Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIK1 | P39086 | 2/20 | 0.40 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.38 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.30 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1533116 | 1.00 | GRIK1 (0.40) | GRIK1GRIK2KEAP1NFE2L2 | |
| SCHEMBL15410424 | 0.98 | GRIK1 (0.39) | GRIK1GRIK2KEAP1NFE2L2 | |
| SCHEMBL7569783 | 0.84 | GRIK1 (0.33) | GRIK1GRIK2 | |
| SCHEMBL6413151 | 0.81 | GRIK1 (0.38) | GRIK1GRIK2 | |
| SCHEMBL7988774 | 0.80 | KEAP1 (0.32) | KEAP1NFE2L2 | |
| SCHEMBL704502 | 0.80 | HTT (0.33) | KEAP1NFE2L2 | |
| SCHEMBL563713 | 0.78 | KEAP1 (0.31) | KEAP1NFE2L2 | |
| SCHEMBL694029 | 0.78 | GRIK1 (0.41) | GRIK1GRIK2 | |
| SCHEMBL10592905 | 0.78 | GRIK1 (0.41) | GRIK1GRIK2 | |
| SCHEMBL15228 | 0.78 | GRIK1 (0.41) | GRIK1GRIK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1452919-B1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2013-03-27 | — | — | EP | claimed |
| US-10174905-B2 | Optical film production method, optical film, surface light-emitting body and optical film production device | MITSUBISHI CHEMICAL CORPORATION (JP) | 2019-01-08 | — | — | US | disclosed |
| US-9903986-B2 | Light extraction film for EL elements, surface light emitting body, and method for producing light extraction film for EL elements | MITSUBISHI CHEMICAL CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| US-9891354-B2 | Light-extraction film for EL, method for manufacturing light-extraction film for EL, and planar light-emitting body | MITSUBISHI CHEMICAL CORPORATION (JP) | 2018-02-13 | — | — | US | disclosed |
| US-9868846-B2 | Curable composition for imprints, patterning method and pattern | FUJIFILM CORPORATION (JP) | 2018-01-16 | — | — | US | disclosed |
| US-9862847-B2 | Inkjet discharge method, pattern formation method, and pattern | FUJIFILM CORPORATION (JP) | 2018-01-09 | — | — | US | disclosed |
| US-9765941-B2 | Optical film, surface light emitting body, and method for producing optical film | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-20160172631-A1 | Light Extraction Film, Method for Producing Same, and Surface Light-Emitting Body | MITSUBISHI RAYON CO., LTD. (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160131806-A1 | LIGHT-EXTRACTION FILM FOR EL, METHOD FOR MANUFACTURING LIGHT-EXTRACTION FILM FOR EL, AND PLANAR LIGHT-EMITTING BODY | MITSUBISHI RAYON CO., LTD. (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160122563-A1 | Inkjet discharge method, pattern formation method, and pattern | FUJIFILM CORPORATION (JP) | 2016-05-05 | — | — | US | disclosed |
| US-20060141382-A1 | Resist composition and method of forming resist pattern using same | SYNTHEON NEUROVASCULAR LLC | 2006-06-29 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
| WO-2004059391-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN USING SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-07-15 | — | — | WO | disclosed |
| US-6458908-B1 | A PROCESS FOR PREPARING A SULFUR-CONTAINING UNSATURATED CARBOXYLATE COMPOUND AS CLAIMED IN CLAIM 1 COMPRISING REACTING A SULFUR-CONTAINING DERIVATIVE FOR OPTICAL POLYMERS | MITSUI CHEMICALS, INC. (JP) | 2002-10-01 | — | — | US | disclosed |
| US-6395829-B1 | SHELL-CORE POLYMER IMPACT STRENGTH IMPROVER; SMOOTHNESS, TRANSPARENCY | KANEKA CORPORATION (JP) | 2002-05-28 | — | — | US | disclosed |
| US-6358665-B1 | ONIUM SALT PRECURSOR FOR GENERATING FLUOROALKYLSULFONATE | CLARIANT INTERNATIONAL LTD. (CH) | 2002-03-19 | — | — | US | disclosed |
| EP-0709415-B1 | Substrat coated by a base-coat and a clear coat, method of film-forming and coated articles | NOF CORP (JP) | 2001-07-25 | — | — | EP | disclosed |
| EP-1033624-A1 | RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE | Clariant International Ltd. (CH) | 2000-09-06 | — | — | EP | disclosed |
| EP-1031605-A1 | Amorphous polyolefin resin composition | KANEKA CORPORATION (JP) | 2000-08-30 | — | — | EP | disclosed |
| EP-0709415-A2 | Curable base-coat composition, method of film-forming and coated articles | NOF CORPORATION (JP) | 1996-05-01 | — | — | EP | disclosed |