Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PGK1 | P00558 | 2/20 | 0.50 |
| ▸ | PGK2 | P07205 | 2/20 | 0.50 |
| ▸ | SLC11A2 | P49281 | 1/20 | 0.45 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.34 |
| ▸ | SHBG | P04278 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.32 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.32 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.32 |
| ▸ | HTR1D | P28221 | 2/20 | 0.31 |
| ▸ | HTR1B | P28222 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL360246 | 0.89 | PGK1 (0.41) | PGK1PGK2SLC11A2HPGDHSD17B10 | |
| SCHEMBL28585139 | 0.85 | SHBG (0.42) | PGK1PGK2SLC11A2HPGDHSD17B10 | |
| SCHEMBL357122 | 0.82 | PGK1 (0.39) | PGK1PGK2SLC11A2HPGDHSD17B10 | |
| SCHEMBL6441200 | 0.80 | SHBG (0.41) | PGK1PGK2SLC11A2HPGDHSD17B10 | |
| SCHEMBL5377507 | 0.79 | ACHE (0.40) | PGK1PGK2SLC11A2HPGDHSD17B10 | |
| SCHEMBL4008341 | 0.78 | PGK1 (0.46) | PGK1PGK2SLC11A2HPGDHSD17B10 | |
| SCHEMBL28381145 | 0.78 | PGK1 (0.38) | PGK1PGK2SLC11A2KDM4E | |
| SCHEMBL8625037 | 0.78 | HPGD (0.41) | PGK1PGK2SLC11A2HPGDHSD17B10 | |
| SCHEMBL27621943 | 0.78 | SLC11A2 (0.38) | PGK1PGK2SLC11A2HPGDHSD17B10 | |
| SCHEMBL25949715 | 0.78 | PGK1 (0.33) | PGK1PGK2SLC11A2HPGDALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025094673-A1 | VINYL COMPOUND, VINYL COMPOSITION, VINYL RESIN CURED PRODUCT, PREPREG, FILM WITH RESIN, METAL FOIL WITH RESIN, METAL-CLAD LAMINATE, AND PRINTED WIRING BOARD | 住友化学株式会社 | 2025-05-08 | — | — | WO | disclosed |
| US-10042258-B2 | Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-08-07 | — | — | US | disclosed |
| US-10042258-B2 | Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-08-07 | — | — | US | disclosed |
| US-9804492-B2 | Method for forming multi-layer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-31 | — | — | US | disclosed |
| US-20170293227-A1 | COATING LIQUID FOR RESIST PATTERN COATING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-20170293227-A1 | COATING LIQUID FOR RESIST PATTERN COATING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-9785049-B2 | Method for forming multi-layer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-10 | — | — | US | disclosed |
| US-9746768-B2 | Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-08-29 | — | — | US | disclosed |
| US-9746768-B2 | Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-08-29 | — | — | US | disclosed |
| US-20170205711-A1 | COMPOSITION FOR FORMING A RESIST UPPER-LAYER FILM AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE USING THE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-07-20 | — | — | US | disclosed |
| US-20150073063-A1 | ANION-CONDUCTING POLYMER | SIMON FRASER UNIVERSITY (CA) | 2015-03-12 | — | — | US | disclosed |
| WO-2013149328-A1 | ANION-CONDUCTING POLYMER | SIMON FRASER UNIVERSITY (CA) | 2013-10-10 | — | — | WO | disclosed |
| US-6355826-B1 | HALOMETHYLATION AN AROMATIC ALDEHYDE COMPOUND AND SALT FORMATION | THE GOODYEAR TIRE & RUBBER COMPANY | 2002-03-12 | — | — | US | disclosed |
| EP-0903338-A2 | Synthesis of stable nitrile oxide compounds | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 1999-03-24 | — | — | EP | disclosed |
| US-5122442-A | Water soluble binder; photosensitive compound | HOECHST CELANESE CORPORATION (US) | 1992-06-16 | — | — | US | disclosed |
| EP-0212482-B1 | PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1989-04-19 | — | — | EP | disclosed |
| EP-0212482-A2 | Process for obtaining negative images from positive photoresists | HOECHST CELANESE CORPORATION (US) | 1987-03-04 | — | — | EP | disclosed |
| EP-0061150-B1 | LIGHT-SENSITIVE POLYCONDENSATION PRODUCT, PROCESS FOR ITS PREPARATION AND LIGHT-SENSITIVE RECORDING MATERIAL CONTAINING THE SAME | AMERICAN HOECHST CORPORATION (US) | 1986-10-15 | — | — | EP | disclosed |
| US-4436804-A | Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith | AMERICAN HOECHST CORPORATION (US) | 1984-03-13 | — | — | US | disclosed |
| EP-0061150-A1 | Light-sensitive polycondensation product, process for its preparation and light-sensitive recording material containing the same | AMERICAN HOECHST CORPORATION (US) | 1982-09-29 | — | — | EP | disclosed |