Sulfuric Acid

Sulfuric Acid

SCHEMBL7633978

CC(O)[N+](C)(C)C.O=S(=O)([O-])O

nearest known ligand 0.44

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Known targets — ChEMBL curated mechanism

CYP51cyp51Acyp51c

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.44
ALDH1A1 P00352 1/20 0.44
TSHR P16473 1/20 0.44
KMT2A Q03164 1/20 0.44
BBOX1 O75936 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL2103290 0.91 TP53 (0.36) MEN1ALDH1A1TSHRKMT2ABBOX1
SCHEMBL28615762 0.88 BBOX1 (0.31) MEN1ALDH1A1TSHRKMT2ABBOX1
Sulfuric Acid SCHEMBL7633973 0.88 CA5A (0.40) ALDH1A1KMT2A
Sulfuric Acid SCHEMBL11513884 0.86 MEN1 (0.42) MEN1ALDH1A1TSHRKMT2A
SCHEMBL16700570 0.85 CA2 (0.35) ALDH1A1KMT2A
SCHEMBL27999239 0.81 POLB (0.33) TSHR
Sulfuric Acid SCHEMBL27903089 0.78 MEN1 (0.40) MEN1ALDH1A1TSHRKMT2A
Sulfuric Acid SCHEMBL7170420 0.77 TSHR (0.61) MEN1ALDH1A1TSHRKMT2A
Tetramethylammonium Ion SCHEMBL36962 0.77 TSHR (0.61) MEN1ALDH1A1TSHRKMT2ABBOX1
SCHEMBL19858976 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6462005-B1 AQUEOUS SOLUTION CONTAINING A QUARTERNARY AMMONIUM SALT, A FLUORO COMPOUND AND OPTIONALLY AN ORGANIC SOLVENT; PROTECTING DEPOSITION FILM TO BE REMOVED; NO CORROSION OF CONDUCTIVE LAYER BEING DECONTAMINATED TEXAS INSTRUMENTS INCORPORATED 2002-10-08 US claimed
US-6462005-B1 AQUEOUS SOLUTION CONTAINING A QUARTERNARY AMMONIUM SALT, A FLUORO COMPOUND AND OPTIONALLY AN ORGANIC SOLVENT; PROTECTING DEPOSITION FILM TO BE REMOVED; NO CORROSION OF CONDUCTIVE LAYER BEING DECONTAMINATED TEXAS INSTRUMENTS INCORPORATED 2002-10-08 US disclosed
US-4144367-A ANTISTATIC, ANTISOILANT, QUATERNARY AMMONIUM COMPOUND; FLUORINE COMPOUND MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1979-03-13 US disclosed