SCHEMBL7733707

SCHEMBL7733707

CCN(c1ccc(N(CC)C(C)OC)cc1)C(C)OC

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR1H2 P55055 5/20 0.35
NR1H3 Q13133 5/20 0.35
MAPT P10636 4/20 0.32
ALDH1A1 P00352 6/20 0.32
L3MBTL1 Q9Y468 4/20 0.32
TDP1 Q9NUW8 2/20 0.32
PSMD14 O00487 1/20 0.32
CYP3A4 P08684 1/20 0.32
TSHR P16473 1/20 0.32
MAPK1 P28482 1/20 0.32
RECQL P46063 1/20 0.32
GFER P55789 1/20 0.32
LMNA P02545 1/20 0.32
HTT P42858 1/20 0.32
IGLV6-57 P01721 1/20 0.32
TAAR1 Q96RJ0 1/20 0.32
MCL1 Q07820 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
ESRRG P62508 1/20 0.31
MEN1 O00255 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11580018 0.90 TDP1 (0.48) NR1H2NR1H3MAPTALDH1A1L3MBTL1
SCHEMBL10444592 0.90 TP53 (0.39) NR1H2NR1H3MAPTALDH1A1TSHR
SCHEMBL10938398 0.87 ALDH1A1 (0.52) MAPTALDH1A1L3MBTL1TSHRLMNA
SCHEMBL10061779 0.83 IGLV6-57 (0.38) MAPTALDH1A1TDP1MAPK1LMNA
SCHEMBL7731814 0.80 LMNA (0.35) NR1H2NR1H3MAPTALDH1A1L3MBTL1
SCHEMBL5084506 0.79 S100B (0.56) ALDH1A1L3MBTL1TDP1PSMD14CYP3A4
SCHEMBL7733713 0.78 ESR1 (0.34) NR1H2NR1H3ALDH1A1LMNASMN1; SMN2
SCHEMBL6075239 0.78 ALDH1A1 (0.45) MAPTALDH1A1L3MBTL1TDP1CYP3A4
SCHEMBL9114221 0.78 S100B (0.36) MAPTALDH1A1L3MBTL1TDP1PSMD14
SCHEMBL11321042 0.78 MAPT (0.43) MAPTALDH1A1TDP1TSHRHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6399272-B1 Phenylenediamine derivative-type additive useful for a chemically amplified photoresist HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-06-04 US disclosed