SCHEMBL774725

SCHEMBL774725

C=CC(=O)OCC1COC(C)(CC(C)C)O1

nearest known ligand 0.41

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.41
ALDH1A1 P00352 1/20 0.34
CTDSP1 Q9GZU7 1/20 0.34
CA2 P00918 1/20 0.31
HPGD P15428 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL774502 0.85 CTDSP1 (0.38) TSHRALDH1A1CTDSP1CA2HPGD
SCHEMBL15955988 0.85 CTDSP1 (0.37) ALDH1A1CTDSP1CA2
SCHEMBL15955749 0.83 CTDSP1 (0.36) ALDH1A1CTDSP1CA2
SCHEMBL923989 0.83 ALDH1A1 (0.55) TSHRALDH1A1CTDSP1CA2
SCHEMBL4893327 0.82 TSHR (0.39) TSHRALDH1A1HPGD
SCHEMBL15955777 0.81 CTDSP1 (0.38) ALDH1A1CTDSP1CA2
SCHEMBL15956025 0.81 CTDSP1 (0.40) ALDH1A1CTDSP1CA2
SCHEMBL13966298 0.81 TSHR (0.39) TSHRALDH1A1CA2HPGD
SCHEMBL1357755 0.80 CA2 (0.49) TSHRALDH1A1CA2HPGD
SCHEMBL21525856 0.80 CTDSP1 (0.34) ALDH1A1CTDSP1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9018274-B2 Ink composition SEIKO EPSON CORPORATION (JP) 2015-04-28 US claimed
JP-61266405-A None JP disclosed
US-12522883-B2 Composition and process for waterproofing leather STAHL INTERNATIONAL B.V. (NL) 2026-01-13 US disclosed
EP-4578884-A2 RESIN COMPOSITION, PREPREG, AND FIBER-REINFORCED PLASTIC Mitsubishi Chemical Corporation (JP) 2025-07-02 EP disclosed
US-20250051561-A1 COMPOSITION AND RESIN MOLDED ARTICLE MITSUBISHI CHEMICAL CORPORATION (JP) 2025-02-13 US disclosed
CN-119403843-A Polymer and method for producing same, photosensitive resin composition, cured product, and monomer compound and method for producing same 株式会社日本触媒 2025-02-07 CN disclosed
WO-2025027951-A1 PREPREG AND FIBER-REINFORCED PLASTIC 三菱ケミカル株式会社 2025-02-06 WO disclosed
CN-114341215-B Curable composition 株式会社日本触媒 2024-12-27 CN disclosed
EP-4477709-A1 COMPOSITION AND RESIN MOLDED BODY Mitsubishi Chemical Corporation (JP) 2024-12-18 EP disclosed
WO-2024203692-A1 RESIST POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, INTERLAYER INSULATING FILM, AND POLYMER PRODUCTION METHOD. 株式会社日本触媒 2024-10-03 WO disclosed
EP-1806387-A1 Photocurable ink composition and photocurable ink set SEIKO EPSON CORPORATION (JP) 2007-07-11 EP disclosed
US-7172851-B2 Light sensitive composition, planographic printing plate material, and image formation method KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-02-06 US disclosed
US-7172851-B2 Light sensitive composition, planographic printing plate material, and image formation method KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-02-06 US disclosed
US-20070017415-A1 Ink composition SEIKO EPSON CORPORATION 2007-01-25 US disclosed
US-20060187285-A1 Ink-jet recording method and ink composition set SEIKO EPSON CORPORATION 2006-08-24 US disclosed
US-20060160917-A1 Ink composition SEIKO EPSON CORPORATION 2006-07-20 US disclosed
US-20060158493-A1 Ink composition and image process using the same SEIKO EPSON CORPORATION 2006-07-20 US disclosed
EP-1674537-A2 Ink composition SEIKO EPSON CORPORATION (JP) 2006-06-28 EP disclosed
US-20060036001-A1 Ink composition SEIKO EPSON CORPORATION 2006-02-16 US disclosed
JP-S61266405-A ULTRAVIOLET-CURING RESIN COMPOSITION SANYO KOKUSAKU PULP CO LTD 1986-11-26 JP disclosed