SCHEMBL7577513

SCHEMBL7577513

CCCC(=Cc1ccc(C(=O)O)cc1)C1CC1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.46
POLB P06746 2/20 0.46
GLA P06280 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
RARG P13631 12/20 0.43
RARB P10826 11/20 0.43
RARA P10276 8/20 0.41
RXRA P19793 6/20 0.41
KDM4E B2RXH2 1/20 0.41
NPC1 O15118 1/20 0.41
CYP26A1 O43174 1/20 0.41
GMNN O75496 1/20 0.41
USP2 O75604 1/20 0.41
LMNA P02545 1/20 0.41
TP53 P04637 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41
NFKB1 P19838 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28721627 0.76 ALDH1A1 (0.58) ALDH1A1POLBGLATDP1L3MBTL1
SCHEMBL8028754 0.72 ALDH1A1 (0.58) ALDH1A1POLBGLATDP1L3MBTL1
SCHEMBL31083535 0.72 ALDH1A1 (0.61) ALDH1A1POLBGLATDP1L3MBTL1
Terephthalic Acid SCHEMBL9943962 0.68 FFAR3 (0.62) ALDH1A1L3MBTL1RARBTP53RAB9A
SCHEMBL9520212 0.68 IAPP (0.61) ALDH1A1POLBTDP1KDM4ENPC1
SCHEMBL9520208 0.68 IAPP (0.61) ALDH1A1POLBTDP1KDM4ENPC1
Terephthalic Acid SCHEMBL1482407 0.68 TSHR (0.71) ALDH1A1RARBRXRATP53SMN1; SMN2
SCHEMBL5458953 0.67 HSD17B3 (0.69) ALDH1A1L3MBTL1TP53SMN1; SMN2KMT2A
SCHEMBL7519845 0.67 ALDH1A1 (0.64) ALDH1A1POLBGLATDP1L3MBTL1
SCHEMBL7559528 0.67 ALDH1A1 (0.70) ALDH1A1POLBGLATDP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed