SCHEMBL760246

SCHEMBL760246

CO[Si](OC)(OC)C(C)c1ccc(O)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 11/20 0.52
ESR2 Q92731 11/20 0.52
PDCD1 Q15116 1/20 0.52
CD274 Q9NZQ7 1/20 0.52
ALOX15 P16050 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
LMNA P02545 1/20 0.41
CYP1A2 P05177 1/20 0.41
PGR P06401 1/20 0.41
CHRM2 P08172 1/20 0.41
CYP3A4 P08684 1/20 0.41
ADORA3 P0DMS8 1/20 0.41
AR P10275 1/20 0.41
CYP2D6 P10635 1/20 0.41
MAPT P10636 1/20 0.41
CHRM1 P11229 1/20 0.41
CYP2C9 P11712 1/20 0.41
DRD1 P21728 1/20 0.41
TBXA2R P21731 1/20 0.41
PTGS1 P23219 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL235152 0.91 ESR1 (0.36) ESR1ESR2PDCD1CD274PTGS1
SCHEMBL29013578 0.89 ESR1 (0.42) ESR1ESR2PDCD1CD274ALOX15
SCHEMBL27147585 0.84 CYP17A1 (0.34) ESR1ESR2PDCD1CD274CYP3A4
SCHEMBL928392 0.80 ESR1 (0.30) ESR1ESR2PDCD1CD274
SCHEMBL927965 0.80 ESR1 (0.30) ESR1ESR2PDCD1CD274
SCHEMBL929334 0.80 ESR1 (0.30) ESR1ESR2PDCD1CD274
SCHEMBL27849335 0.80 ACACB (0.33) ESR1ESR2PDCD1CD274CYP1A2
SCHEMBL22551470 0.80 ESR1 (0.30) ESR1ESR2PDCD1CD274
SCHEMBL22551505 0.80 ESR1 (0.30) ESR1ESR2PDCD1CD274
SCHEMBL27866274 0.80 CYP1A2 (0.35) ALOX15CYP1A2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 400 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4651185-A1 LAMINATE, SEMICONDUCTOR ELEMENT, AND MEMS ELEMENT Toray Industries, Inc. (JP) 2025-11-19 EP disclosed
US-12405531-B2 Organic EL display device, production method for cured product, and production method for organic EL display device TORAY INDUSTRIES, INC. (JP) 2025-09-02 US disclosed
US-20250199402-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF THE SAME, AND DISPLAY DEVICE INCLUDING THE SAME TORAY INDUSTRIES, INC. (JP) 2025-06-19 US disclosed
US-20250172873-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFACTURING CURED ARTICLE, ORGANIC EL DISPLAY DEVICE, AND DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2025-05-29 US disclosed
WO-2025074871-A1 RESIN, PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCTS OF SAME, AND ELECTRONIC COMPONENT AND DISPLAY DEVICE EACH USING SAID CURED PRODUCT 東レ株式会社 2025-04-10 WO disclosed
WO-2025063189-A1 ORGANIC EL DISPLAY DEVICE 東レ株式会社 2025-03-27 WO disclosed
CN-113260922-B Positive photosensitive resin composition 株式会社东进世美肯 2025-02-25 CN disclosed
WO-2024204339-A1 POSITIVE PHOTOSENSITIVE PIGMENT COMPOSITION, CURED PRODUCT, AND ORGANIC EL DISPLAY DEVICE 東レ株式会社 2024-10-03 WO disclosed
CN-113169248-B Method for manufacturing semiconductor element and method for manufacturing solar cell 东丽株式会社 2024-10-01 CN disclosed
CN-118679429-A Positive photosensitive resin composition, cured product thereof, and display device comprising same 东丽株式会社 2024-09-20 CN disclosed
CN-102076774-A Radiation-sensitive resin composition, laminate and method for producing the same, and semiconductor device ZEON CORP 2011-05-25 CN disclosed
US-20110008730-A1 POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, CURED FILM, INTERLAYER INSULATING FILM, METHOD OF FORMING INTERLAYER INSULATING FILM, DISPLAY DEVICE, AND SILOXANE POLYMER FOR FORMING INTERLAYER INSULATING FILM JSR CORPORATION (JP) 2011-01-13 US disclosed
CN-101937172-A Positive radiation line sensitive compositions, cured film, interlayer dielectric and forming method thereof, display element and siloxane polymer JSR CORP 2011-01-05 CN disclosed
CN-101784958-A Photosensitive composition, cured film formed therefrom, and device having cured film TORAY INDUSTRIES 2010-07-21 CN disclosed
US-20100129618-A1 PHOTOSENSITIVE SILOXANE COMPOSITION, CURED FILM FORMED THEREFROM AND DEVICE HAVING THE CURED FILM TORAY INDUSTRIES, INC. (JP) 2010-05-27 US disclosed
CN-101542394-A Photosensitive siloxane composition, hardened film formed therefrom and device having the hardened film TORAY INDUSTRIES (JP) 2009-09-23 CN disclosed
US-7374856-B2 Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film TORAY INDUSTRIES, INC. (JP) 2008-05-20 US disclosed
CN-1782878-A Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film TORAY INDUSTRIES (JP) 2006-06-07 CN disclosed
US-20060115766-A1 Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film TORAY INDUSTRIES, INC. (JP) 2006-06-01 US disclosed
EP-1662322-A2 Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film TORAY INDUSTRIES, INC. (JP) 2006-05-31 EP disclosed