SCHEMBL7745106

SCHEMBL7745106

CC(=O)CC(C)=O.O=C(O)CC(O)C(=O)Oc1ccccc1O

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 3/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
LMNA P02545 2/20 0.37
JAK2 O60674 1/20 0.37
MAPT P10636 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.35
CA1 P00915 2/20 0.35
CA2 P00918 1/20 0.35
TP53 P04637 1/20 0.35
TSHR P16473 1/20 0.35
KDM4E B2RXH2 3/20 0.35
HPGD P15428 3/20 0.35
HSD17B10 Q99714 3/20 0.35
KMT2A Q03164 3/20 0.35
DRD2 P14416 1/20 0.35
DRD4 P21917 1/20 0.35
DRD3 P35462 1/20 0.35
POLB P06746 1/20 0.35
ADRB2 P07550 2/20 0.34
ADRB1 P08588 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27686558 0.91 GAA (0.43) GAASMN1; SMN2LMNAJAK2MAPT
SCHEMBL689242 0.81 GAA (0.44) GAASMN1; SMN2LMNAJAK2MAPT
Malic Acid SCHEMBL7745105 0.79 SMN1; SMN2 (0.50) SMN1; SMN2MAPT
SCHEMBL10787248 0.77 GAA (0.44) GAALMNAJAK2MAPTL3MBTL1
SCHEMBL27554863 0.77 GAA (0.47) GAASMN1; SMN2LMNAJAK2MAPT
SCHEMBL11204791 0.76 GAA (0.46) GAASMN1; SMN2LMNAJAK2MAPT
SCHEMBL6371242 0.75 DRD2 (0.42) GAALMNAJAK2MAPTKMT2A
SCHEMBL10391922 0.75 KDM4E (0.54) LMNAMAPTTSHRKDM4EHPGD
SCHEMBL29409819 0.74 TDP1 (0.51) GAAMAPTKDM4EKMT2AALDH1A1
SCHEMBL28057308 0.72 POLB (0.46) GAALMNAMAPTL3MBTL1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1062682-A4 SELECTIVE SILICON OXIDE ETCHANT FORMULATION INCLUDING FLUORIDE SALT, CHELATING AGENT AND GLYCOL SOLVENT ADVANCED TECH MATERIALS (US) 2001-07-04 EP claimed
EP-1062682-A1 SELECTIVE SILICON OXIDE ETCHANT FORMULATION INCLUDING FLUORIDE SALT, CHELATING AGENT AND GLYCOL SOLVENT ADVANCED CHEMICAL SYSTEMS INTERNATIONAL CORPORATION (US) 2000-12-27 EP claimed
WO-1999033094-A1 SELECTIVE SILICON OXIDE ETCHANT FORMULATION INCLUDING FLUORIDE SALT, CHELATING AGENT AND GLYCOL SOLVENT ADVANCED CHEMICAL SYSTEMS INTERNATIONAL INC. (US) 1999-07-01 WO claimed