SCHEMBL7584832

SCHEMBL7584832

Cc1c(O)c(OS(C)(=O)=O)c2ccccc2c1C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.36
KMT2A Q03164 3/20 0.36
HPGD P15428 1/20 0.36
GAA P10253 3/20 0.35
HSD17B10 Q99714 2/20 0.35
HTT P42858 2/20 0.35
TP53 P04637 1/20 0.35
MAPT P10636 1/20 0.35
DAO P14920 1/20 0.34
DDO Q99489 1/20 0.34
ESR2 Q92731 3/20 0.34
MEN1 O00255 2/20 0.34
ESR1 P03372 2/20 0.34
ALDH1A1 P00352 2/20 0.33
SLC2A1 P11166 1/20 0.33
EP300 Q09472 1/20 0.33
KAT2B Q92831 1/20 0.33
KAT8 Q9H7Z6 1/20 0.33
CYP1A2 P05177 1/20 0.33
ALPL P05186 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7584823 0.86 KDM4E (0.38) KDM4EKMT2AHPGDGAAHSD17B10
SCHEMBL7584624 0.83 ALPL (0.36) KDM4EKMT2AHPGDGAAHSD17B10
SCHEMBL7582375 0.81 GAA (0.34) KDM4EKMT2AHPGDGAAHSD17B10
SCHEMBL7574548 0.80 MMP2 (0.35) KDM4EKMT2AHPGDGAAHSD17B10
SCHEMBL7575557 0.80 MEN1 (0.52) KMT2AGAAMAPTESR2MEN1
SCHEMBL26064646 0.73 TSHR (0.40) KDM4EKMT2AHPGDGAAHSD17B10
SCHEMBL17287702 0.71 MAPT (0.38) KDM4EKMT2AHSD17B10HTTTP53
SCHEMBL17287638 0.71 KDM4E (0.38) KDM4EKMT2AHSD17B10MEN1ALDH1A1
SCHEMBL7584619 0.70 GAA (0.36) KDM4EHPGDGAAHSD17B10HTT
SCHEMBL25280341 0.70 DAO (0.47) KDM4EKMT2AHPGDGAAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed