SCHEMBL7582375

SCHEMBL7582375

Cc1c(O)c(OS(=O)(=O)C(F)(F)F)c2ccccc2c1C

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 4/20 0.34
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
ESR1 P03372 2/20 0.34
ESR2 Q92731 2/20 0.34
CXCR2 P25025 2/20 0.33
CXCR1 P25024 1/20 0.32
KDM4E B2RXH2 3/20 0.32
HSD11B1 P28845 3/20 0.32
HSD17B10 Q99714 2/20 0.32
ERN1 O75460 1/20 0.32
TP53 P04637 1/20 0.32
MAPT P10636 1/20 0.32
HTT P42858 1/20 0.32
PER2 O15055 1/20 0.32
CRY1 Q16526 1/20 0.32
CRY2 Q49AN0 1/20 0.32
ALDH1A1 P00352 1/20 0.31
HPGD P15428 1/20 0.31
ALOX15 P16050 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2865145 0.88 KDM4E (0.34) GAAMEN1KMT2AESR1ESR2
SCHEMBL7584832 0.81 KDM4E (0.36) GAAMEN1KMT2AESR1ESR2
SCHEMBL7584624 0.78 ALPL (0.36) GAAMEN1KMT2AESR1ESR2
SCHEMBL15093426 0.78 CXCR2 (0.34) CXCR2CXCR1HSD17B10MAPTHTT
SCHEMBL15093753 0.75 ALDH1A1 (0.37) GAAMEN1KMT2AKDM4EHSD11B1
SCHEMBL7574548 0.75 MMP2 (0.35) GAAMEN1KMT2AESR1ESR2
SCHEMBL7575557 0.75 MEN1 (0.52) GAAMEN1KMT2AESR1ESR2
SCHEMBL15099628 0.74 HTT (0.39) MEN1KMT2AKDM4EHSD17B10MAPT
SCHEMBL15093533 0.74 CXCR2 (0.34) CXCR2CXCR1PER2CRY1CRY2
SCHEMBL16657248 0.74 HTT (0.39) MEN1KMT2AKDM4EHSD17B10MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed