Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL5828707

Cc1cc([S+](C)C)cc(C)c1O.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.35

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BRD4 O60885 3/20 0.35
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
KMT2A Q03164 3/20 0.34
GPR3 P46089 2/20 0.34
PTGS1 P23219 2/20 0.33
PTGS2 P35354 2/20 0.33
CYP2C9 P11712 2/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2B6 P20813 1/20 0.33
MAPT P10636 3/20 0.33
ALDH1A1 P00352 1/20 0.33
ESR1 P03372 1/20 0.32
ESR2 Q92731 1/20 0.32
CYTH2 Q99418 1/20 0.32
ALOX5 P09917 1/20 0.32
MEN1 O00255 2/20 0.32
KDM4E B2RXH2 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2905598 0.85 CA1 (0.34) BRD4CA1CA2KMT2A
SCHEMBL5858637 0.84 CA2 (0.36) BRD4CA1CA2
Trifluoromethanesulfonic Acid SCHEMBL5858662 0.82 ESR1 (0.37) BRD4CA1CA2KMT2AGPR3
Trifluoromethanesulfonic Acid SCHEMBL8575352 0.82 ESR1 (0.37) GPR3ALDH1A1ESR1ESR2LMNA
Trifluoromethanesulfonic Acid SCHEMBL31049632 0.81 PTGS1 (0.44) BRD4CA1CA2KMT2AGPR3
Trifluoromethanesulfonic Acid SCHEMBL30536254 0.80 GPR3 (0.40) GPR3PTGS1PTGS2LMNATDP1
Trifluoromethanesulfonic Acid SCHEMBL5827967 0.80 ACHE (0.43) GPR3PTGS1PTGS2ALDH1A1KCNH2
SCHEMBL3875702 0.79
SCHEMBL757657 0.79 CA1 (0.52) CA1CA2KMT2APTGS1PTGS2
SCHEMBL5828408 0.79 KMT2A (0.38) BRD4CA1CA2KMT2APTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1516229-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2005-03-23 EP claimed
US-20030235782-A1 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds MERCK PATENT GMBH (DE) 2003-12-25 US claimed
WO-2003107093-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS CLARIANT INTERNATIONAL LTD (CH) 2003-12-24 WO claimed
US-7078148-B2 Photoresist with improved sensitivity and resolution to deep ultraviolet rays/excimer lasers; semiconductors; integrated circuits JSR CORPORATION (JP) 2006-07-18 US disclosed
US-6991888-B2 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-01-31 US disclosed
EP-1516229-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2005-03-23 EP disclosed
US-20040072094-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2004-04-15 US disclosed
US-20030235782-A1 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds MERCK PATENT GMBH (DE) 2003-12-25 US disclosed
US-20030235775-A1 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds CLARIANT INTERNATIONAL LTD (CH) 2003-12-25 US disclosed
WO-2003107093-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS CLARIANT INTERNATIONAL LTD (CH) 2003-12-24 WO disclosed
EP-0762207-B1 Positive working photosensitive composition and method of producing relief structures BASF AG (DE) 2000-04-12 EP disclosed
US-5783354-A QUATERNARY AMMONIUM COMPOUNDS BASF AKTIENGESELLSCHAFT (DE) 1998-07-21 US disclosed
EP-0762207-A2 Positive working photosensitive composition and method of producing relief structures BASF AKTIENGESELLSCHAFT (DE) 1997-03-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030235782-A1 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds SUN2, UROD, ERCC1 BRD4 1633/4885CA1 458/4885CA2 312/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.