Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.59 |
| ▸ | MAPT | P10636 | 1/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.59 |
| ▸ | HTT | P42858 | 1/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.58 |
| ▸ | MEN1 | O00255 | 4/20 | 0.58 |
| ▸ | LMNA | P02545 | 1/20 | 0.54 |
| ▸ | HPGD | P15428 | 1/20 | 0.53 |
| ▸ | GLA | P06280 | 1/20 | 0.52 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.50 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.50 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.50 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.49 |
| ▸ | POLB | P06746 | 1/20 | 0.49 |
| ▸ | ITGB1 | P05556 | 1/20 | 0.49 |
| ▸ | ITGA4 | P13612 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24758464 | 0.89 | ALDH1A1 (0.50) | ALDH1A1MAPTSMN1; SMN2KDM4EHTT | |
| SCHEMBL13895393 | 0.83 | PKM (0.48) | ALDH1A1MAPTSMN1; SMN2KDM4EHTT | |
| SCHEMBL14388437 | 0.82 | PKM (0.47) | ALDH1A1MAPTSMN1; SMN2KDM4EHTT | |
| SCHEMBL25039172 | 0.82 | SMN1; SMN2 (0.49) | ALDH1A1MAPTSMN1; SMN2KDM4EHTT | |
| SCHEMBL17702625 | 0.81 | KMT2A (0.70) | ALDH1A1SMN1; SMN2KDM4EHTTKMT2A | |
| SCHEMBL9260496 | 0.80 | KDM4E (0.56) | ALDH1A1KDM4EHTTKMT2AMEN1 | |
| SCHEMBL5858380 | 0.79 | MEN1 (0.57) | ALDH1A1KDM4EHTTKMT2AMEN1 | |
| SCHEMBL13840110 | 0.79 | SMN1; SMN2 (0.57) | ALDH1A1SMN1; SMN2KDM4EHTTKMT2A | |
| SCHEMBL16064957 | 0.79 | HTT (0.54) | ALDH1A1KDM4EHTTKMT2AMEN1 | |
| SCHEMBL8591629 | 0.79 | KDM4E (0.54) | ALDH1A1MAPTSMN1; SMN2KDM4EHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110423216-A | A kind of 2- (1- adamantane formamido) methylcarbamoyl ethyl esters compound and its preparation method and application | UNIV ZHEJIANG TECHNOLOGY | 2019-11-08 | — | — | CN | claimed |
| US-6348625-B1 | TREATING CORRESPONDING CARBOXYLIC ACID FUNCTIONAL GROUP WITH N,N-DIETHYL-1,1,2,3,3,3-HEXAFLUOROPROPYLAMINE FOLLOWED BY AMMONIA | ANDERSON GLORIA LONG (US) | 2002-02-19 | — | — | US | claimed |
| US-12540245-B2 | Water repellent composition, method for producing water repellent composition, and fiber product | MITSUI CHEMICALS, INC. (JP) | 2026-02-03 | — | — | US | disclosed |
| CN-112437783-B | Non-fluorinated block copolymers | 大金工业株式会社 | 2023-08-25 | — | — | CN | disclosed |
| EP-4223764-A1 | AMIDE COMPOUND | Daikin Industries, Ltd. (JP) | 2023-08-09 | — | — | EP | disclosed |
| EP-4219572-A1 | GRAFT POLYMER | Daikin Industries, Ltd. (JP) | 2023-08-02 | — | — | EP | disclosed |
| US-20230227596-A1 | GRAFT POLYMER | DAIKIN INDUSTRIES LTD. (JP) | 2023-07-20 | — | — | US | disclosed |
| US-20230220140-A1 | AMIDE COMPOUND | DAIKIN INDUSTRIES, LTD. (JP) | 2023-07-13 | — | — | US | disclosed |
| CN-116396451-A | Non-fluorinated block copolymers | 大金工业株式会社 | 2023-07-07 | — | — | CN | disclosed |
| US-20230037578-A1 | WATER REPELLENT COMPOSITION, METHOD FOR PRODUCING WATER REPELLENT COMPOSITION, AND FIBER PRODUCT | DAIKIN INDUSTRIES, LTD. (JP) | 2023-02-09 | — | — | US | disclosed |
| EP-4083078-A1 | WATER REPELLENT COMPOSITION, METHOD FOR PRODUCING WATER REPELLENT COMPOSITION, AND TEXTILE PRODUCT | Mitsui Chemicals, Inc. (JP) | 2022-11-02 | — | — | EP | disclosed |
| US-20170059992-A1 | RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-20160327866-A1 | PATTERN FORMING METHOD, TREATING AGENT, ELECTRONIC DEVICE, AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| US-20160195814-A1 | PATTERN FORMATION METHOD, ELECTRONIC-DEVICE PRODUCTION METHOD, AND PROCESSING AGENT | FUJIFILM CORPORATION (JP) | 2016-07-07 | — | — | US | disclosed |
| US-20160116840-A1 | COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-04-28 | — | — | US | disclosed |
| US-20160041465-A1 | PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-02-11 | — | — | US | disclosed |
| US-20160011517-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| US-20110165512-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-07-07 | — | — | US | disclosed |
| US-20110165512-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-07-07 | — | — | US | disclosed |
| US-6348625-B1 | TREATING CORRESPONDING CARBOXYLIC ACID FUNCTIONAL GROUP WITH N,N-DIETHYL-1,1,2,3,3,3-HEXAFLUOROPROPYLAMINE FOLLOWED BY AMMONIA | ANDERSON GLORIA LONG (US) | 2002-02-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160116840-A1 | COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | CHRM1, ESR1, RER1 | ALDH1A1 3574/4885MAPT 1842/4885SMN1; SMN2 2930/4885 |
| US-20230227596-A1 | GRAFT POLYMER | GMNN, FIBP, FASN | ALDH1A1 1867/4885MAPT 3042/4885SMN1; SMN2 1908/4885 |
| US-12540245-B2 | Water repellent composition, method for producing water repellent composition, and fiber product | AFF1, RER1, NAF1 | ALDH1A1 1894/4885MAPT 914/4885SMN1; SMN2 1365/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.