SCHEMBL7733710

SCHEMBL7733710

CCOC(C)Nc1ccc(NC(C)OCC)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.50
L3MBTL1 Q9Y468 5/20 0.50
TDP1 Q9NUW8 4/20 0.50
TSHR P16473 4/20 0.50
CYP3A4 P08684 3/20 0.50
ALOX15 P16050 3/20 0.50
HSD17B10 Q99714 3/20 0.50
THRB P10828 3/20 0.50
HIF1A Q16665 2/20 0.50
TP53 P04637 1/20 0.50
HSP90AA1 P07900 1/20 0.50
CASP1 P29466 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
LMNA P02545 2/20 0.38
EPHX1 P07099 1/20 0.37
ALOX12 P18054 2/20 0.35
RECQL P46063 1/20 0.35
ATM Q13315 1/20 0.35
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4454171 0.90 TDP1 (0.42) ALDH1A1L3MBTL1TDP1TSHRCYP3A4
SCHEMBL10696330 0.89 TDP1 (0.52) ALDH1A1L3MBTL1TDP1TSHRCYP3A4
SCHEMBL8681664 0.78 ALDH1A1 (0.42) ALDH1A1L3MBTL1TDP1TSHRCYP3A4
SCHEMBL7165846 0.78 GAA (0.48) ALDH1A1L3MBTL1TDP1TSHRCYP3A4
SCHEMBL10562772 0.78 ALDH1A1 (0.43) ALDH1A1L3MBTL1ALOX15HSD17B10TP53
SCHEMBL7733717 0.77 L3MBTL1 (0.37) ALDH1A1L3MBTL1TDP1TSHRCYP3A4
SCHEMBL7736363 0.74 L3MBTL1 (0.48) ALDH1A1L3MBTL1TDP1TSHRCYP3A4
SCHEMBL7734438 0.72 ALDH1A1 (0.44) ALDH1A1L3MBTL1TDP1TSHRCYP3A4
SCHEMBL10408246 0.71 MAPT (0.44) ALDH1A1THRBSMN1; SMN2LMNAGAA
SCHEMBL11676015 0.71 MEN1 (0.57) ALDH1A1L3MBTL1TSHRHSD17B10TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6399272-B1 Phenylenediamine derivative-type additive useful for a chemically amplified photoresist HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-06-04 US disclosed