SCHEMBL757657

SCHEMBL757657

Cc1cc([S+](C)C)cc(C)c1O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.52
CA2 P00918 1/20 0.52
ESR1 P03372 1/20 0.41
ESR2 Q92731 1/20 0.41
ALDH1A1 P00352 2/20 0.39
GAA P10253 2/20 0.37
KDM4E B2RXH2 2/20 0.37
LMNA P02545 2/20 0.37
MAPT P10636 2/20 0.37
PTGS1 P23219 7/20 0.37
PTGS2 P35354 7/20 0.37
ALOX5 P09917 6/20 0.37
CYP1A2 P05177 2/20 0.37
CYP2C9 P11712 2/20 0.37
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
ACHE P22303 1/20 0.37
CYP3A4 P08684 1/20 0.37
CYP2D6 P10635 1/20 0.37
CYP2B6 P20813 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL3646825 0.97 CA1 (0.50) CA1CA2ESR1ESR2ALDH1A1
SCHEMBL10456841 0.91 CA1 (0.44) CA1CA2ESR1ESR2ALDH1A1
SCHEMBL29443961 0.91 CA1 (0.44) CA1CA2ESR1ESR2ALDH1A1
SCHEMBL10456842 0.87 CA1 (0.41) CA1CA2ESR1ESR2ALDH1A1
SCHEMBL10936986 0.83 CA1 (0.38) CA1CA2ESR1ESR2ALDH1A1
SCHEMBL11213543 0.83 CA1 (0.38) CA1CA2ESR1ESR2ALDH1A1
SCHEMBL8575329 0.80 SHBG (0.37) CA1CA2ESR1ESR2GAA
SCHEMBL13088296 0.80 CA1 (0.55) CA1CA2ESR1ESR2ALDH1A1
Trifluoromethanesulfonic Acid SCHEMBL5828707 0.79 BRD4 (0.35) CA1CA2ESR1ESR2ALDH1A1
Hydrochloric Acid SCHEMBL11333589 0.78 CA1 (0.52) CA1CA2ESR1ESR2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2007507580-A 2007-03-29 JP claimed
US-7122294-B2 Photoacid generators with perfluorinated multifunctional anions 3M INNOVATIVE PROPERTIES COMPANY (US) 2006-10-17 US claimed
US-7078444-B2 Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY (US) 2006-07-18 US claimed
EP-1625447-A2 PHOTOACID GENERATORS WITH PERFLUORINATED MULTIFUNCTIONAL ANIONS 3M Innovative Properties Company (US) 2006-02-15 EP claimed
US-6991888-B2 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-01-31 US claimed
US-20050158655-A1 Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY 2005-07-21 US claimed
EP-1516229-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2005-03-23 EP claimed
US-6841333-B2 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY (US) 2005-01-11 US claimed
WO-2004107051-A2 PHOTOACID GENERATORS WITH PERFLUORINATED MULTIFUNCTIONAL ANIONS 3M INNOVATIVE PROPERTIES COMPANY (US) 2004-12-09 WO claimed
US-20040234888-A1 Photoacid generators with perfluorinated multifunctional anions 3M INNOVATIVE PROPERTIES COMPANY 2004-11-25 US claimed
US-20040087690-A1 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY 2004-05-06 US claimed
US-20030235782-A1 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds MERCK PATENT GMBH (DE) 2003-12-25 US claimed
US-20030235775-A1 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds CLARIANT INTERNATIONAL LTD (CH) 2003-12-25 US claimed
WO-2003107093-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS CLARIANT INTERNATIONAL LTD (CH) 2003-12-24 WO claimed
US-10882953-B2 Monomer composition and curable composition containing same DAICEL CORPORATION (JP) 2021-01-05 US disclosed
US-10472466-B2 Monomer composition and curable composition containing same DAICEL CORPORATION (JP) 2019-11-12 US disclosed
US-10392473-B2 Monomer composition and curable composition containing same DAICEL CORPORATION (JP) 2019-08-27 US disclosed
WO-2003107093-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS CLARIANT INTERNATIONAL LTD (CH) 2003-12-24 WO disclosed
US-5914219-A Radiation-sensitive mixture and the production of relief structures having improved contrast BASF AKTIENGESELLSCHAFT (DE) 1999-06-22 US disclosed
US-5783354-A QUATERNARY AMMONIUM COMPOUNDS BASF AKTIENGESELLSCHAFT (DE) 1998-07-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030235782-A1 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds SUN2, UROD, ERCC1 CA1 458/4885CA2 312/4885ESR1 388/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.