⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL588585 | 0.92 | CYP1A2 (0.36) | — | |
| SCHEMBL9628543 | 0.89 | MAPT (0.39) | — | |
| SCHEMBL6720442 | 0.81 | — | — | |
| SCHEMBL26384788 | 0.78 | — | — | |
| SCHEMBL3673726 | 0.71 | — | — | |
| SCHEMBL5681540 | 0.71 | — | — | |
| SCHEMBL13117176 | 0.70 | LMNA (0.36) | — | |
| SCHEMBL26384653 | 0.69 | — | — | |
| SCHEMBL1062616 | 0.69 | — | — | |
| SCHEMBL973460 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6436824-B1 | Low dielectric constant materials for copper damascene | CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) | 2002-08-20 | — | — | US | claimed |
| US-20160166991-A1 | Membrane Selective for Alcohols | VECTOR SEPARATIONS, LLC. | 2016-06-16 | — | — | US | disclosed |
| US-9216391-B2 | Membranes having aligned 1-D nanoparticles in a matrix layer for improved fluid separation | PORIFERA, INC. (US) | 2015-12-22 | — | — | US | disclosed |
| WO-2012135065-A2 | MEMBRANES HAVING ALIGNED 1-D NANOPARTICLES IN A MATRIX LAYER FOR IMPROVED FLUID SEPARATION | PORIFERA, INC. (US) | 2012-10-04 | — | — | WO | disclosed |
| US-20120241371-A1 | Membranes having aligned 1-D nanoparticles in a matrix layer for improved fluid separation | U.S. DEPARTMENT OF ENERGY | 2012-09-27 | — | — | US | disclosed |
| US-6436824-B1 | Low dielectric constant materials for copper damascene | CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) | 2002-08-20 | — | — | US | disclosed |