SCHEMBL759633

SCHEMBL759633

Cc1cc(C(c2ccc(O)c(C)c2)c2ccccc2O)ccc1O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 1/20 0.45
GABRB2 P47870 1/20 0.45
TDP1 Q9NUW8 2/20 0.42
TP53 P04637 1/20 0.42
TSHR P16473 1/20 0.41
ESR1 P03372 5/20 0.41
ESR2 Q92731 5/20 0.41
PDE10A Q9Y233 1/20 0.39
KMT2A Q03164 3/20 0.38
MEN1 O00255 2/20 0.38
HSD17B1 P14061 2/20 0.38
HSD17B2 P37059 2/20 0.38
NPC1 O15118 1/20 0.38
HSP90AA1 P07900 1/20 0.38
RAB9A P51151 1/20 0.38
TRPA1 O75762 1/20 0.37
PTGS1 P23219 1/20 0.37
CACNA1C Q13936 1/20 0.37
MAPT P10636 2/20 0.37
LMNA P02545 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29375022 1.00 GABRA1 (0.45) GABRA1GABRB2TDP1TP53TSHR
SCHEMBL1758278 0.92 TDP1 (0.45) GABRA1GABRB2TDP1TP53TSHR
SCHEMBL20808743 0.84 TDP1 (0.41) TDP1TP53ESR1ESR2PDE10A
SCHEMBL3032916 0.84 GABRA1 (0.48) GABRA1GABRB2TDP1TP53TSHR
SCHEMBL36014 0.83 GABRA1 (0.47) GABRA1GABRB2TSHRKMT2AMEN1
SCHEMBL29372953 0.83 GABRA1 (0.47) GABRA1GABRB2TSHRKMT2AMEN1
SCHEMBL28961780 0.82 GABRA1 (0.45) GABRA1GABRB2TDP1TSHRKMT2A
SCHEMBL20808567 0.82 TP53 (0.46) TDP1TP53ESR1ESR2PDE10A
SCHEMBL29465801 0.82 TP53 (0.54) TDP1TP53ESR1ESR2PDE10A
SCHEMBL674987 0.82 TP53 (0.54) TDP1TP53ESR1ESR2PDE10A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 240 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025079919-A1 PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM, AND SEMICONDUCTOR DEVICE 주식회사 엘지화학 2025-04-17 WO disclosed
EP-3961676-B1 ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2025-01-22 EP disclosed
US-20240248396-A1 XANTHENE COMPOUND, RESIN COMPOSITION, CURED OBJECT, METHOD FOR PRODUCING CURED OBJECT, ORGANIC EL DISPLAY DEVICE, AND DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2024-07-25 US disclosed
CN-117939914-A Structure, display element, pattern for partition wall, and method for forming the same 东京应化工业株式会社 2024-04-26 CN disclosed
US-11953830-B2 Photosensitive resin composition, photosensitive resin sheet, cured film, method for producing cured film, organic EL display device and electronic component TORAY INDUSTRIES, INC. (JP) 2024-04-09 US disclosed
CN-111205648-B Curable composition, cured product, microlens, and optical element 东京应化工业株式会社 2023-12-08 CN disclosed
CN-111324013-B Chemically amplified positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2023-12-01 CN disclosed
CN-117106358-A Composition for forming separation layer, support substrate with separation layer, laminate, method for producing laminate, and method for producing electronic component 东京应化工业株式会社 2023-11-24 CN disclosed
WO-2023153390-A1 PHOTOSENSITIVE RESIN SHEET, CURED FILM, AND MULTILAYER WIRING SUBSTRATE 東レ株式会社 2023-08-17 WO disclosed
WO-2023120352-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED OBJECT, CURED OBJECT MANUFACTURING METHOD, ORGANIC EL DISPLAY DEVICE, AND DISPLAY DEVICE 東レ株式会社 2023-06-29 WO disclosed
US-20030013836-A1 Resin composition and articles molded therefrom TORAY INDUSTRIES, INC., A CORPORATION OF JAPAN (JP) 2003-01-16 US disclosed
EP-1270646-A1 RESIN COMPOSITION AND ARTICLES MOLDED THEREFROM TORAY INDUSTRIES, INC. (JP) 2003-01-02 EP disclosed
WO-2002095500-A1 RESIST REMOVER COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2002-11-28 WO disclosed
US-20020176046-A1 Sealing material for plastic liquid crystal display cells MITSUI CHEMICALS, INC. (JP) 2002-11-28 US disclosed
EP-1153952-A1 SEALING AGENT FOR LIQUID-CRYSTAL DISPLAY CELL, COMPOSITION FOR SEALING AGENT FOR LIQUID-CRYSTAL DISPLAY CELL, AND LIQUID-CRYSTAL DISPLAY ELEMENT Mitsui Chemicals, Inc. (JP) 2001-11-14 EP disclosed
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-6265129-B1 FORM A RESIST PATTERN THAT HAD A MICRO-GROOVE IN EACH ELEMENT AND WHICH YET WAS SATISFACTORY IN FEATURE PROFILE AND RESOLUTION. TOKYO OHKA KOGYO CO., LTD. (JP) 2001-07-24 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed
US-6140027-A WATER SOLUBLE AMINE, POLAR ORGANIC SOLVENT, TRIAZOLE COMPOUND AND SILICONE SURFACTANT DONGJIN SEMICHEM CO., LTD. (KR) 2000-10-31 US disclosed
EP-0943640-A1 HIGHLY HEAT-RESISTANT, HIGH-PURITY POLYARYLATE AND FILM PRODUCED FROM THE SAME UNITIKA LTD. (JP) 1999-09-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240248396-A1 XANTHENE COMPOUND, RESIN COMPOSITION, CURED OBJECT, METHOD FOR PRODUCING CURED OBJECT, ORGANIC EL DISPLAY DEVICE, AND DISPLAY DEVICE NLRP3, XPA, ASIC1 GABRA1 825/4885GABRB2 1321/4885TDP1 3005/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.