SCHEMBL7708093

SCHEMBL7708093

Cc1cc(C)c(CO)c(CCO)c1

nearest known ligand 0.36

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 3/20 0.36
XDH P47989 1/20 0.32
KDM4E B2RXH2 3/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
TAAR1 Q96RJ0 1/20 0.31
GPR17 Q13304 1/20 0.31
CYP11B1 P15538 1/20 0.31
CYP11B2 P19099 1/20 0.31
SHBG P04278 1/20 0.31
ALDH1A1 P00352 2/20 0.30
LMNA P02545 1/20 0.30
GAA P10253 1/20 0.30
MAPT P10636 1/20 0.30
HSD17B10 Q99714 1/20 0.30
RAPGEF4 Q8WZA2 1/20 0.30
HTR1D P28221 1/20 0.30
HTR1B P28222 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28050862 0.85 SHBG (0.38) HRH3XDHKDM4EL3MBTL1CYP11B1
SCHEMBL1225042 0.81 KMT2A (0.37) HRH3KDM4EL3MBTL1CYP11B1CYP11B2
SCHEMBL555490 0.80 HRH3 (0.47) HRH3XDHKDM4ECYP11B1CYP11B2
SCHEMBL95192 0.79 HRH3 (0.40) HRH3XDHKDM4ECYP11B1CYP11B2
SCHEMBL21031355 0.79 TAAR1 (0.35) HRH3KDM4EL3MBTL1TAAR1CYP11B1
SCHEMBL30994921 0.78 HRH3 (0.35) HRH3XDHKDM4EL3MBTL1TAAR1
SCHEMBL19126690 0.78 HRH3 (0.35) HRH3XDHKDM4EL3MBTL1TAAR1
SCHEMBL8570085 0.77 ALDH1A1 (0.45) KDM4ETAAR1SHBGALDH1A1LMNA
SCHEMBL9614168 0.73 AMY1A (0.47) KDM4ETAAR1SHBGALDH1A1LMNA
SCHEMBL12622553 0.72 ALDH1A1 (0.45) KDM4ESHBGALDH1A1LMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9804492-B2 Method for forming multi-layer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-31 US disclosed
US-9785049-B2 Method for forming multi-layer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-10 US disclosed
US-20170199457-A1 METHOD FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-07-13 US disclosed
US-9658530-B2 Process for forming multi-layer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-23 US disclosed
US-9511362-B2 Anion-conducting polymer SIMON FRASER UNIVERSITY (US) 2016-12-06 US disclosed
US-20160193599-A1 ANION-CONDUCTING POLYMER SIMON FRASER UNIVERSITY (CA) 2016-07-07 US disclosed
US-20160111287-A1 METHOD FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-21 US disclosed
US-9315630-B2 Anion-conducting polymer SIMON FRASER UNIVERSITY (CA) 2016-04-19 US disclosed
US-20160008844-A1 PROCESS FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-14 US disclosed
US-20150073063-A1 ANION-CONDUCTING POLYMER SIMON FRASER UNIVERSITY (CA) 2015-03-12 US disclosed
WO-2013149328-A1 ANION-CONDUCTING POLYMER SIMON FRASER UNIVERSITY (CA) 2013-10-10 WO disclosed
US-6355826-B1 HALOMETHYLATION AN AROMATIC ALDEHYDE COMPOUND AND SALT FORMATION THE GOODYEAR TIRE & RUBBER COMPANY 2002-03-12 US disclosed
EP-0903338-A2 Synthesis of stable nitrile oxide compounds THE GOODYEAR TIRE & RUBBER COMPANY (US) 1999-03-24 EP disclosed