SCHEMBL7647145

SCHEMBL7647145

Cc1ccccc1-c1ccc(OC(N)=O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 1/20 0.50
PPARA Q07869 1/20 0.50
CA12 O43570 1/20 0.49
CA1 P00915 1/20 0.49
CA2 P00918 1/20 0.49
CA9 Q16790 1/20 0.49
KIF11 P52732 1/20 0.47
KMT2A Q03164 2/20 0.44
MEN1 O00255 1/20 0.44
MCL1 Q07820 1/20 0.44
SLC1A3 P43003 1/20 0.43
SLC1A2 P43004 1/20 0.43
SLC1A1 P43005 1/20 0.43
SLC6A7 Q99884 1/20 0.41
AVPR1A P37288 3/20 0.40
AVPR2 P30518 2/20 0.40
FGFR1 P11362 1/20 0.40
SRC P12931 1/20 0.40
FGFR2 P21802 1/20 0.40
FGFR4 P22455 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7047570 0.86 PPARG (0.52) PPARGPPARACA12CA1CA2
SCHEMBL1551128 0.84 LMNA (0.55) PPARGPPARACA12CA1CA2
SCHEMBL8682345 0.84 PPARG (0.55) PPARGPPARACA12CA1CA2
SCHEMBL29177332 0.83 EPHX1 (0.48) PPARGPPARAKIF11KMT2AMEN1
SCHEMBL28383281 0.81 KMT2A (0.53) PPARGPPARAKMT2AMEN1MCL1
SCHEMBL29819646 0.79 ELANE (0.56) PPARGPPARACA12CA1CA2
SCHEMBL16192607 0.79 ELANE (0.56) PPARGPPARACA12CA1CA2
SCHEMBL27920494 0.78 CCNC (0.51) KIF11KMT2AFFAR1
SCHEMBL1955422 0.77 KIF11 (0.61) CA1CA2CA9KIF11KMT2A
SCHEMBL2950525 0.77 MKNK1 (0.60) PPARGPPARACA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6399292-B2 A MATTING AGENT HAVING A SOFTENING TEMPERATURE OF FROM 100 TO 500 DEGREES C. IS CONTAINED AT LEAST ON ONE SIDE OF THE SUPPORT. FUJI PHOTO FILM CO., LTD. (JP) 2002-06-04 US disclosed
US-20020015924-A1 PHOTOTHERMOGRAPHIC PHOTOSENSITIVE MATERIAL AND PHOTOTHEMOGRAPHIIC METHOD FUJIFILM CORPORATION (JP) 2002-02-07 US disclosed
US-6300053-B1 SUPPORT WITH SURFACE LAYER, PHOTOSENSITIVITY AND NONPHOTOSENSITIVE LAYER, SUPPORTS AND BLEACHABLE CYANINE DYE WITH SILVER HALIDE LAYER FUJI PHOTO FILM CO., LTD. (JP) 2001-10-09 US disclosed