Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRM2 | Q14416 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13829093 | 0.72 | HTT (0.31) | — | |
| SCHEMBL4604137 | 0.70 | MAPK1 (0.43) | — | |
| SCHEMBL13525790 | 0.63 | HTT (0.33) | — | |
| SCHEMBL8537146 | 0.61 | MAPK1 (0.35) | — | |
| SCHEMBL11642212 | 0.61 | — | — | |
| SCHEMBL13829086 | 0.61 | — | — | |
| SCHEMBL4880104 | 0.61 | KDM4E (0.35) | — | |
| SCHEMBL12191694 | 0.58 | P2RX7 (0.41) | — | |
| SCHEMBL32688678 | 0.58 | P2RX7 (0.41) | — | |
| SCHEMBL4885151 | 0.58 | HSD11B1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-11279122-A | — | — | None | — | — | JP | disclosed |
| CN-1230455-C | Copolymer resin preparation thereof, and photoresist using the same | HYUNDAI ELECTRONICS IND (KR) | 2005-12-07 | — | — | CN | disclosed |
| US-6348296-B1 | COPOLYMER CONSISTING OF 2,3-DI-TERT-BUTYL-5-NORBORNENE-2,3-DICARBOXYLATE, ANOTHER NORBORNENE MONOMER, AND MALEIC ANHYDRIDE | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-02-19 | — | — | US | disclosed |
| US-6348296-B1 | COPOLYMER CONSISTING OF 2,3-DI-TERT-BUTYL-5-NORBORNENE-2,3-DICARBOXYLATE, ANOTHER NORBORNENE MONOMER, AND MALEIC ANHYDRIDE | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-02-19 | — | — | US | disclosed |
| JP-H11279122-A | COMPOUND AND ITS PRODUCTION, COPOLYMER AND ITS PRODUCTION, COPOLYMER RESIN FOR PHOTORESIST AND ITS PRODUCTION, PHOTORESIST COMPOSITION AND ITS PRODUCTION, AND PHOTORESIST PATTERN FORMATION AND SEMICONDUCTOR ELEMENT | HYUNDAI ELECTRONICS IND CO LTD | 1999-10-12 | — | — | JP | disclosed |
| CN-1223252-A | Copolymer resin preparation thereof, and photoresist using the same | HYUNDAI ELECTRONICS IND (KR) | 1999-07-21 | — | — | CN | disclosed |