Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PAM | P19021 | 1/20 | 0.46 |
| ▸ | MAOB | P27338 | 4/20 | 0.40 |
| ▸ | MAOA | P21397 | 3/20 | 0.37 |
| ▸ | CYP4F2 | P78329 | 2/20 | 0.37 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.36 |
| ▸ | DPP4 | P27487 | 1/20 | 0.36 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7705806 | 0.86 | PAM (0.49) | PAMMAOBHDAC1HPGD | |
| SCHEMBL2197298 | 0.82 | HPGD (0.33) | PAMMAPTHDAC1HPGDSMN1; SMN2 | |
| SCHEMBL1397156 | 0.80 | CYP2C19 (0.46) | MAPTHDAC1HPGDSMN1; SMN2 | |
| SCHEMBL2196174 | 0.77 | CYP2C19 (0.34) | MAOBMAPTHDAC1HPGDSMN1; SMN2 | |
| SCHEMBL1397175 | 0.72 | MAOB (0.34) | MAOBDPP4 | |
| SCHEMBL6410147 | 0.72 | AKR1C3 (0.45) | HPGDSMN1; SMN2 | |
| SCHEMBL1702939 | 0.70 | ABCG2 (0.39) | MAPTHPGDSMN1; SMN2 | |
| SCHEMBL8452840 | 0.70 | PAM (0.66) | PAMMAOBMAOACYP4F2CYP4A11 | |
| SCHEMBL6971069 | 0.69 | PAM (0.63) | PAMMAOBMAOACYP4F2CYP4A11 | |
| SCHEMBL6971066 | 0.69 | PAM (0.63) | PAMMAOBMAOACYP4F2CYP4A11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1248150-A2 | Radiation sensitive material and method for forming pattern | FUJITSU LIMITED (JP) | 2002-10-09 | — | — | EP | disclosed |
| EP-0663616-A2 | Radiation sensitive material and method for forming pattern | FUJITSU LIMITED (JP) | 1995-07-19 | — | — | EP | disclosed |