SCHEMBL7667334

SCHEMBL7667334

CC(C)C1(OC(=O)C2CC3C=CC2C3)CC[Si](C)(C)CC1

nearest known ligand 0.40

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.40
KDM4E B2RXH2 1/20 0.37
LMNA P02545 1/20 0.37
HPGD P15428 1/20 0.33
KMT2A Q03164 2/20 0.33
POLB P06746 2/20 0.33
RAB9A P51151 1/20 0.32
APEX1 P27695 1/20 0.31
RECQL P46063 1/20 0.31
BLM P54132 1/20 0.31
ESR2 Q92731 1/20 0.31
HSD17B10 Q99714 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1173516 0.85 ALDH1A1 (0.42) ALDH1A1KDM4ELMNAHPGDKMT2A
SCHEMBL7669427 0.83 KDM4E (0.40) ALDH1A1KDM4ELMNAHPGDKMT2A
SCHEMBL7667945 0.80 KDM4E (0.37) ALDH1A1KDM4ELMNAHPGDKMT2A
Maleic Anhydride SCHEMBL7667247 0.74 ALDH1A1 (0.34) ALDH1A1KDM4ELMNAHPGDKMT2A
SCHEMBL5025391 0.71 ALDH1A1 (0.41) ALDH1A1KDM4ELMNAHPGDKMT2A
SCHEMBL7671705 0.71 ALDH1A1 (0.35) ALDH1A1KDM4ELMNAHPGDKMT2A
SCHEMBL3364588 0.71 KDM4E (0.44) ALDH1A1KDM4ELMNAHPGDKMT2A
SCHEMBL22263892 0.70 LMNA (0.42) ALDH1A1KDM4ELMNAHPGDKMT2A
SCHEMBL525107 0.70 LMNA (0.42) ALDH1A1KDM4ELMNAHPGDKMT2A
SCHEMBL11800180 0.70 ALDH1A1 (0.56) ALDH1A1KDM4ELMNAHPGDKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6492089-B2 POLYMER BEARING CYCLIC SILICON-CONTAINING GROUPS SUCH AS 1,4,4-TRIMETHYL-4-SILACYCLOHEXYL METHACRYLATE; USE AS CHEMICALLY AMPLIFIED POSITIVE RESIST SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-12-10 US disclosed
US-20010003772-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICDL CO., LTD. OF (JP) 2001-06-14 US disclosed