Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.71 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.71 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.71 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.71 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.43 |
| ▸ | ATM | Q13315 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 5/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | IDO1 | P14902 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 2/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | ERN1 | O75460 | 1/20 | 0.37 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29366257 | 1.00 | KDM4E (0.71) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL29366129 | 0.84 | ALDH1A1 (1.00) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL52405 | 0.84 | ALDH1A1 (1.00) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL29364382 | 0.82 | KDM4E (0.65) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL2228418 | 0.82 | KDM4E (0.65) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| Iodide SCHEMBL5967814 | 0.82 | ALDH1A1 (0.94) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL4646489 | 0.81 | KDM4E (0.58) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL30660758 | 0.80 | KDM4E (0.79) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL755681 | 0.80 | KDM4E (0.79) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL27861347 | 0.80 | ALDH1A1 (0.50) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12624392-B2 | Molecular array generation using photoresist | 10X GENOMICS, INC. (US) | 2026-05-12 | — | — | US | disclosed |
| EP-4516394-A2 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10x Genomics, Inc. (US) | 2025-03-05 | — | — | EP | disclosed |
| EP-4481059-A2 | MOLECULAR ARRAY GENERATION USING PHOTORESIST | 10x Genomics, Inc. (US) | 2024-12-25 | — | — | EP | disclosed |
| EP-4405094-B1 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10X GENOMICS INC (US) | 2024-12-18 | — | — | EP | disclosed |
| EP-4271511-B1 | MOLECULAR ARRAY GENERATION USING PHOTORESIST | 10X GENOMICS INC (US) | 2024-10-09 | — | — | EP | disclosed |
| US-20240167077-A1 | COVALENT ATTACHMENT OF SPLINT OLIGONUCLEOTIDES FOR MOLECULAR ARRAY GENERATION USING LIGATION | 10X GENOMICS, INC. (US) | 2024-05-23 | — | — | US | disclosed |
| US-20240076656-A1 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10X GENOMICS, INC. (US) | 2024-03-07 | — | — | US | disclosed |
| US-20240060127-A1 | METHODS AND SYSTEMS FOR LIGHT-CONTROLLED SURFACE PATTERNING USING PHOTOMASKS | 10X GENOMICS, INC. | 2024-02-22 | — | — | US | disclosed |
| WO-2024006798-A1 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10X GENOMICS, INC. (US) | 2024-01-04 | — | — | WO | disclosed |
| WO-2024006827-A1 | METHODS AND SYSTEMS FOR LIGHT-CONTROLLED SURFACE PATTERNING USING PHOTOMASKS | 10X GENOMICS, INC. (US) | 2024-01-04 | — | — | WO | disclosed |
| EP-0846681-B1 | NOVEL SULFONIUM SALT COMPOUNDS, POLYMERIZATION INITIATOR, CURABLE COMPOSITION, AND CURING METHOD | NIPPON SODA CO (JP) | 2003-12-03 | — | — | EP | disclosed |
| US-6558871-B1 | Photopolymerization initiator comprising at least one of diaryliodonium salt | NIPPON SODA CO. LTD. (JP) | 2003-05-06 | — | — | US | disclosed |
| EP-1201638-A1 | PHOTOCURABLE COMPOSITION CONTAINING IODONIUM SALT COMPOUND | NIPPON SODA CO., LTD. (JP) | 2002-05-02 | — | — | EP | disclosed |
| US-6313188-B1 | USED AS CATALYSTS FOR CATIONIC PHOTOPOLYMERIZATION | NIPPON SODA CO., LTD. (JP) | 2001-11-06 | — | — | US | disclosed |
| EP-1106639-A1 | PHOTOCURABLE COMPOSITION CONTAINING IODONIUM SALT COMPOUND | NIPPON SODA CO., LTD. (JP) | 2001-06-13 | — | — | EP | disclosed |
| US-6093753-A | CURABLE COMPOSITION COMPRISING A CATIONIC POLYMERIZABLE COMPOUND WHICH IS AN ALICYCLIC EPOXY COMPOUND OR A VINYL ETHER COMPOUND AND A CATIONIC POLYMERIZATION INITIATOR; PAINTS, ADHESIVES, INKS, PHOTORESISTS | NIPPON SODA CO., LTD. (JP) | 2000-07-25 | — | — | US | disclosed |
| US-6068962-A | NOVOLAK RESIN AS AN ALKALI-SOLUBLE COMPONENT; QUINONEDIAZIDE; ACID GENERATOR; ANTHRACENE DERIVATIVE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-05-30 | — | — | US | disclosed |
| EP-0927726-A1 | PHOTOCATALYTIC COMPOSITION | NIPPON SODA CO., LTD. (JP) | 1999-07-07 | — | — | EP | disclosed |
| EP-0846681-A1 | NOVEL SULFONIUM SALT COMPOUNDS, POLYMERIZATION INITIATOR, CURABLE COMPOSITION, AND CURING METHOD | NIPPON SODA CO., LTD. (JP) | 1998-06-10 | — | — | EP | disclosed |
| EP-0831371-A2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-03-25 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12624392-B2 | Molecular array generation using photoresist | POLL, LIG4, LIG3 | KDM4E 1169/4885ALDH1A1 189/4885MAPK1 2265/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.