SCHEMBL7607185

SCHEMBL7607185

O=[C]/C=C(\[C]=O)c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 5/20 0.39
ALDH1A1 P00352 4/20 0.39
CES2 O00748 4/20 0.39
TSHR P16473 2/20 0.39
DAO P14920 1/20 0.39
NAPRT Q6XQN6 1/20 0.39
TDP1 Q9NUW8 4/20 0.38
MAPK1 P28482 2/20 0.38
AKR1C1 Q04828 1/20 0.38
CYP2C19 P33261 2/20 0.37
CYP1A2 P05177 1/20 0.37
CYP2C9 P11712 1/20 0.37
AKT1 P31749 1/20 0.37
CA2 P00918 3/20 0.36
CYP3A4 P08684 2/20 0.36
MAPT P10636 2/20 0.36
CA4 P22748 2/20 0.36
CA12 O43570 2/20 0.36
CA1 P00915 2/20 0.36
CA9 Q16790 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL262668 0.79 CES1 (0.40) CES1ALDH1A1CES2TSHRDAO
SCHEMBL11474267 0.79 TDP1 (0.42) CES1ALDH1A1CES2TSHRDAO
SCHEMBL262667 0.79 CES1 (0.40) CES1ALDH1A1CES2TSHRDAO
SCHEMBL145087 0.79 CES1 (0.40) CES1ALDH1A1CES2TSHRDAO
SCHEMBL27935362 0.77 CES1 (0.39) CES1ALDH1A1CES2TSHRDAO
SCHEMBL4285852 0.76 NFE2L2 (0.48) CES1ALDH1A1CES2TSHRDAO
SCHEMBL1478038 0.76 ALDH1A1 (0.43) CES1ALDH1A1CES2TSHRDAO
SCHEMBL2119746 0.76 AKR1C1 (0.50) ALDH1A1TSHRMAPK1AKR1C1MAPT
SCHEMBL3725516 0.76 AKR1C1 (0.50) ALDH1A1TSHRMAPK1AKR1C1MAPT
SCHEMBL2119744 0.76 AKR1C1 (0.50) ALDH1A1TSHRMAPK1AKR1C1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6485130-B2 Bonding process XEROX CORPORATION 2002-11-26 US disclosed
US-6323301-B1 FOR FABRICATION OF INK JET PRINTHEADS, DIELECTRICS, PHOTORESISTS XEROX CORPORATION 2001-11-27 US disclosed
US-20010025690-A1 Polyether insulator is crosslinked with silane, titanate or zirconate adhesion promotor by exposure to radiation; adherence to second article of metal, plasma nitride, silicon or glass; photoresists; ink jet print heads XEROX CORPORATION 2001-10-04 US disclosed
US-6273543-B1 POLYETHER KETONE POLYMERS XEROX CORPORATION 2001-08-14 US disclosed
US-6273985-B1 ADHESION PROMOTER IS EMPLOYED IN MICROELECTRICAL MECHANICAL SYSTEMS SUCH AS THERMAL INK JET PRINTHEADS. PARTICULARLY SUITABLE FOR USE WITH POLYARYLENE PHOTORESISTS. XEROX CORPORATION 2001-08-14 US disclosed
US-6260956-B1 CROSSLINKED OR CHAIN EXTENDED POLYPHENYLENE ETHERS XEROX CORPORATION 2001-07-17 US disclosed
US-6184263-B1 REACTING POLYMER HAVING END GROUPS AND MONOMER UNITS HAVING PHOTOSENSITIVITY IMPARTING GROUPS WITH ANOTHER POLYMER HAVING PHOTOSENSITIVITY IMPARTING MONOMER GROUPS OR REACTIVE DILUENT TO CAUSE CROSSLINKING AND CHAIN EXTENSION XEROX CORPORATION 2001-02-06 US disclosed
US-6177238-B1 ATLEAST ONE OF UPPER SUBSTRATE AND INSULATIVE LAYER COMPRISES A CROSSLINKED OR CHAIN EXTENDED POLYARYLENE ETHER FORMED BY CROSSLINKING OR CHAIN EXTENDING A PRECURSOR POLYMER HAVING TERMINAL END GROUPS AND MONOMER REPEAT UNITS XEROX CORPORATION 2001-01-23 US disclosed
US-6151042-A INK JET PRINTHEAD WITH LAYER OF CURED POLYMER MADE FROM POLYMER HAVING PHOTOSENSITIVE SUBSTITUENT WHICH ENABLES CROSSLINKING OR CHAIN EXTENSION VIA ACTINIC RADIATION, AND A SECOND, THERMOSENSITIVE SUBSTITUENT FOR FURTHER CROSSLINKING XEROX CORPORATION (US) 2000-11-21 US disclosed
US-6124372-A IMPROVED PHOTORESIST COMPOSITIONS AND IMPROVED THERMAL INK JET PRINTHEADS XEROX CORPORATION (US) 2000-09-26 US disclosed
US-6117967-A Arylene ether alcohol polymers XEROX CORPORATION (US) 2000-09-12 US disclosed
US-6022095-A INK JET PRINTHEAD XEROX CORPORATION (US) 2000-02-08 US disclosed
US-6007877-A Aqueous developable high performance photosensitive curable aromatic ether polymers XEROX CORPORATION (US) 1999-12-28 US disclosed
US-5994425-A Curable compositions containing photosensitive high performance aromatic ether polymers XEROX CORPORATION (US) 1999-11-30 US disclosed
US-5958995-A Blends containing photosensitive high performance aromatic ether curable polymers XEROX CORPORATION (US) 1999-09-28 US disclosed
EP-0827029-A2 High performance polymer composition XEROX CORPORATION (US) 1998-03-04 EP disclosed
EP-0827027-A2 Curable compositions XEROX CORPORATION (US) 1998-03-04 EP disclosed
EP-0827031-A2 Blends containing curable polymers XEROX CORPORATION (US) 1998-03-04 EP disclosed
EP-0827032-A2 Aqueous developable high performance curable polymers XEROX CORPORATION (US) 1998-03-04 EP disclosed