SCHEMBL7741447

SCHEMBL7741447

O=C(OCCN1CCCCC1)C1CC2C=CC1C2

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.44
LMNA P02545 3/20 0.44
MAPT P10636 1/20 0.44
MAPK1 P28482 1/20 0.44
POLB P06746 3/20 0.43
KMT2A Q03164 4/20 0.42
MEN1 O00255 1/20 0.42
RAB9A P51151 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41
HIF1A Q16665 1/20 0.41
CHRM2 P08172 1/20 0.41
CHRM4 P08173 1/20 0.41
CHRM1 P11229 1/20 0.41
CHRM3 P20309 1/20 0.41
PTGS2 P35354 1/20 0.41
HRH1 P35367 1/20 0.41
KCNH2 Q12809 1/20 0.41
HRH3 Q9Y5N1 1/20 0.41
APEX1 P27695 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7742251 0.99 ALDH1A1 (0.43) ALDH1A1LMNAMAPTMAPK1POLB
SCHEMBL2138395 0.86 ATM (0.44) ALDH1A1LMNAPOLBKMT2AMEN1
SCHEMBL2138120 0.86 ALDH1A1 (0.40) ALDH1A1LMNAMAPTMAPK1POLB
SCHEMBL12550842 0.85 ALDH1A1 (0.39) ALDH1A1LMNAMAPTMAPK1POLB
SCHEMBL10388301 0.82 ALDH1A1 (0.53) ALDH1A1LMNAMAPTMAPK1POLB
SCHEMBL13897067 0.82 ALDH1A1 (0.53) ALDH1A1LMNAMAPTMAPK1POLB
SCHEMBL14213298 0.82 ALDH1A1 (0.53) ALDH1A1LMNAMAPTMAPK1POLB
SCHEMBL7742317 0.80 KMT2A (0.46) ALDH1A1LMNAMAPK1POLBKMT2A
SCHEMBL19498813 0.79 LMNA (0.49) ALDH1A1LMNAMAPTMAPK1POLB
SCHEMBL4403494 0.79 LMNA (0.49) ALDH1A1LMNAMAPTMAPK1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6426171-B1 BICYCLIC PHOTORESIST MONOMER FOR POLYMER HAVING EXCELLENT ETCHING AND HEAT RESISTANCE AND ENHANCED POST EXPOSURE DELAY STABILITY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-07-30 US claimed
US-6426171-B1 BICYCLIC PHOTORESIST MONOMER FOR POLYMER HAVING EXCELLENT ETCHING AND HEAT RESISTANCE AND ENHANCED POST EXPOSURE DELAY STABILITY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-07-30 US disclosed