Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.51 |
| ▸ | HTT | P42858 | 3/20 | 0.49 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | MCHR1 | Q99705 | 3/20 | 0.45 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | APP | P05067 | 1/20 | 0.43 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.43 |
| ▸ | TMEM97 | Q5BJF2 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1991981 | 0.91 | HTT (0.55) | KDM4EALDH1A1HTTHPGDSMN1; SMN2 | |
| SCHEMBL2014524 | 0.87 | HTT (0.52) | KDM4EALDH1A1HTTHPGDPOLB | |
| SCHEMBL771444 | 0.81 | HTT (0.59) | KDM4EALDH1A1HTTHPGDALOX15 | |
| SCHEMBL771801 | 0.80 | KDM4E (0.57) | KDM4EALDH1A1HTTHPGDPOLB | |
| SCHEMBL30122880 | 0.79 | HTT (0.51) | KDM4EALDH1A1HTTHPGDPOLB | |
| SCHEMBL2016542 | 0.79 | HPGD (0.53) | KDM4EALDH1A1HTTHPGDPOLB | |
| SCHEMBL17911673 | 0.78 | HTT (0.56) | KDM4EALDH1A1HTTSMN1; SMN2ALOX15 | |
| SCHEMBL771804 | 0.77 | HTT (0.51) | KDM4EALDH1A1HTTSMN1; SMN2SIGMAR1 | |
| SCHEMBL11630070 | 0.77 | HTT (0.55) | KDM4EALDH1A1HTTHPGDPOLB | |
| Dimethylaminoethanol SCHEMBL1131917 | 0.76 | MAPT (0.46) | KDM4EALDH1A1HTTPOLBSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7838198-B2 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-11-23 | — | — | US | claimed |
| US-20090155718-A1 | PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-18 | — | — | US | claimed |
| CN-118251759-A | Multi-level selective patterning for stacked device creation | 杰米纳蒂奥公司 | 2024-06-25 | — | — | CN | disclosed |
| CN-118215986-A | Chemoselective adhesion and strength promoters in semiconductor patterning | 杰米纳蒂奥公司 | 2024-06-18 | — | — | CN | disclosed |
| CN-117941029-A | Self-aligned high-order patterning based on anti-spacer | 杰米纳蒂奥公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-117941028-A | Self-aligned stacking method | 杰米纳蒂奥公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-117916851-A | Enhanced field stitching with corrective chemistry | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-117916852-A | Assist feature placement in semiconductor patterning | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-117916854-A | Narrow line cutting mask method | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-117916853-A | Formation of a multi-line etched substrate | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-117916855-A | In-resist process for forming high density contacts | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | disclosed |
| US-20110147983-A1 | METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THEREFROM | GLOBALFOUNDRIES U.S. INC. | 2011-06-23 | — | — | US | disclosed |
| US-7838200-B2 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-11-23 | — | — | US | disclosed |
| US-7838198-B2 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-11-23 | — | — | US | disclosed |
| US-20090155718-A1 | PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-18 | — | — | US | disclosed |
| EP-0816419-B9 | Ultraviolet-curable polysiloxane composition and method for the formation of cured patterns therefrom | DOW CORNING ASIA LTD (JP) | 2003-10-22 | — | — | EP | disclosed |
| EP-0816419-B1 | Ultraviolet-curable polysiloxane composition and method for the formation of cured patterns therefrom | DOW CORNING ASIA LTD (JP) | 2003-03-12 | — | — | EP | disclosed |
| US-6258506-B1 | USING BLEND OF BENZOIN ETHER AND FREE RADICAL POLYMERIZABLE SILICONE POLYMER | DOW CORNING ASIA, LTD. (JP) | 2001-07-10 | — | — | US | disclosed |
| US-6051625-A | Ultraviolet-curable polysiloxane composition and method for the formation of cured patterns therefrom | DOW CORNING ASIA, LTD. (JP) | 2000-04-18 | — | — | US | disclosed |
| EP-0816419-A2 | Ultraviolet-curable polysiloxane composition and method for the formation of cured patterns therefrom | DOW CORNING ASIA, Ltd. (JP) | 1998-01-07 | — | — | EP | disclosed |