Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 3/20 | 0.59 |
| ▸ | TSHR | P16473 | 1/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.55 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.54 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.53 |
| ▸ | APEX1 | P27695 | 1/20 | 0.53 |
| ▸ | APP | P05067 | 1/20 | 0.52 |
| ▸ | MEN1 | O00255 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 1/20 | 0.51 |
| ▸ | MAPT | P10636 | 1/20 | 0.51 |
| ▸ | HPGD | P15428 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17911673 | 0.97 | HTT (0.56) | HTTTSHRKDM4EALDH1A1SIGMAR1 | |
| SCHEMBL772833 | 0.90 | KMT2A (0.56) | HTTTSHRKDM4EALDH1A1KMT2A | |
| SCHEMBL2014524 | 0.88 | HTT (0.52) | HTTTSHRKDM4EALDH1A1SIGMAR1 | |
| Dimethylaminoethanol SCHEMBL9089538 | 0.87 | HTT (0.58) | HTTTSHRALDH1A1ALOX15HPGD | |
| SCHEMBL9680149 | 0.85 | APP (0.61) | HTTTSHRKDM4EALDH1A1KMT2A | |
| SCHEMBL8639193 | 0.84 | ALDH1A1 (0.66) | HTTTSHRKDM4EALDH1A1ALOX15 | |
| SCHEMBL13162938 | 0.84 | HPGD (0.64) | HTTTSHRKDM4EALDH1A1SIGMAR1 | |
| SCHEMBL771801 | 0.84 | KDM4E (0.57) | HTTKDM4EALDH1A1SIGMAR1ALOX15 | |
| SCHEMBL7510605 | 0.83 | ALDH1A1 (0.65) | HTTTSHRKDM4EALDH1A1SIGMAR1 | |
| Hydrochloric Acid SCHEMBL11319796 | 0.83 | ALDH1A1 (0.64) | HTTTSHRKDM4EALDH1A1ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7838198-B2 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-11-23 | — | — | US | claimed |
| WO-2009074522-A1 | PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-18 | — | — | WO | claimed |
| US-20090155718-A1 | PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-18 | — | — | US | claimed |
| US-20090155715-A1 | PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-18 | — | — | US | claimed |
| CN-118251759-A | Multi-level selective patterning for stacked device creation | 杰米纳蒂奥公司 | 2024-06-25 | — | — | CN | disclosed |
| CN-118215986-A | Chemoselective adhesion and strength promoters in semiconductor patterning | 杰米纳蒂奥公司 | 2024-06-18 | — | — | CN | disclosed |
| CN-117941028-A | Self-aligned stacking method | 杰米纳蒂奥公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-117941029-A | Self-aligned high-order patterning based on anti-spacer | 杰米纳蒂奥公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-117916854-A | Narrow line cutting mask method | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-117916855-A | In-resist process for forming high density contacts | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-117916853-A | Formation of a multi-line etched substrate | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-117916852-A | Assist feature placement in semiconductor patterning | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | disclosed |
| US-6051625-A | Ultraviolet-curable polysiloxane composition and method for the formation of cured patterns therefrom | DOW CORNING ASIA, LTD. (JP) | 2000-04-18 | — | — | US | disclosed |
| EP-0816419-A2 | Ultraviolet-curable polysiloxane composition and method for the formation of cured patterns therefrom | DOW CORNING ASIA, Ltd. (JP) | 1998-01-07 | — | — | EP | disclosed |
| US-4206144-A | N,N-Dialkyl-N-aminoalkyl-N-(amino or nitro)phenylalkyl- and N-methyl-N-[3-(amino or nitro)phenoxy-2-hydroxy-1-propyl]-N,N-bis(3-aminopropyl)quaternary ammonium salts | STERLING DRUG INC. (US) | 1980-06-03 | — | — | US | disclosed |
| US-4146558-A | Azo dyestuff intermediate nitro- or aminobenzenes ring-substituted by a quaternized amine alkyl or amino-alkoxy group | STERLING DRUG INC. (US) | 1979-03-27 | — | — | US | disclosed |
| US-4103092-A | Water-soluble quaternary ammonium non-heterocyclic azo dyestuffs | STERLING DRUG INC. (US) | 1978-07-25 | — | — | US | disclosed |
| US-4065500-A | Water-soluble quaternary ammonium azo dyestuffs | STERLING DRUG INC. (US) | 1977-12-27 | — | — | US | disclosed |
| US-3996282-A | Water-soluble quaternary ammonium dyestuffs | STERLING DRUG INC. (US) | 1976-12-07 | — | — | US | disclosed |
| US-3935182-A | Water-soluble quaternary ammonium heterocyclic azo dyestuffs | STERLING DRUG INC. (US) | 1976-01-27 | — | — | US | disclosed |