SCHEMBL7693198

SCHEMBL7693198

CCCO[SiH](O[SiH3])OCCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1706451 0.84
SCHEMBL7691463 0.83 ADRB2 (0.38)
SCHEMBL27814 0.81 CA1 (0.30)
SCHEMBL9958747 0.79 THRB (0.38)
Fluoride SCHEMBL27875582 0.78
Bromide SCHEMBL9709407 0.78
SCHEMBL2805172 0.78
SCHEMBL2472583 0.75
SCHEMBL29587599 0.75
Methylamine SCHEMBL28883046 0.75 CA1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6344579-B1 REACTION OF FLUOROSILICON COMPOUND WITH REACTION OF SILICON WITH HYDROXY, ALKOXY OR ARYLOXY GROUP WITH DIFLUORODIAMINO COMPOUND MITSUI CHEMICALS, INC. (JP) 2002-02-05 US disclosed
EP-1138633-A1 PROCESS FOR PRODUCING FLUORINATED SILICON COMPOUND Mitsui Chemicals, Inc. (JP) 2001-10-04 EP disclosed
US-5907382-A Transparent conductive substrate and display apparatus KABUSHIKI KAISHA TOSHIBA (JP) 1999-05-25 US disclosed