Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HIF1A | Q16665 | 3/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.39 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.39 |
| ▸ | BACE1 | P56817 | 1/20 | 0.39 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.39 |
| ▸ | ADRB2 | P07550 | 3/20 | 0.38 |
| ▸ | QDPR | P09417 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 5/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.33 |
| ▸ | MTOR | P42345 | 3/20 | 0.33 |
| ▸ | LMNA | P02545 | 3/20 | 0.33 |
| ▸ | ADRB1 | P08588 | 2/20 | 0.33 |
| ▸ | ADRB3 | P13945 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29375152 | 1.00 | HIF1A (0.39) | HIF1AHSD17B10NUDT1BACE1HSP90AA1 | |
| SCHEMBL30374860 | 1.00 | HIF1A (0.39) | HIF1AHSD17B10NUDT1BACE1HSP90AA1 | |
| SCHEMBL759679 | 0.89 | HSD17B10 (0.39) | HIF1AHSD17B10NUDT1BACE1HSP90AA1 | |
| SCHEMBL29375621 | 0.89 | HSD17B10 (0.39) | HIF1AHSD17B10NUDT1BACE1HSP90AA1 | |
| SCHEMBL36658 | 0.88 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1PSMB5 | |
| SCHEMBL29372915 | 0.88 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1PSMB5 | |
| SCHEMBL2864394 | 0.88 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1KDM4ELMNA | |
| SCHEMBL29499852 | 0.88 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1PSMB5 | |
| SCHEMBL28462503 | 0.87 | HIF1A (0.41) | HIF1AHSD17B10NUDT1BACE1HSP90AA1 | |
| SCHEMBL2201745 | 0.86 | TRPM8 (0.42) | QDPRMAPTLMNATSHRNFKB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 586 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7879528-B2 | For forming pattern that prevents contamination within the exposure apparatus; lithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-02-01 | — | — | US | claimed |
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | claimed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | claimed |
| US-20090081589-A1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2009-03-26 | — | — | US | claimed |
| US-20080176170-A1 | RESIST COMPOSITION FOR ELECTRON BEAM OR EUV | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-07-24 | — | — | US | claimed |
| US-6312863-B1 | ALKALI-SOLUBLE RESIN; PHOTOSENSITIZER COMPRISING AN ESTER OF A 1,2-NAPHTHOQUINONEDIAZIDESULFONYL COMPOUND WITH A SUBSTITUTED M-BIS(HYDROXYBENZYL)PHENOL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-06 | — | — | US | claimed |
| US-5501936-A | IMPROVED RESOLUTION OF VERY FINE PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-03-26 | — | — | US | claimed |
| US-5434031-A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-07-18 | — | — | US | claimed |
| WO-2025079919-A1 | PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM, AND SEMICONDUCTOR DEVICE | 주식회사 엘지화학 | 2025-04-17 | — | — | WO | disclosed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| CN-117939914-A | Structure, display element, pattern for partition wall, and method for forming the same | 东京应化工业株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-111205648-B | Curable composition, cured product, microlens, and optical element | 东京应化工业株式会社 | 2023-12-08 | — | — | CN | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-117106358-A | Composition for forming separation layer, support substrate with separation layer, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| US-5576138-A | MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-11-19 | — | — | US | disclosed |
| US-5501936-A | IMPROVED RESOLUTION OF VERY FINE PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-03-26 | — | — | US | disclosed |
| US-5501936-A | IMPROVED RESOLUTION OF VERY FINE PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-03-26 | — | — | US | disclosed |
| US-5478692-A | Fine patterning for electronics | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |
| US-5434031-A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-07-18 | — | — | US | disclosed |
| US-5401605-A | Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-03-28 | — | — | US | disclosed |