Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22946662 | 1.00 | CYP2D6 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL5892405 | 0.80 | — | — | |
| SCHEMBL11760105 | 0.75 | — | — | |
| SCHEMBL13770638 | 0.74 | CYP2D6 (0.31) | CYP2D6CYP2C19 | |
| SCHEMBL201636 | 0.74 | CYP2D6 (0.34) | CYP2D6CYP2C19 | |
| SCHEMBL10020723 | 0.72 | CYP2D6 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL200647 | 0.71 | CYP2D6 (0.36) | CYP2D6CYP2C19 | |
| SCHEMBL18772329 | 0.69 | CYP2C19 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL75012 | 0.69 | CYP2C19 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL14511665 | 0.69 | CYP2D6 (0.32) | CYP2D6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 653 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8524439-B2 | Silsesquioxane resin systems with base additives bearing electron-attracting functionalities | DOW CORNING CORPORATION (US) | 2013-09-03 | — | — | US | claimed |
| US-8148043-B2 | Silsesquioxane resin systems with base additives bearing electron-attracting functionalities | DOW CORNING CORPORATION (US) | 2012-04-03 | — | — | US | claimed |
| US-20090312467-A1 | SILSESQUIOXANE RESIN SYSTEMS WITH BASE ADDITIVES BEARING ELECTRON-ATTRACTING FUNCTIONALITIES | DOW CORNING CORPORATION (US) | 2009-12-17 | — | — | US | claimed |
| US-7625687-B2 | Silsesquioxane resin | DOW CORNING CORPORATION (US) | 2009-12-01 | — | — | US | claimed |
| US-20090202941-A1 | SILSESQUIOXANE RESIN SYSTEMS WITH BASE ADDITIVES BEARING ELECTRON-ATTRACTING FUNCTIONALITIES | DOW CORNING CORPORATION (US) | 2009-08-13 | — | — | US | claimed |
| US-20070281242-A1 | Silsesquioxane Resin | DOW SILICONES CORPORATION | 2007-12-06 | — | — | US | claimed |
| EP-1660561-A2 | PHOTOSENSITIVE SILSESQUIOXANE RESIN | Dow Corning Corporation (US) | 2006-05-31 | — | — | EP | claimed |
| WO-2005007747-A2 | PHOTOSENSITIVE SILSESQUIOXANE RESIN | DOW CORNING CORPORATION (US) | 2005-01-27 | — | — | WO | claimed |
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-7189493-B2 | Polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-20070026341-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20070026341-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-02-01 | — | — | US | disclosed |
| US-6949615-B2 | Monomer having electron-withdrawing group and process for preparing the same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-09-27 | — | — | US | disclosed |
| EP-1331216-A1 | MONOMERS HAVING ELECTRON-WITHDRAWING GROUPS AND PROCESSES FOR PREPARING THE SAME | Daicel Chemical Industries, Ltd. (JP) | 2003-07-30 | — | — | EP | disclosed |
| US-20030059710-A1 | Monomer having electron-withdrawing group and process for preparing the same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-03-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240027903-A1 | Resist Material And Patterning Process | LBR, HNRNPU, EWSR1 | CYP2D6 2665/4885CYP2C19 4159/4885 |
| US-20030059710-A1 | Monomer having electron-withdrawing group and process for preparing the same | RFC3, RFC2, MAPRE1 | CYP2D6 2074/4885CYP2C19 2114/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.