Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 7/20 | 0.60 |
| ▸ | MAPT | P10636 | 6/20 | 0.60 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.60 |
| ▸ | MAOB | P27338 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.49 |
| ▸ | HPGD | P15428 | 2/20 | 0.49 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | HTT | P42858 | 2/20 | 0.45 |
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27818376 | 0.94 | LMNA (0.55) | LMNAMAPTKDM4EMAOBALDH1A1 | |
| SCHEMBL28901835 | 0.88 | MAOB (0.54) | LMNAMAPTKDM4EMAOBALDH1A1 | |
| SCHEMBL4880410 | 0.83 | LMNA (0.53) | LMNAMAPTKDM4EALDH1A1HPGD | |
| SCHEMBL20371196 | 0.83 | KMT2A (0.64) | LMNAMAPTMAOBALDH1A1HPGD | |
| SCHEMBL28687523 | 0.82 | LMNA (0.51) | LMNAMAPTKDM4EMAOBALDH1A1 | |
| SCHEMBL14541452 | 0.82 | LMNA (0.67) | LMNAMAPTKDM4EMAOBALDH1A1 | |
| SCHEMBL758838 | 0.80 | LMNA (0.51) | LMNAMAPTKDM4EALDH1A1HPGD | |
| SCHEMBL28682455 | 0.79 | LMNA (0.56) | LMNAMAPTKDM4EALDH1A1HPGD | |
| SCHEMBL14541578 | 0.79 | MAOB (0.58) | LMNAMAPTKDM4EMAOBALDH1A1 | |
| SCHEMBL756535 | 0.77 | MAPT (0.53) | LMNAMAPTKDM4EALDH1A1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12529144-B2 | Composition, method of producing substrate, and polymer | JSR CORPORATION (JP) | 2026-01-20 | — | — | US | disclosed |
| WO-2024237033-A1 | COMPOSITION FOR SEMICONDUCTOR DEVICE PROCESSING AND METHOD FOR PRODUCING MODIFIED SUBSTRATE | 富士フイルム株式会社 | 2024-11-21 | — | — | WO | disclosed |
| US-12065534-B2 | Composition, method of producing substrate, and polymer | JSR CORPORATION (JP) | 2024-08-20 | — | — | US | disclosed |
| CN-115210322-B | Resin composition, wiring board, and method for producing conductive pattern | 东丽株式会社 | 2023-10-20 | — | — | CN | disclosed |
| US-11525067-B2 | Modification method of substrate surface, and composition and polymer | JSR CORPORATION (JP) | 2022-12-13 | — | — | US | disclosed |
| CN-115210322-A | Resin composition, wiring board, and method for producing conductive pattern | 东丽株式会社 | 2022-10-18 | — | — | CN | disclosed |
| US-11422464-B2 | Photosensitive resin composition, method of producing electrically conductive pattern, substrate, touch panel, and display | TORAY INDUSTRIES, INC. (JP) | 2022-08-23 | — | — | US | disclosed |
| US-20220259741-A1 | COMPOSITION, METHOD OF PRODUCING SUBSTRATE, AND POLYMER | JSR CORPORATION (JP) | 2022-08-18 | — | — | US | disclosed |
| CN-109791352-B | Photosensitive resin composition, method for producing conductive pattern, substrate, touch panel, and display | 东丽株式会社 | 2022-07-29 | — | — | CN | disclosed |
| US-20220089809-A1 | COMPOSITION, METHOD OF PRODUCING SUBSTRATE, AND POLYMER | JSR CORPORATION (JP) | 2022-03-24 | — | — | US | disclosed |
| US-20080194681-A1 | Novel Inhibitors of Histone Deacetylase for the Treatment of Disease | KALYPSYS, INC. (US) | 2008-08-14 | — | — | US | disclosed |
| US-20080194681-A1 | Novel Inhibitors of Histone Deacetylase for the Treatment of Disease | KALYPSYS, INC. (US) | 2008-08-14 | — | — | US | disclosed |
| US-20080194681-A1 | Novel Inhibitors of Histone Deacetylase for the Treatment of Disease | KALYPSYS, INC. (US) | 2008-08-14 | — | — | US | disclosed |
| US-7374856-B2 | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES, INC. (JP) | 2008-05-20 | — | — | US | disclosed |
| EP-1819669-A2 | NOVEL INHIBITORS OF HISTONE DEACETYLASE FOR THE TREATMENT OF DISEASE | Kalypsys, Inc. (US) | 2007-08-22 | — | — | EP | disclosed |
| WO-2006063294-A2 | NOVEL INHIBITORS OF HISTONE DEACETYLASE FOR THE TREATMENT OF DISEASE | KALYPSYS, INC. (US) | 2006-06-15 | — | — | WO | disclosed |
| WO-2006063294-A2 | NOVEL INHIBITORS OF HISTONE DEACETYLASE FOR THE TREATMENT OF DISEASE | KALYPSYS, INC. (US) | 2006-06-15 | — | — | WO | disclosed |
| CN-1782878-A | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES (JP) | 2006-06-07 | — | — | CN | disclosed |
| US-20060115766-A1 | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES, INC. (JP) | 2006-06-01 | — | — | US | disclosed |
| EP-1662322-A2 | Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film | TORAY INDUSTRIES, INC. (JP) | 2006-05-31 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12529144-B2 | Composition, method of producing substrate, and polymer | SCO2, AOC2, PUF60 | LMNA 4560/4885MAPT 360/4885KDM4E 3053/4885 |
| US-20080194681-A1 | Novel Inhibitors of Histone Deacetylase for the Treatment of Disease | HDAC1, HDAC10, HDAC6 | LMNA 1567/4885MAPT 478/4885KDM4E 621/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.