SCHEMBL7619396

SCHEMBL7619396

COc1ccc(P(=O)(C(=O)c2c(C)cccc2C)c2ccccc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 4/20 0.48
RAB9A P51151 4/20 0.48
LMNA P02545 2/20 0.45
PKM P14618 1/20 0.43
HTT P42858 1/20 0.43
ALDH1A1 P00352 3/20 0.43
MMP1 P03956 2/20 0.43
MMP9 P14780 2/20 0.43
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
MMP13 P45452 1/20 0.43
CES2 O00748 1/20 0.42
CES1 P23141 1/20 0.42
PTGS2 P35354 1/20 0.42
ACP3 P15309 1/20 0.42
HPGD P15428 1/20 0.41
KDM4E B2RXH2 1/20 0.41
L3MBTL1 Q9Y468 2/20 0.40
KCNK9 Q9NPC2 1/20 0.40
ATM Q13315 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7623578 0.95 NPC1 (0.44) NPC1RAB9ALMNAALDH1A1MMP1
SCHEMBL7625067 0.89 NPC1 (0.43) NPC1RAB9ALMNAPKMHTT
SCHEMBL260684 0.87 HPGD (0.42) NPC1RAB9ALMNAHTTALDH1A1
SCHEMBL7622245 0.85 CA12 (0.49) NPC1RAB9AHTTMEN1KMT2A
SCHEMBL17367850 0.85 KMT2A (0.47) NPC1RAB9AHTTMEN1KMT2A
SCHEMBL7619376 0.84 KMT2A (0.46) NPC1RAB9ALMNAALDH1A1MEN1
SCHEMBL7622350 0.82 ALDH1A1 (0.43) NPC1RAB9ALMNAHTTALDH1A1
SCHEMBL7618250 0.80 FAAH (0.47)
SCHEMBL7624618 0.80 MAPT (0.49) NPC1RAB9APKMHTTALDH1A1
SCHEMBL9643952 0.80 CES2 (0.58) NPC1RAB9AALDH1A1KMT2ACES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4361224-B1 METHOD FOR PRODUCING A PRINTED MATTER TORAY INDUSTRIES (JP) 2025-12-10 EP disclosed
EP-4361224-A2 METHOD FOR PRODUCING A PRINTED MATTER Toray Industries, Inc. (JP) 2024-05-01 EP disclosed
EP-3594006-B1 METHOD FOR PRODUCING A PRINTED MATTER TORAY INDUSTRIES (JP) 2024-04-24 EP disclosed
EP-3594293-B1 ACTINIC-RAY-CURABLE INK FOR LITHOGRAPHIC PRINTING AND METHOD FOR PRODUCING PRINTED MATTER USING SAME TORAY INDUSTRIES (JP) 2024-02-21 EP disclosed
US-20220326612-A1 PRINTING INK, METHOD FOR PRODUCING PRINTED WORK USING SAID INK, AND PRINTED MATERIAL TORAY INDUSTRIES, INC. (JP) 2022-10-13 US disclosed
US-20220235237-A1 ACTIVE ENERGY RAY-CURABLE LITHOGRAPHIC INK AND METHOD FOR PRODUCING PRINT USING SAME TORAY INDUSTRIES, INC. (JP) 2022-07-28 US disclosed
US-11383543-B2 Method for producing printed matter and printing machine TORAY INDUSTRIES, INC. (JP) 2022-07-12 US disclosed
EP-3974200-A1 ACTINIC-RAY-CURABLE LITHOGRAPHIC PRINTING INK AND METHOD FOR PRODUCING PRINT USING SAME Toray Industries, Inc. (JP) 2022-03-30 EP disclosed
EP-3974201-A1 PRINTING INK, METHOD FOR PRODUCING PRINTED WORK USING SAID INK, AND PRINTED WORK Toray Industries, Inc. (JP) 2022-03-30 EP disclosed
EP-3381988-B1 LITHOGRAPHIC INK TORAY INDUSTRIES (JP) 2022-01-05 EP disclosed
CN-110352134-B Method for producing printed matter and printing machine 东丽株式会社 2021-07-20 CN disclosed
WO-2020235556-A1 ACTINIC-RAY-CURABLE LITHOGRAPHIC PRINTING INK AND METHOD FOR PRODUCING PRINT USING SAME 東レ株式会社 (JP) 2020-11-26 WO disclosed
WO-2020235557-A1 PRINTING INK, METHOD FOR PRODUCING PRINTED WORK USING SAID INK, AND PRINTED WORK 東レ株式会社 (JP) 2020-11-26 WO disclosed
CN-108350296-B Ink for offset printing 东丽株式会社 2020-01-21 CN disclosed
US-20180371269-A1 LITHOGRAPHIC INK TORAY INDUSTRIES, INC. (JP) 2018-12-27 US disclosed
EP-3381988-A1 LITHOGRAPHIC INK Toray Industries, Inc. (JP) 2018-10-03 EP disclosed
CN-108350296-A Lithographic printing ink 东丽株式会社 2018-07-31 CN disclosed
US-6486228-B2 BIS-ACYLPHOSPHINE OXIDES AND ACYLPHOSPHINE OXIDES FOR CURING PHOTOPOLYMERIZABLE COMPOSITIONS WITHOUT YELLOWING; USE IN WHITE SURFACE COATINGS, AS NEGATIVE PHOTORESISTS, IN PRINTING PLATES CIBA SPECIALTY CHEMICALS CORPORATION 2002-11-26 US disclosed
US-20010036978-A1 Photoinitiator combinations IGM GROUP B.V. (NL) 2001-11-01 US disclosed
US-6251963-B1 ORGAOPHOSPHOROUS COMPOUND CONTAINING KETONE GROUP CIBA SPECIALTY CHEMICALS CORPORATION 2001-06-26 US disclosed