SCHEMBL7705806

SCHEMBL7705806

O=C(CC=Cc1ccccc1)OC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PAM P19021 1/20 0.49
CYP19A1 P11511 4/20 0.47
CYP17A1 P05093 3/20 0.46
MAOB P27338 1/20 0.42
GABBR2 O75899 1/20 0.41
GABRB1 P18505 1/20 0.41
GABRB2 P47870 1/20 0.41
GABBR1 Q9UBS5 1/20 0.41
P2RX7 Q99572 2/20 0.38
CHRNA7 P36544 1/20 0.38
ALDH1A1 P00352 2/20 0.37
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
HPGD P15428 1/20 0.37
KDM4E B2RXH2 1/20 0.36
HTT P42858 1/20 0.36
LMNA P02545 1/20 0.36
GAA P10253 1/20 0.36
MGAM O43451 1/20 0.36
SI P14410 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7703173 0.86 PAM (0.46) PAMMAOBHPGDHDAC1
SCHEMBL1397176 0.81 CYP19A1 (0.45) CYP19A1CYP17A1GABBR2GABRB1GABRB2
SCHEMBL6066461 0.78 KMT2A (0.48) CYP19A1MAOBGABBR2GABRB1GABRB2
SCHEMBL1397068 0.78 KMT2A (0.48) CYP19A1MAOBGABBR2GABRB1GABRB2
SCHEMBL2194804 0.76 GABBR2 (0.42) CYP19A1CYP17A1GABBR2GABRB1GABRB2
SCHEMBL4950664 0.75 PAM (0.49) PAMMAOBHPGD
SCHEMBL6305516 0.74 GABBR2 (0.41) CYP19A1CYP17A1GABBR2GABRB1GABRB2
SCHEMBL28018052 0.72 CYP19A1 (0.50) CYP19A1CYP17A1ALDH1A1MEN1KMT2A
SCHEMBL8452840 0.72 PAM (0.66) PAMMAOBALDH1A1LMNAHDAC3
SCHEMBL7257867 0.72 CYP19A1 (0.47) CYP19A1CYP17A1ALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1248150-A2 Radiation sensitive material and method for forming pattern FUJITSU LIMITED (JP) 2002-10-09 EP disclosed
EP-0663616-A2 Radiation sensitive material and method for forming pattern FUJITSU LIMITED (JP) 1995-07-19 EP disclosed