SCHEMBL7609083

SCHEMBL7609083

CCCc1cc(C(C)(C)c2ccc(Oc3ccc(N)cc3)c(CCC)c2)ccc1Oc1ccc(N)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 4/20 0.49
MAPT P10636 3/20 0.49
NPC1 O15118 2/20 0.49
ALDH1A1 P00352 3/20 0.46
HPGD P15428 1/20 0.46
MAPK1 P28482 1/20 0.46
L3MBTL1 Q9Y468 2/20 0.41
LMNA P02545 1/20 0.41
ATM Q13315 1/20 0.41
SLC6A4 P31645 3/20 0.39
HTR2A P28223 2/20 0.39
KCNH2 Q12809 1/20 0.39
PPARG P37231 4/20 0.37
PPARD Q03181 3/20 0.37
PPARA Q07869 3/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
CYP3A4 P08684 1/20 0.36
TSHR P16473 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
AR P10275 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8158102 0.92 RAB9A (0.47) RAB9AMAPTNPC1ALDH1A1HPGD
SCHEMBL8157881 0.88 MAPT (0.51) RAB9AMAPTNPC1ALDH1A1HPGD
SCHEMBL10713258 0.85 MAPT (0.44) RAB9AMAPTNPC1ALDH1A1HPGD
SCHEMBL31457250 0.85 HTR2A (0.49) RAB9AMAPTNPC1ALDH1A1ATM
SCHEMBL8581645 0.81 CYP19A1 (0.45) RAB9AALDH1A1TAAR1
SCHEMBL8578415 0.79 CYP19A1 (0.42) RAB9ANPC1ALDH1A1SLC6A4HTR2A
SCHEMBL8157883 0.79 CYP19A1 (0.42) RAB9AALDH1A1SLC6A4HTR2APPARG
SCHEMBL9618788 0.79 SLC6A4 (0.40) SLC6A4HTR2AKCNH2PPARGPPARD
SCHEMBL28770792 0.79 RAB9A (0.58) RAB9AMAPTNPC1ALDH1A1HPGD
SCHEMBL1856220 0.79 ALDH1A1 (0.55) RAB9AMAPTNPC1ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4435560-A HEAT RESISTANT, GOOD PROCESSABILITY HITACHI, LTD. (JP) 1984-03-06 US claimed
US-20020151659-A1 Formed from 6,6'-bis(2-(4-fluorophenyl)-4- phenylquinoline) and 4,4'-(1,1,1,3,3,3-hexafluoro-2,2-propylidene)bisphenol and 2,2-bis((4-maleimidophenoxy)phenyl)propane; dielectrics HITACHI CHEMICAL CO., LTD. (JP) 2002-10-17 US disclosed
US-6462148-B1 RESIN COMPOSITION COMPRISING A POLYMER CONTAINING A QUINOLINE RING AND A THERMOSETTING RESIN, AN INSULATING MATERIAL CONSTITUTED BY SAID RESIN COMPOSITION AND AN ADHESIVE FILM, PARTICULARLY A RESIN FOR AN INTERLAYER INSULATION FILM HITACHI CHEMICAL CO., LTD. (JP) 2002-10-08 US disclosed
EP-0700532-B1 ALIGNMENT LAYER FOR LIQUID CRYSTALS AVENTIS RES & TECH GMBH & CO (DE) 2000-03-29 EP disclosed
EP-0604885-B1 Liquid crystal display device HOECHST AG (DE) 1997-12-10 EP disclosed
US-5656340-A Liquid crystal display device HOECHST AKTIENGESELLSCHAFT (DE) 1997-08-12 US disclosed
EP-0476589-B1 Multi-layer wiring substrate and production thereof HITACHI LTD (JP) 1996-06-12 EP disclosed
EP-0708149-A1 Alignment layer material for liquid crystal display devices HOECHST AKTIENGESELLSCHAFT (DE) 1996-04-24 EP disclosed
EP-0700532-A1 ALIGNMENT LAYER FOR LIQUID CRYSTALS HOECHST AKTIENGESELLSCHAFT (DE) 1996-03-13 EP disclosed
EP-0690334-A2 Liquid crystal display device HOECHST AKTIENGESELLSCHAFT (DE) 1996-01-03 EP disclosed
US-4954612-A ORIENTATION CONTROL FOR LIQUID CRYSTAL DISPLAY HITACHI CHEMICAL CO., LTD. (JP) 1990-09-04 US disclosed
EP-0336536-A2 Organic-solvent soluble polyimide and production thereof Hitachi Chemical Co., Ltd. (JP) 1989-10-11 EP disclosed
US-4791157-A REACTING TRIMELLITIC ACID WITH AROMATIC DIAMINE WITH ETHER GROUPS HITACHI CHEMICAL CO. (JP) 1988-12-13 US disclosed
US-4758875-A Resin encapsulated semiconductor device HITACHI, LTD. (JP) 1988-07-19 US disclosed
EP-0032745-B1 ETHER IMIDES AND PROCESS FOR PRODUCING THE SAME Hitachi, Ltd. (JP) 1987-01-07 EP disclosed
EP-0047530-B1 MALEIMIDE RESIN COMPOSITION AND PROCESS FOR ITS PRODUCTION Hitachi, Ltd. (JP) 1986-12-10 EP disclosed
US-4460783-A AMIDATION, CYCLIZATION, DEHYDRATION HITACHI, LTD. (JP) 1984-07-17 US disclosed
US-4435560-A HEAT RESISTANT, GOOD PROCESSABILITY HITACHI, LTD. (JP) 1984-03-06 US disclosed
EP-0047530-A2 Maleimide resin composition and process for its production Hitachi, Ltd. (JP) 1982-03-17 EP disclosed
EP-0032745-A2 Ether imides and process for producing the same Hitachi, Ltd. (JP) 1981-07-29 EP disclosed