Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 11/20 | 0.53 |
| ▸ | CA2 | P00918 | 11/20 | 0.53 |
| ▸ | CA12 | O43570 | 5/20 | 0.53 |
| ▸ | CA7 | P43166 | 5/20 | 0.53 |
| ▸ | CA13 | Q8N1Q1 | 5/20 | 0.53 |
| ▸ | MMP1 | P03956 | 1/20 | 0.46 |
| ▸ | MMP2 | P08253 | 1/20 | 0.46 |
| ▸ | MMP9 | P14780 | 1/20 | 0.46 |
| ▸ | MMP8 | P22894 | 1/20 | 0.46 |
| ▸ | MMP13 | P45452 | 1/20 | 0.46 |
| ▸ | F2 | P00734 | 3/20 | 0.40 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.40 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.40 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.40 |
| ▸ | CA9 | Q16790 | 2/20 | 0.33 |
| ▸ | CA3 | P07451 | 1/20 | 0.31 |
| ▸ | CA4 | P22748 | 1/20 | 0.31 |
| ▸ | CA6 | P23280 | 1/20 | 0.31 |
| ▸ | CA5A | P35218 | 1/20 | 0.31 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23779685 | 0.88 | CA1 (0.43) | CA1CA2CA12CA7CA13 | |
| SCHEMBL23779676 | 0.82 | CA1 (0.43) | CA1CA2CA12CA7CA13 | |
| SCHEMBL13659417 | 0.74 | CA1 (0.56) | CA1CA2CA12CA7CA13 | |
| SCHEMBL777768 | 0.74 | CA1 (0.56) | CA1CA2CA12CA7CA13 | |
| SCHEMBL2477379 | 0.71 | CA1 (0.53) | CA1CA2CA12CA7CA13 | |
| SCHEMBL777917 | 0.69 | CA1 (0.50) | CA1CA2CA12CA7CA13 | |
| SCHEMBL571331 | 0.69 | CA1 (1.00) | CA1CA2CA12CA7CA13 | |
| SCHEMBL20345327 | 0.69 | CA1 (0.50) | CA1CA2CA12CA7CA13 | |
| SCHEMBL36242 | 0.69 | CA2 (0.52) | CA1CA2CA12CA7CA13 | |
| SCHEMBL14532533 | 0.69 | CA1 (0.50) | CA1CA2CA12CA7CA13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112930352-B | Silylamine compounds and latent curing agents containing the same | 广荣化学株式会社 | 2024-02-13 | — | — | CN | disclosed |
| US-20230176479-A1 | NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-08 | — | — | US | disclosed |
| EP-4167028-A1 | NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-19 | — | — | EP | disclosed |
| CN-115885217-A | Negative resist film laminate and pattern forming method | 信越化学工业株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-108107676-B | Chemically amplified positive resist film laminate and pattern formation method | 信越化学工业株式会社 | 2023-02-21 | — | — | CN | disclosed |
| CN-108459469-B | Pattern forming method | 信越化学工业株式会社 | 2022-11-11 | — | — | CN | disclosed |
| US-11460774-B2 | Photosensitive resin composition, photosensitive dry film, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-10-04 | — | — | US | disclosed |
| CN-114600045-A | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2022-06-07 | — | — | CN | disclosed |
| US-20220119583-A1 | SILYLAMINE COMPOUND AND LATENT CURING AGENT COMPRISING SAID SILYLAMINE COMPOUND | KOEI CHEMICAL COMPANY, LIMITED (JP) | 2022-04-21 | — | — | US | disclosed |
| US-11256174-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-02-22 | — | — | US | disclosed |
| US-20020055591-A1 | Olefinic thermoplastic elastomer composition and method for producing the same | MITSUI CHEMICALS, INC. | 2002-05-09 | — | — | US | disclosed |
| US-6376149-B2 | Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores | YALE UNIVERSITY | 2002-04-23 | — | — | US | disclosed |
| US-20020042019-A1 | Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores | NAVY, SECRETARY OF THE UNITED STATES OF AMERICA | 2002-04-11 | — | — | US | disclosed |
| EP-1152016-A1 | ETHYLENE COPOLYMER RUBBER, PROCESS FOR PRODUCING THE SAME, AND USE | Mitsui Chemicals, Inc. (JP) | 2001-11-07 | — | — | EP | disclosed |
| US-20010001698-A1 | METHODS AND COMPOSITIONS FOR IMAGING ACIDS IN CHEMICALLY AMPLIFIED PHOTORESISTS USING PH-DEPENDENT FLUOROPHORES | ROBERT DAVID GROBER | 2001-05-24 | — | — | US | disclosed |
| EP-1088836-A1 | ETHYLENE/ALPHA-OLEFIN/UNCONJUGATED POLYENE COPOLYMER RUBBER, RUBBER COMPOSITION FOR SEALING, MOLDED RUBBER FOR SEALING, AND PROCESS FOR PRODUCING THE MOLDED RUBBER | Mitsui Chemicals, Inc. (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1065241-A2 | Olefinic thermoplastic elastomer composition and method for producing the same | Mitsui Chemicals, Inc. (JP) | 2001-01-03 | — | — | EP | disclosed |
| US-5712078-A | POLYHYDROXYSTYRENE CROSSLINKED WITH A KETAL, PHOTOLITHOGRAPHY, INTEGRATED CIRCUITS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1998-01-27 | — | — | US | disclosed |
| CN-1171097-A | Norbornene compound having chain polyene group and unsaturated ethylene copolymer prepared using the same | MITSUI PETROCHEMICAL IND (JP) | 1998-01-21 | — | — | CN | disclosed |
| EP-0628876-A1 | Environmentally stable highly sensitive acid amplifier photoresists | International Business Machines Corporation (US) | 1994-12-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220119583-A1 | SILYLAMINE COMPOUND AND LATENT CURING AGENT COMPRISING SAID SILYLAMINE COMPOUND | CDKN1A, SIRT2, H1-4 | CA1 953/4885CA2 994/4885CA12 725/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.