NFE2L2 | |
| SCHEMBL28397033 | 0.80 | EPHX1 (0.33) | HTTSMN1; SMN2NPC1GAAKEAP1 | |
| SCHEMBL1533116 | 0.80 | GRIK1 (0.40) | KEAP1NFE2L2 | |
| SCHEMBL15410424 | 0.78 | GRIK1 (0.39) | KEAP1NFE2L2 | |
| SCHEMBL28397255 | 0.76 | GRIK1 (0.31) | — | |
| SCHEMBL8395889 | 0.73 | CES2 (0.36) | SMN1; SMN2NPC1KEAP1NFE2L2CES2 | |
| SCHEMBL873007 | 0.72 | KEAP1 (0.42) | HTTSMN1; SMN2NPC1GAAKEAP1 | |
| SCHEMBL2846765 | 0.72 | KEAP1 (0.42) | HTTSMN1; SMN2NPC1GAAKEAP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9500950-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-20160062237-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2016-03-03 | — | — | US | disclosed |
| US-9213236-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-12-15 | — | — | US | disclosed |
| US-8808974-B2 | Method for forming pattern | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8758978-B2 | Radiation-sensitive resin composition, resist pattern formation method, and polymer | JSR CORPORATION (JP) | 2014-06-24 | — | — | US | disclosed |
| US-20140162190-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2014-06-12 | — | — | US | disclosed |
| US-8697343-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-04-15 | — | — | US | disclosed |
| US-8431324-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20120171612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER | JSR CORPORATION (JP) | 2012-07-05 | — | — | US | disclosed |
| US-8182977-B2 | Polymer and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
| US-20100239981-A1 | POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100068650-A1 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION | JSR CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20090202945-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |
| US-20070254247-A1 | Radiation-sensitive resin composition | YAMAMOTO MASAFUMI | 2007-11-01 | — | — | US | disclosed |
| US-7005230-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-02-28 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
| US-6030747-A | CHEMICALLY AMPLIFIED RESIST CONSISTS OF A PHOTOACID GENERATOR, A CROSSLINKING AGENT ACTIVATED IN PRESENCE OF ACID AND A COPOLYMER OF ACRYLIC OR METHACRYLIC ESTER CONTAINING AN ACID, HYDROXY OR ESTER POLAR GROUP AND A COMPOUND | NEC CORPORATION (JP) | 2000-02-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | ASIC1, RER1, RPS10 | HTT 1834/4885SMN1; SMN2 752/4885NPC1 4509/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.