SCHEMBL7738526

SCHEMBL7738526

CC(C)(C)C(=Cc1cccc2ccccc12)C(=O)O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.55
ALDH1A1 P00352 5/20 0.47
MAPT P10636 4/20 0.47
HTT P42858 2/20 0.47
KMT2A Q03164 2/20 0.47
HPGD P15428 2/20 0.47
MEN1 O00255 1/20 0.47
GAA P10253 1/20 0.47
CRHBP P24387 1/20 0.47
CRHR2 Q13324 1/20 0.47
MTNR1A P48039 1/20 0.45
MTNR1B P49286 1/20 0.45
HSD17B10 Q99714 1/20 0.43
HDAC8 Q9BY41 1/20 0.43
HDAC6 Q9UBN7 1/20 0.43
SMPD2 O60906 1/20 0.42
NR4A1 P22736 1/20 0.41
NR4A2 P43354 1/20 0.41
NR4A3 Q92570 1/20 0.41
LMNA P02545 3/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15324778 0.79 KDM4E (0.36) KDM4EALDH1A1MAPTHTTKMT2A
SCHEMBL9874966 0.78 KMT2A (0.46) ALDH1A1KMT2AMEN1GAAHSD17B10
SCHEMBL819646 0.78 KDM4E (0.68) KDM4EALDH1A1MAPTHTTKMT2A
SCHEMBL36974 0.78 KDM4E (0.68) KDM4EALDH1A1MAPTHTTKMT2A
SCHEMBL7189395 0.78 KDM4E (0.71) KDM4EALDH1A1MAPTHTTKMT2A
SCHEMBL19513913 0.76 DHPS (0.41) ALDH1A1MAPTKMT2AHPGDMEN1
SCHEMBL7436220 0.75 KDM4E (0.55) KDM4EALDH1A1MAPTHTTKMT2A
SCHEMBL28492926 0.75 KDM4E (0.55) KDM4EALDH1A1MAPTHTTKMT2A
SCHEMBL7436213 0.75 KDM4E (0.55) KDM4EALDH1A1MAPTHTTKMT2A
SCHEMBL7971777 0.74 KDM4E (0.55) KDM4EALDH1A1MAPTHTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6410748-B1 Alicycli c group-containing monomer KABUSHIKI KAISHA TOSHIBA (JP) 2002-06-25 US disclosed
US-6291129-B1 LIGHT SENSITIVE ELEMENT WITH UNSATURATED POLYMERS KABUSHIKI KAISHA TOSHIBA (JP) 2001-09-18 US disclosed
US-6280897-B1 GENERATION OF ACID WITH ACTINIC RADIATION KABUSHIKI KAISHA TOSHIBA (JP) 2001-08-28 US disclosed
US-6060207-A LOW IN ABSORPTION OF A LIGHT SOURCE OF SHORT WAVELENGTH AND EXCELLENT IN DRY ETCH RESISTANCE; COMPRISES A COMPOUND HAVING A TERPENOID SKELETON KABUSHIKI KAISHA TOSHIBA (JP) 2000-05-09 US disclosed
US-5932391-A CONTAINING AN ACYCLIC COMPOUND WHICH IS A VINYL POLYMERBEING LIGHT ABSORBENT KABUSHIKI KAISHA TOSHIBA (JP) 1999-08-03 US disclosed
US-5863699-A FORMS A PATTERN THROUGH LIGHT-EXPOSURE WITH EITHER ARGON FLUORIDE OR FLUORINE EXCIMER LASERS, COMPRISES A COMPOUND HAVING EITHER AN ACID-DECOMPOSABLE OR ACID-CROSSLINKABLE GROUP KABUSHIKI KAISHA TOSHIBA (JP) 1999-01-26 US disclosed