Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 9/20 | 0.53 |
| ▸ | LMNA | P02545 | 4/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.50 |
| ▸ | PKM | P14618 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 2/20 | 0.49 |
| ▸ | GLA | P06280 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.47 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 3/20 | 0.42 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28479224 | 0.90 | KMT2A (0.50) | MAPTLMNAKDM4EALDH1A1KMT2A | |
| SCHEMBL28687523 | 0.86 | LMNA (0.51) | MAPTLMNAKDM4EALDH1A1HPGD | |
| SCHEMBL28697234 | 0.83 | ALDH1A1 (0.54) | MAPTLMNAKDM4EALDH1A1KMT2A | |
| SCHEMBL28698222 | 0.81 | LMNA (0.50) | MAPTLMNAKDM4EALDH1A1KMT2A | |
| SCHEMBL759546 | 0.77 | LMNA (0.60) | MAPTLMNAKDM4EALDH1A1KMT2A | |
| SCHEMBL28153865 | 0.77 | KMT2A (0.52) | MAPTLMNAKDM4EALDH1A1KMT2A | |
| SCHEMBL28682455 | 0.76 | LMNA (0.56) | MAPTLMNAKDM4EALDH1A1KMT2A | |
| SCHEMBL28973261 | 0.75 | ELANE (0.56) | MAPTLMNAKDM4EALDH1A1KMT2A | |
| SCHEMBL4905240 | 0.75 | KMT2A (0.62) | MAPTLMNAKDM4EALDH1A1KMT2A | |
| SCHEMBL19971915 | 0.74 | MAPT (0.47) | MAPTLMNAKDM4EALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12529144-B2 | Composition, method of producing substrate, and polymer | JSR CORPORATION (JP) | 2026-01-20 | — | — | US | disclosed |
| WO-2024237033-A1 | COMPOSITION FOR SEMICONDUCTOR DEVICE PROCESSING AND METHOD FOR PRODUCING MODIFIED SUBSTRATE | 富士フイルム株式会社 | 2024-11-21 | — | — | WO | disclosed |
| US-12065534-B2 | Composition, method of producing substrate, and polymer | JSR CORPORATION (JP) | 2024-08-20 | — | — | US | disclosed |
| CN-115210322-B | Resin composition, wiring board, and method for producing conductive pattern | 东丽株式会社 | 2023-10-20 | — | — | CN | disclosed |
| US-11525067-B2 | Modification method of substrate surface, and composition and polymer | JSR CORPORATION (JP) | 2022-12-13 | — | — | US | disclosed |
| US-11422464-B2 | Photosensitive resin composition, method of producing electrically conductive pattern, substrate, touch panel, and display | TORAY INDUSTRIES, INC. (JP) | 2022-08-23 | — | — | US | disclosed |
| US-20220259741-A1 | COMPOSITION, METHOD OF PRODUCING SUBSTRATE, AND POLYMER | JSR CORPORATION (JP) | 2022-08-18 | — | — | US | disclosed |
| US-20220089809-A1 | COMPOSITION, METHOD OF PRODUCING SUBSTRATE, AND POLYMER | JSR CORPORATION (JP) | 2022-03-24 | — | — | US | disclosed |
| US-11127698-B2 | Method for producing conductive film, method for producing field effect transistor using same, and method for producing wireless communication device | TORAY INDUSTRIES, INC. (JP) | 2021-09-21 | — | — | US | disclosed |
| WO-2021095766-A1 | COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE, AND POLYMER | JSR株式会社 | 2021-05-20 | — | — | WO | disclosed |
| US-20120052439-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME | CHI MEI CORPORATION (TW) | 2012-03-01 | — | — | US | disclosed |
| US-20110008730-A1 | POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, CURED FILM, INTERLAYER INSULATING FILM, METHOD OF FORMING INTERLAYER INSULATING FILM, DISPLAY DEVICE, AND SILOXANE POLYMER FOR FORMING INTERLAYER INSULATING FILM | JSR CORPORATION (JP) | 2011-01-13 | — | — | US | disclosed |
| US-20100316953-A1 | SILOXANE-BASED RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100273109-A1 | METHOD FOR PRODUCING OPTICAL PART | CANON KABUSHIKI KAISHA (JP) | 2010-10-28 | — | — | US | disclosed |
| EP-2243622-A2 | Method for producing optical part | CANON KABUSHIKI KAISHA (JP) | 2010-10-27 | — | — | EP | disclosed |
| EP-2239301-A1 | SILOXANE RESIN COMPOSITIONS | Toray Industries, Inc. (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20100129618-A1 | PHOTOSENSITIVE SILOXANE COMPOSITION, CURED FILM FORMED THEREFROM AND DEVICE HAVING THE CURED FILM | TORAY INDUSTRIES, INC. (JP) | 2010-05-27 | — | — | US | disclosed |
| US-7374856-B2 | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES, INC. (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20060115766-A1 | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES, INC. (JP) | 2006-06-01 | — | — | US | disclosed |
| EP-1662322-A2 | Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film | TORAY INDUSTRIES, INC. (JP) | 2006-05-31 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100316953-A1 | SILOXANE-BASED RESIN COMPOSITION | ICAM1, ESD, CAD | MAPT 2931/4885LMNA 1839/4885KDM4E 117/4885 |
| US-12529144-B2 | Composition, method of producing substrate, and polymer | SCO2, AOC2, PUF60 | MAPT 360/4885LMNA 4560/4885KDM4E 3053/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.