⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8715283 | 0.74 | — | — | |
| SCHEMBL11328921 | 0.73 | — | — | |
| SCHEMBL11552802 | 0.73 | — | — | |
| SCHEMBL737372 | 0.72 | ALDH1A1 (0.31) | — | |
| SCHEMBL3801313 | 0.70 | — | — | |
| SCHEMBL11258274 | 0.70 | — | — | |
| SCHEMBL10584030 | 0.65 | GLS (0.48) | — | |
| SCHEMBL7576775 | 0.65 | ALDH1A1 (0.34) | — | |
| SCHEMBL1719700 | 0.64 | MAPT (0.41) | — | |
| SCHEMBL9313555 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20020005017-A1 | Polishing cycles | JSR CORPORATION (JP) | 2002-01-17 | — | — | US | claimed |
| EP-1138734-A2 | Aqueous dispersion for chemical mechanical polishing of metal films | JSR Corporation (JP) | 2001-10-04 | — | — | EP | claimed |
| EP-0774693-B1 | A method for making by phototypesetting a lithographic printing plate according to the silver salt diffusion transfer process | AGFA GEVAERT NV (BE) | 2000-05-24 | — | — | EP | claimed |
| US-5691104-A | MERCAPTOOXADIAZOLE HYDROPHOBIZING AGENT, SENSITIVITY | AGFA-GEVAERT, N.V. (BE) | 1997-11-25 | — | — | US | claimed |
| EP-0774693-A1 | A method for making by phototypesetting a lithographic printing plate according to the silver salt diffusion transfer process | AGFA-GEVAERT N.V. (BE) | 1997-05-21 | — | — | EP | claimed |
| US-20020005017-A1 | Polishing cycles | JSR CORPORATION (JP) | 2002-01-17 | — | — | US | disclosed |
| EP-1138734-A2 | Aqueous dispersion for chemical mechanical polishing of metal films | JSR Corporation (JP) | 2001-10-04 | — | — | EP | disclosed |
| EP-0774693-B1 | A method for making by phototypesetting a lithographic printing plate according to the silver salt diffusion transfer process | AGFA GEVAERT NV (BE) | 2000-05-24 | — | — | EP | disclosed |
| US-5691104-A | MERCAPTOOXADIAZOLE HYDROPHOBIZING AGENT, SENSITIVITY | AGFA-GEVAERT, N.V. (BE) | 1997-11-25 | — | — | US | disclosed |
| EP-0774693-A1 | A method for making by phototypesetting a lithographic printing plate according to the silver salt diffusion transfer process | AGFA-GEVAERT N.V. (BE) | 1997-05-21 | — | — | EP | disclosed |
| EP-0403100-A2 | High sensitivity photopolymerizable compositions containing hydrogen donating mercaptans | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-12-19 | — | — | EP | disclosed |
| US-4604457-A | 2-substituted cephem derivatives and process for preparing the same | OTSUKA KAGAKU KABUSHIKI KAISHA (JP) | 1986-08-05 | — | — | US | disclosed |
| EP-0118567-A1 | PROCESS FOR THE PREPARATIONOF 2-SUBSTITUTED CEPHEM DERIVATIVES | OTSUKA KAGAKU YAKUHIN KABUSHIKI KAISHA (JP) | 1984-09-19 | — | — | EP | disclosed |
| US-4354949-A | OIL IN WATER EMULSION | SHELL OIL COMPANY (US) | 1982-10-19 | — | — | US | disclosed |
| US-4205166-A | 7-Substituted-3-aminoalkyl-, acylaminoalkyl-, or hydroxyalkyl-substituted heterocyclic thiomethyl-3-cephem-4-carboxylic acid derivatives and preparation thereof | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1980-05-27 | — | — | US | disclosed |
| US-4077965-A | Aminoalkyl- or hydroxyalkyl-substituted thiadiazole derivatives | FUJISAWA PHARMACEUTICAL CO., LTD. (JA) | 1978-03-07 | — | — | US | disclosed |