SCHEMBL1054231

SCHEMBL1054231

O=C(O[Si](OCc1ccccc1)(OCc1ccccc1)OC(=O)C(F)(F)F)C(F)(F)F

nearest known ligand 0.44

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CES1 P23141 5/20 0.44
ALDH1A1 P00352 3/20 0.41
KMT2A Q03164 2/20 0.40
MEN1 O00255 1/20 0.40
MAPK1 P28482 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
SLC6A2 P23975 1/20 0.40
SLC6A3 Q01959 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
PTPRC P08575 1/20 0.39
PTPN1 P18031 1/20 0.39
FAAH O00519 3/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL766050 0.79 ALDH1A1 (0.60) ALDH1A1KMT2AMAPK1L3MBTL1SLC6A2
SCHEMBL3296385 0.77 ALDH1A1 (0.57) CES1ALDH1A1KMT2AMEN1MAPK1
SCHEMBL27923357 0.75 ALDH1A1 (0.55) CES1ALDH1A1KMT2AMEN1MAPK1
SCHEMBL1052706 0.73 CES1 (0.44) CES1ALDH1A1KMT2AMEN1FAAH
SCHEMBL766418 0.73 TSHR (0.57) ALDH1A1KMT2AMAPK1L3MBTL1SLC6A2
Acetic Acid SCHEMBL27401419 0.72 ALDH1A1 (0.61) CES1ALDH1A1KMT2AMEN1MAPK1
Dimethylamine SCHEMBL27585618 0.71 KMT2A (0.55) CES1ALDH1A1KMT2AMEN1MAPK1
SCHEMBL27694802 0.71 ALDH1A1 (0.50) CES1ALDH1A1KMT2AMEN1MAPK1
Trimethylammonium SCHEMBL27550267 0.71 ALDH1A1 (0.55) CES1ALDH1A1KMT2AMEN1MAPK1
SCHEMBL4274822 0.71 CES1 (0.43) CES1ALDH1A1PTPN1FAAH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3141538-B1 IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS VERSUM MAT US LLC (US) 2019-10-30 EP disclosed
EP-2318477-B1 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MAT USA INC (US) 2019-06-05 EP disclosed
EP-3141538-A1 IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS AIR PRODUCTS AND CHEMICALS, INC. (US) 2017-03-15 EP disclosed
EP-2141141-B1 Improved Process Stability of NBDE Using Substituted Phenol Stabilizers AIR PROD & CHEM (US) 2016-09-28 EP disclosed
EP-1931613-B1 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS (US) 2015-11-11 EP disclosed
EP-1931746-B1 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS (US) 2013-09-04 EP disclosed
US-8252704-B2 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2012-08-28 US disclosed
US-8173213-B2 Process stability of NBDE using substituted phenol stabilizers AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-05-08 US disclosed
US-20110259242-A1 Additives to Prevent Degradation of Cyclic Alkene Derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2011-10-27 US disclosed
US-7985350-B2 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2011-07-26 US disclosed
WO-2010005937-A1 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2010-01-14 WO disclosed
EP-2141141-A1 Improved Process Stability of NBDE Using Substituted Phenol Stabilizers Air Products and Chemicals, Inc. (US) 2010-01-06 EP disclosed
US-20090297711-A1 Process Stability of NBDE Using Substituted Phenol Stabilizers AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-12-03 US disclosed
US-20090291210-A1 Additives to Prevent Degradation of Cyclic Alkene Derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2009-11-26 US disclosed
EP-1931613-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FujiFilm Electronic Materials USA, Inc. (US) 2008-06-18 EP disclosed
EP-1931746-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FujiFilm Electronic Materials USA, Inc. (US) 2008-06-18 EP disclosed
WO-2007033123-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO disclosed
WO-2007033075-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO disclosed
US-20070057235-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US disclosed
US-20070057234-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090297711-A1 Process Stability of NBDE Using Substituted Phenol Stabilizers CCNE2, CCNE1, C1R CES1 2624/4885ALDH1A1 3235/4885KMT2A 3205/4885
US-20110259242-A1 Additives to Prevent Degradation of Cyclic Alkene Derivatives GPX4, GPX1, NFE2L2 CES1 804/4885ALDH1A1 69/4885KMT2A 3634/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.