SCHEMBL767438

SCHEMBL767438

COC(C)([SiH3])OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methylamine SCHEMBL16192060 0.92
Ethylamine SCHEMBL2045935 0.83 ALDH1A1 (0.38)
SCHEMBL3420491 0.80 ALDH1A1 (0.32)
Diethylamine SCHEMBL16109427 0.78 TP53 (0.44)
Propylamine SCHEMBL56587 0.78 ALDH1A1 (0.35)
SCHEMBL7934193 0.76
SCHEMBL3888380 0.67 ALDH1A1 (0.40)
SCHEMBL5412519 0.67 ALDH1A1 (0.40)
SCHEMBL14895494 0.67 ALDH1A1 (0.40)
SCHEMBL3988458 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 224 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025264567-A1 LOW-K FILM COEFFICIENT OF THERMAL EXPANSION MODULATION BY UV TREATMENT APPLIED MATERIALS, INC. (US) 2025-12-26 WO claimed
US-20250391656-A1 LOW-K FILM COEFFICIENT OF THERMAL EXPANSION MODULATION BY UV TREATMENT APPLIED MATERIALS INC (US) 2025-12-25 US claimed
US-20250357107-A1 RF PULSING ASSISTED LOW-K MATERIAL DEPOSITION WITH HIGH DENSITY APPLIED MATERIALS, INC. (US) 2025-11-20 US claimed
WO-2025049147-A1 METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECTRIC CONSTANT AND HIGH MECHANICAL STRENGTH APPLIED MATERIALS, INC. (US) 2025-03-06 WO claimed
US-20250069884-A1 METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECTRIC CONSTANT AND HIGH MECHANICAL STRENGTH APPLIED MATERIALS, INC. (US) 2025-02-27 US claimed
CN-118598908-A Cyclopropane skeleton biphosphine ligand, cobalt complex thereof, preparation method and application 南开大学 2024-09-06 CN claimed
CN-114213648-B Hydrolyzable polymer and epoxy resin heat conducting material composition containing same 安徽壹石通材料科学研究院有限公司 2023-06-20 CN claimed
EP-3956415-A1 ADHESIVE SEALANT COMPOSITION ESSVE Produkter AB (SE) 2022-02-23 EP claimed
WO-2020214079-A1 ADHESIVE SEALANT COMPOSITION ESSVE PRODUKTER AB (SE) 2020-10-22 WO claimed
EP-2435502-B1 CURABLE SILYL-GROUP CONTAINING COMPOSITIONS AND ITS USE EVONIK DEGUSSA GMBH (DE) 2016-10-19 EP claimed
US-8974627-B2 Curable compositions containing silyl groups, and use thereof EVONIK DEGUSSA GMBH (DE) 2015-03-10 US claimed
US-8298965-B2 Volatile precursors for deposition of C-linked SiCOH dielectrics AMERICAN AIR LIQUIDE, INC. (US) 2012-10-30 US claimed
US-20120067520-A1 Curable Compositions Containing Silyl Groups, And Use Thereof EVONIK GOLDSCHMIDT GMBH (DE) 2012-03-22 US claimed
US-20100052115-A1 Volatile Precursors for Deposition of C-Linked SiCOH Dielectrics AMERICAN AIR LIQUIDE, INC. (US) 2010-03-04 US claimed
WO-2026105502-A1 COMPOSITE METAL CYANIDE COMPLEX CATALYST POWDER, METHOD FOR PRODUCING POLYETHER COMPOUND, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING REACTIVE SILICON GROUP, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING URETHANE BOND, AND METHOD FOR PRODUCING POLYETHER COMPOUND HAVING POLYMERIZABLE UNSATURATED GROUP AGC株式会社 2026-05-21 WO disclosed
EP-4737503-A1 METHOD FOR PRODUCING POLYETHER COMPOUND, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING REACTIVE SILICON GROUP, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING URETHANE BOND, AND METHOD FOR PRODUCING POLYETHER COMPOUND HAVING POLYMERIZABLE UNSATURATED GROUP AGC INC. (JP) 2026-05-06 EP disclosed
EP-4737502-A1 METHOD FOR PRODUCING POLYETHER COMPOUND, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING REACTIVE SILICON GROUP, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING URETHANE BOND, AND METHOD FOR PRODUCING POLYETHER COMPOUND HAVING POLYMERIZABLE UNSATURATED GROUP AGC INC. (JP) 2026-05-06 EP disclosed
WO-1994007948-A1 SURFACE-MODIFIED OXIDE PARTICLES AND THEIR USE AS FILLERS AND MODIFIERS IN POLYMER MATERIALS MERCK Patent Gesellschaft mit beschränkter Haftung (DE) 1994-04-14 WO disclosed
WO-1994007945-A1 MOLDED BODIES MADE OF POLYESTER COTAINING COVALENT-BONDED OXIDE PARTICLES HOECHST AKTIENGESELLSCHAFT (DE) 1994-04-14 WO disclosed
EP-0579102-A1 Liquid chromatography stationary phases with reduced silanol interactions WATERS INVESTMENTS LIMITED (US) 1994-01-19 EP disclosed