SCHEMBL766032

SCHEMBL766032

O=C(/C=C/c1ccccc1OC1CCCCO1)N1CCCCC1

nearest known ligand 0.61

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
HPGD P15428 2/20 0.61
KDM4E B2RXH2 4/20 0.55
MAPT P10636 2/20 0.52
NPC1 O15118 2/20 0.52
RAB9A P51151 2/20 0.52
SMN1; SMN2 Q16637 2/20 0.52
ALDH1A1 P00352 3/20 0.47
ITGB2 P05107 2/20 0.47
ICAM1 P05362 2/20 0.47
ITGAL P20701 2/20 0.47
L3MBTL1 Q9Y468 1/20 0.45
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
C3AR1 Q16581 1/20 0.40
PTPN1 P18031 1/20 0.40
PELI1 Q96FA3 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3112643 0.78 HPGD (0.97) HPGDKDM4EMAPTNPC1RAB9A
SCHEMBL3112646 0.78 HPGD (0.97) HPGDKDM4EMAPTNPC1RAB9A
SCHEMBL5863691 0.75 ALDH1A1 (0.42) HPGDMAPTSMN1; SMN2ALDH1A1L3MBTL1
SCHEMBL766040 0.74 HPGD (0.43) HPGDKDM4EMAPTNPC1RAB9A
SCHEMBL766007 0.73 HPGD (0.73) HPGDKDM4EMAPTNPC1RAB9A
SCHEMBL765974 0.73 HPGD (0.61) HPGDKDM4EMAPTNPC1RAB9A
SCHEMBL7284026 0.73 PTPN1 (0.37) KDM4ESMN1; SMN2ALDH1A1MEN1KMT2A
SCHEMBL7284019 0.73 PTPN1 (0.37) KDM4ESMN1; SMN2ALDH1A1MEN1KMT2A
SCHEMBL10229071 0.73 HPGD (0.47) HPGDKDM4EMAPTNPC1RAB9A
SCHEMBL1355137 0.73 PTPN1 (0.39) KDM4EALDH1A1MEN1KMT2APTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME DAI NIPPON PRINTING CO., LTD. (JP) 2012-03-22 US disclosed
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME DAI NIPPON PRINTING CO., LTD. (JP) 2012-03-22 US disclosed
WO-2010113813-A1 BASE-GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION 大日本印刷株式会社 (JP) 2010-10-07 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME RER1, SUN2, REV1 HPGD 861/4885KDM4E 2434/4885MAPT 852/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.