Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23573076 | 0.77 | — | — | |
| SCHEMBL28155611 | 0.68 | THRB (0.32) | THRBLMNA | |
| SCHEMBL3889901 | 0.67 | SHBG (0.33) | THRB | |
| SCHEMBL16610553 | 0.65 | SMN1; SMN2 (0.43) | — | |
| SCHEMBL17049376 | 0.64 | — | — | |
| SCHEMBL2147510 | 0.64 | THRB (0.36) | THRBLMNA | |
| SCHEMBL29084062 | 0.63 | — | — | |
| SCHEMBL27611489 | 0.63 | — | — | |
| SCHEMBL2931933 | 0.63 | THRB (0.47) | THRBLMNA | |
| SCHEMBL17247857 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240170282-A1 | METHOD AND SYSTEM FOR TUNING PHOTORESIST ADHESION LAYER PROPERTIES | ASM IP HOLDING B.V. (NL) | 2024-05-23 | — | — | US | claimed |
| CN-117995660-A | Method and system for adjusting properties of photoresist adhesion layer | ASM IP私人控股有限公司 | 2024-05-07 | — | — | CN | claimed |
| WO-2007047822-A2 | NANOPOROUS LOW-K FILMS WITH INFILTRATED POROSITY | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2007-04-26 | — | — | WO | claimed |
| CN-115768919-B | Vapor deposition precursor compounds and methods of use | 恩特格里斯公司 | 2025-04-18 | — | — | CN | disclosed |
| US-12209105-B2 | Vapor deposition precursor compounds and process of use | ENTEGRIS, INC. (US) | 2025-01-28 | — | — | US | disclosed |
| EP-3425657-B1 | METHOD FOR PRODUCING AN INTERFACE FOR TEMPORARILY JOINING A MICROELECTRONIC SUPPORT AND A CONTROL HANDLE, AND TEMPORARY ASSEMBLY INTERFACE | COMMISSARIAT ENERGIE ATOMIQUE (FR) | 2024-11-06 | — | — | EP | disclosed |
| US-20240170282-A1 | METHOD AND SYSTEM FOR TUNING PHOTORESIST ADHESION LAYER PROPERTIES | ASM IP HOLDING B.V. (NL) | 2024-05-23 | — | — | US | disclosed |
| CN-117995660-A | Method and system for adjusting properties of photoresist adhesion layer | ASM IP私人控股有限公司 | 2024-05-07 | — | — | CN | disclosed |
| EP-4165226-A1 | VAPOR DEPOSITION PRECURSOR COMPOUNDS AND PROCESS OF USE | Entegris, Inc. (US) | 2023-04-19 | — | — | EP | disclosed |
| US-20230041086-A1 | VAPOR DEPOSITION PRECURSOR COMPOUNDS AND PROCESS OF USE | MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT | 2023-02-09 | — | — | US | disclosed |
| US-11466038-B2 | Vapor deposition precursor compounds and process of use | ENTEGRIS, INC. (US) | 2022-10-11 | — | — | US | disclosed |
| US-20150251127-A1 | GAS CHROMATOGRAPHY COLUMN COMPRISING A POROUS STATIONARY PHASE IN KEEPING THEREWITH | Commissariat à I'énergie atomique et aux énergie alternatives (FR) | 2015-09-10 | — | — | US | disclosed |
| EP-2914958-A1 | GAS CHROMATOGRAPHY COLUMN COMPRISING A POROUS STATIONARY PHASE IN KEEPING THEREWITH | Commissariat à l'Énergie Atomique et aux Énergies Alternatives (FR) | 2015-09-09 | — | — | EP | disclosed |
| WO-2015097282-A1 | GRAVIMETRIC GAS SENSOR HAVING A LOWERED DETECTION LIMIT | Commissariat à l'énergie atomique et aux énergies alternatives (FR) | 2015-07-02 | — | — | WO | disclosed |
| WO-2014068004-A1 | GAS CHROMATOGRAPHY COLUMN COMPRISING A POROUS STATIONARY PHASE IN KEEPING THEREWITH | Commissariat à l'énergie atomique et aux énergies alternatives (FR) | 2014-05-08 | — | — | WO | disclosed |
| US-8524332-B2 | Process for preparing thin layers of nanoporous dielectric materials | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 2013-09-03 | — | — | US | disclosed |
| EP-2019152-B1 | Method of preparing thin layers of nanoporous dielectric materials | COMMISSARIAT ENERGIE ATOMIQUE (FR) | 2012-03-21 | — | — | EP | disclosed |
| US-20090155535-A1 | Process for preparing thin layers of nanoporous dielectric materials | COMMISSARIAT A I'ENERGIE ATOMIQUE (FR) | 2009-06-18 | — | — | US | disclosed |
| EP-2019152-A1 | Method of preparing thin layers of nanoporous dielectric materials | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 2009-01-28 | — | — | EP | disclosed |
| WO-2007047822-A2 | NANOPOROUS LOW-K FILMS WITH INFILTRATED POROSITY | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2007-04-26 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230041086-A1 | VAPOR DEPOSITION PRECURSOR COMPOUNDS AND PROCESS OF USE | PNN, VEGFA, VCL | THRB 4282/4885LMNA 671/4885 |
| US-12209105-B2 | Vapor deposition precursor compounds and process of use | PNN, VEGFA, VCL | THRB 4282/4885LMNA 671/4885 |
| US-11466038-B2 | Vapor deposition precursor compounds and process of use | PNN, VEGFA, VCL | THRB 4282/4885LMNA 671/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.