SCHEMBL7599759

SCHEMBL7599759

C=CCc1ccc2sc3ccccc3c(=O)c2c1CC=C

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.44
RAB9A P51151 3/20 0.44
CYP1A2 P05177 3/20 0.44
CYP3A4 P08684 3/20 0.44
NPC1 O15118 2/20 0.44
CYP2C9 P11712 1/20 0.44
HPGD P15428 1/20 0.44
CYP2C19 P33261 1/20 0.44
MAOA P21397 4/20 0.43
MAOB P27338 4/20 0.43
KDM4E B2RXH2 2/20 0.40
POLB P06746 3/20 0.38
KMT2A Q03164 3/20 0.38
ALDH1A1 P00352 2/20 0.38
MEN1 O00255 2/20 0.38
GAA P10253 1/20 0.38
TDP1 Q9NUW8 2/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
DUSP3 P51452 1/20 0.36
BLM P54132 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2808913 0.88 GPR3 (0.39) MAPTRAB9ACYP1A2CYP3A4NPC1
SCHEMBL5346693 0.85 MAPT (0.43) MAPTRAB9ACYP1A2CYP3A4NPC1
SCHEMBL28612371 0.85 MAPT (0.43) MAPTRAB9ACYP1A2CYP3A4NPC1
SCHEMBL1395327 0.84 MAPT (0.43) MAPTRAB9ACYP1A2CYP3A4NPC1
SCHEMBL31120488 0.84 MAPT (0.43) MAPTRAB9ACYP1A2CYP3A4NPC1
SCHEMBL28615626 0.79 MAOA (0.40) MAPTRAB9ACYP1A2CYP3A4NPC1
SCHEMBL56031 0.77 MAPT (0.51) MAPTRAB9ACYP1A2CYP3A4NPC1
SCHEMBL29411158 0.77 MAPT (0.51) MAPTRAB9ACYP1A2CYP3A4NPC1
SCHEMBL5460621 0.75 GPR3 (0.38) MAPTRAB9ACYP1A2CYP3A4NPC1
SCHEMBL11121559 0.75 KDM4E (0.50) MAPTRAB9ANPC1HPGDMAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4450279-A PHOTOPOLYMERIZATION SENSITIZERS FOR UNSATURATED MONOMERS; RAPID HARDENING; STORAGE STABILITY NIPPON, KAYAKU, KABUSHIKI, KAISHA (JP) 1984-05-22 US claimed
JP-57163377-A None JP disclosed
CN-108089404-B Patterning method of inorganic photoresist composition 中国科学院理化技术研究所 2020-09-18 CN disclosed
EP-0900213-B1 PROCESSES FOR PREPARING THIOXANTHONE AND DERIVATIVES THEREOF FIRST CHEMICAL CORP (US) 2002-07-24 EP disclosed
EP-1211252-A1 Process for preparing thioxanthone and derivatives thereof First Chemical Corporation (US) 2002-06-05 EP disclosed
US-4839261-A FORMING ELECTROLESS COPPER PLATING PATTERNS ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1989-06-13 US disclosed
EP-0125862-B1 PHOTOPOLYMERIZABLE LAMINATE Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1988-08-10 EP disclosed
US-4702997-A ACRYLATE BINDERS, HYDROXY ACRYLATED URETHANES, POLYETHERS, ADDUCTS; HARDENING ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1987-10-27 US disclosed
EP-0125862-A2 Photopolymerizable laminate Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1984-11-21 EP disclosed
US-4450279-A PHOTOPOLYMERIZATION SENSITIZERS FOR UNSATURATED MONOMERS; RAPID HARDENING; STORAGE STABILITY NIPPON, KAYAKU, KABUSHIKI, KAISHA (JP) 1984-05-22 US disclosed
US-4450279-A PHOTOPOLYMERIZATION SENSITIZERS FOR UNSATURATED MONOMERS; RAPID HARDENING; STORAGE STABILITY NIPPON, KAYAKU, KABUSHIKI, KAISHA (JP) 1984-05-22 US disclosed
US-4450279-A PHOTOPOLYMERIZATION SENSITIZERS FOR UNSATURATED MONOMERS; RAPID HARDENING; STORAGE STABILITY NIPPON, KAYAKU, KABUSHIKI, KAISHA (JP) 1984-05-22 US disclosed
JP-S57163377-A DIALKYLTHIOXANTHONE COMPOUND, ITS PREPARATION, AND CURING OF PHOTOPOLYMERIZABLE RESIN COMPOSITION USING IT NIPPON KAYAKU CO LTD 1982-10-07 JP disclosed